Semiconductor integrated circuit device and manufacturing method thereof
A method of manufacturing a semiconductor integrated circuit device includes defining a first area by forming a separating area on a substrate, and forming a tunnel film in the first area, a floating gate on the tunnel film, a first electrode in the separating area, a first film on the floating gate, a second film on the first electrode, a control gate on the first film, a second electrode on the second film, and source and drain areas in the first area. The method includes forming a first interlayer film to cover the control gate and the second electrode, forming, in the first interlayer film, a conductive via plug reaching the second electrode, and forming, on the first interlayer film, a second wiring electrically coupled to the second electrode via the conductive via plug, and a first wiring that is capacitively-coupled to the second wiring and to the second electrode.
1. A semiconductor integrated circuit device comprising:
a semiconductor substrate including a first element area that is defined by an element separating area;
a flash memory cell formed in the first element area on the semiconductor substrate and including
a tunnel insulating film formed in the first element area on the semiconductor substrate,
a floating gate formed above the tunnel insulating film,
a first insulating film formed above the floating gate,
a control gate formed above the first insulating film, and
a source area and a drain area formed in the semiconductor substrate in the first element area;
a first laminated wiring pattern formed in the element separating area, the first laminated wiring pattern including
a first electrode pattern,
a second insulating film formed above the first electrode pattern, and
a second electrode pattern formed above the second insulating film;
a first interlayer insulating film formed above the flash memory cell and the first laminated wiring pattern on the semiconductor substrate;
a first wiring pattern formed above the first interlayer insulating film and connected to a first power source; and
a second wiring pattern formed above the first interlayer insulating film and connected to a second power source,
wherein
the first wiring pattern and the second wiring pattern are capacitively-coupled to form a first capacitor,
the second wiring pattern is formed above the first laminated wiring pattern, and the second wiring pattern and the second electrode pattern are capacitively-coupled to form a second capacitor, and
the second electrode pattern is electrically coupled to the first wiring pattern.
2. The semiconductor integrated circuit device according to claim 1 , wherein
the first electrode pattern is connected to a fixed potential power source.
3. The semiconductor integrated circuit device according to claim 1 , wherein
the floating gate has the same thickness as the first electrode pattern,
the first insulating film has the same thickness as the second insulating film, and
the control gate has the same thickness as the second electrode pattern.
4. The semiconductor integrated circuit device according to claim 1 , wherein
the floating gate, the control gate, the first electrode pattern, and the second electrode pattern are made of polysilicon,
a first silicide layer is formed on a top surface of the control gate, and
a second silicide layer is formed on a top surface of the second electrode pattern.
5. The semiconductor integrated circuit device according to claim 1 , further comprising:
a second interlayer insulating film covering the flash memory cell and the first laminated wiring pattern,
wherein the first interlayer insulating film is formed above the second interlayer insulating film.
6. The semiconductor integrated circuit device according to claim 1 , further comprising:
a second laminated wiring pattern formed in the element separating area on the semiconductor substrate, the second laminated wiring pattern including
a third electrode pattern,
a third insulating film formed above the third electrode pattern, and
a fourth electrode pattern formed above the third insulating film.
7. The semiconductor integrated circuit device according to claim 1 , further comprising:
a third interlayer insulating film formed above the first interlayer insulating film; and
a second wiring layer formed in the third interlayer insulating film,
wherein the second wiring layer includes a third wiring pattern formed above the first wiring pattern, and
the third wiring pattern is electrically coupled to the second wiring pattern.
8. The semiconductor integrated circuit device according to claim 1 , wherein
the second electrode pattern has a greater width than that of the control gate.
9. The semiconductor integrated circuit device according to claim 1 , wherein
the first laminated wiring pattern is formed in the element separating area.
10. The semiconductor integrated circuit device according to claim 1 , wherein
the semiconductor substrate further includes a second element area that is defined by the element separating area,
wherein the semiconductor integrated circuit device further includes a MOS transistor formed in the second element area on the semiconductor substrate, the MOS transistor including
a gate insulating film formed on the semiconductor substrate,
a gate electrode formed on the gate insulating film, and
a source area and a drain area formed in the semiconductor substrate in the second element area.