Exposure apparatus and exposure method using the same

1. An exposure apparatus comprising:

a light source unit configured to emit light;

a substrate stage configured to support a substrate that has an exposure area and a non-exposure area; and

a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area;

wherein the prism unit comprises a first prism and a second prism positioned with a gap therebetween, the first and second prisms having substantially a same shape,

wherein the first prism has a first surface and a second surface, the first prism movable so that the light is incident upon the first surface and the second surface selectively reflects or transmits the light,

wherein when the prism unit overlaps the exposure area, the first prism is movable so as to transmit the light through the second surface,

wherein a first angle θ1 between the light incident on the first surface and a normal of the second surface is smaller than sin −1 (n o /n 1 ), where n is a refractive index of the first prism, and n o is a refractive index of a space outside the first prism,

wherein when the prism unit overlaps the non-exposure area, the first prism is movable so as to substantially reflect the light, and

wherein a second angle θ2 between the light incident on the first surface and the normal of the second surface is greater than or equal to sin −1 (n o /n 1 ).

2. The exposure apparatus of claim 1 , wherein the second prism is separated from the first prism, and has a third surface parallel to the second surface.

3. The exposure apparatus of claim 2 , wherein a refractive index of the second prism is substantially the same as the refractive index of the first prism.

4. The exposure apparatus of claim 1 , wherein when the first prism comprises quartz and when the refractive index no of the space outside the first prism is substantially 1.0, the second angle θ2 is greater than or equal to 40.716 °.

5. The exposure apparatus of claim 1 , wherein the substrate stage is configured to move the substrate in a first direction.

6. The exposure apparatus of claim 5 , wherein the prism unit is movable in the first direction.

7. The exposure apparatus of claim 6 , wherein when the light is irradiated onto the exposure area, the prism unit moves in a second direction while transmitting the light.

8. The exposure apparatus of claim 7 , wherein when overlapping the non-exposure area, the prism unit substantially reflects the light.

9. An exposure method comprising:

providing a substrate comprising an exposure area and a non-exposure area;

irradiating light onto the substrate;

inputting the light to a prism unit;

while overlapping the prism unit and the exposure area, moving the prism unit so as to transmit the light through the prism unit and onto the exposure area of the substrate; and

while overlapping the prism unit and the exposure area, moving the prism unit so as to block the light from the non-exposure area by substantially reflecting the light;

wherein the prism unit comprises a first prism and a second prism positioned with a gap therebetween, the first and second prisms having substantially a same shape,

wherein the first prism has a first surface and a second surface, the first prism movable so that the light is incident upon the first surface and the second surface selectively reflects or transmits the light,

wherein when the prism unit overlaps the exposure area, the first prism is movable so as to transmit the light through the second surface,

wherein a first angle θ1 between the light incident on the first surface and a normal of the second surface is smaller than sin −1 (n o /n 1 ), where n 1 is a refractive index of the first prism, and no is a refractive index of a space outside the first prism,

wherein when the prism unit overlaps the non-exposure area, the first prism is movable so as to substantially reflect the light, and

wherein a second angle θ2 between the light incident on the first surface and the normal of the second surface is greater than or equal to sin −1 (n o /n 1 ).

10. The exposure method of claim 9 , wherein the second prism is separated from the first prism, and has a third surface parallel to the second surface.

11. The exposure method of claim 9 , wherein the moving the prism unit so as to block the light further comprises driving the first prism such that a second angle θ2 between the light incident on the first surface and the normal of the second surface is greater than or equal to sin −1 (n o /n 1 ), where n 1 is the refractive index of the first prism, and no is the refractive index of the space outside the first prism.

12. The exposure method of claim 9 , wherein when the first prism comprises quartz and when the refractive index no of the space outside the first prism is substantially one, the second angle θ2 is greater than or equal to 40.716 °.

13. The exposure method of claim 9 , further comprising moving the substrate in a first direction.

14. The exposure method of claim 13 , further comprising moving the prism unit in the first direction.

15. The exposure method of claim 14 , wherein the moving the prism unit so as to transmit the light further comprises moving the prism unit in a second direction while transmitting the light.

16. The exposure method of claim 15 , wherein the moving the prism unit so as to block the light further comprises substantially reflecting the light with the prism unit.