MAGNETIC TRANSFER MASTER SUBSTRATE, MAGNETIC TRANSFER METHOD AND METHOD OF MANUFACTURING THE SUBSTRATE
A magnetic transfer master substrate may have a ferromagnet pattern corresponding to a signal array. The substrate may include a non-magnetic base having depressed portions, formed on a surface thereof, which correspond to the signal array. A ferromagnet may be disposed in the depressed portions and includes a portion protruding above said surface. A section through the portion of the ferromagnet protruding from said surface taken perpendicularly to a surface of the substrate, includes a curved corner, a radius of curvature of which is no less than 2 nm and no more than 10 nm. The ferromagnet protrudes from the surface of the base by a distance no less than 2 nm and no more than 15 nm. A magnetic transfer method may include bringing the master substrate and a magnetic recording medium into contact and applying a magnetic field to record a magnetization pattern.
1 . A magnetic transfer master substrate having a ferromagnet pattern corresponding to a signal array for transferring an information signal therein to a magnetic recording medium, the substrate comprising:
a non-magnetic base having depressed portions, formed on a surface thereof, corresponding to the signal array; and
a ferromagnet, disposed in the depressed portions and including a portion protruding above said surface, wherein
a section through the portion of the ferromagnet protruding from said surface, taken perpendicularly to a surface of the substrate, includes a curved corner, a radius of curvature of which is no less than 2 nm and no more than 10 nm, and
the ferromagnet protrudes from said surface of the base by a distance no less than 2 nm and no more than 15 nm.
2 . The magnetic transfer substrate according to claim 1 , wherein the magnetic transfer master substrate has a track pattern smaller than 100 nm.
3 . The magnetic transfer substrate according to claim 1 , wherein the base is formed of a material selected from the group consisting of Si, SiO 2 , Al, Al 2 O 3 , and compounds thereof.
4 . The magnetic transfer substrate according to claim 1 , wherein the ferromagnet is formed of a material selected from the group consisting of Fe, Co, Cr, Ni, and compounds thereof.
5 . The magnetic transfer substrate according to claim 1 , wherein the curved corner is a rounded corner having a uniform curvature.
6 . A magnetic transfer method comprising:
bringing the master substrate according to claim 1 and a magnetic recording medium into contact, one on top of the other;
applying a magnetic field to the contacting master substrate and magnetic recording medium, and recording a magnetization pattern corresponding to the ferromagnet pattern of the master substrate, on the magnetic recording medium; and
separating the contacting master substrate and magnetic recording medium.
7 . A method of manufacturing a magnetic transfer master substrate having a ferromagnet pattern corresponding to a signal array for transferring an information signal therein to a magnetic recording medium, the method comprising:
providing a non-magnetic base;
forming depressed portions, corresponding to the signal array, in a surface of the base;
depositing a ferromagnet on said surface of the base, including in the depressed portions; and
etching the base and the ferromagnet at a lower etching rate for the ferromagnet than for the base so as to form the ferromagnet pattern, wherein
the ferromagnet protrudes from said surface by a distance no less than 2 nm and no greater than 15 nm, and
a section of the ferromagnet that protrudes from said surface of the base, and that is taken perpendicularly to a surface of the substrate, includes a curved corner, a radius of curvature of which is no less than 2 nm and no more than 10 nm.
8 . The method according to claim 7 , wherein the ferromagnet is deposited such that a top surface of the ferromagnet is flat.
9 . The method according to claim 7 , wherein a ratio of the etching rate of the ferromagnet to the etching rate of the base is 1 to 50.
10 . The method according to claim 7 , wherein a ratio of the etching rate of the ferromagnet to the etching rate of the base is 2 to 5.
11 . The method according to claim 7 , wherein said etching includes reactive ion etching, further comprising controlling an RF power and a substrate bias during said reactive ion etching.
12 . The method according to claim 11 , wherein a ratio of the RF power to the substrate bias is 1 to 50.
13 . The method according to claim 11 , wherein a ratio of the RF power to the substrate bias is 1 to 20.
14 . The method of claim 11 , wherein the RF power is in the range of 10 W to 1,500 W.
15 . The method of claim 11 , wherein the substrate bias is in the range of 5 W to 800 W.
16 . The method according to claim 7 , wherein said etching includes chemical mechanical polishing.
17 . The method according to claim 16 , wherein said chemical mechanical polishing includes etching with a slurry that has a pH of less than 8.
18 . The method according to claim 7 , wherein the magnetic transfer master substrate has a track pattern smaller than 100 nm.
19 . The method according to claim 7 , wherein the curved corner is a round corner having a uniform curvature.