Semiconductor device
The CMOS inverter coupled circuit is composed of CMOS inverters using SGTs and series-connected in two or more stages. Multiple CMOS inverters share source diffusion layers on a substrate. The CMOS inverters different in the structure of a contact formed on gate wires are alternately arranged next to each other. The CMOS inverters are provided at the minimum intervals. The output terminal of a CMOS inverter is connected to the wiring layer of the next-stage CMOS inverter via the contact of the next-stage CMOS inverter.
1. A semiconductor device comprising a CMOS inverter coupled circuit in which CMOS inverters are connected in at least two or more stages, wherein:
said CMOS inverters are composed of vertical MOS transistors in which a source diffusion layer, a drain diffusion layer, and a columnar semiconductor layer are provided in a vertical hierarchical structure, said columnar semiconductor layer is provided between said source diffusion layer and drain diffusion layer, and a gate electrode is formed on the sidewall of said columnar semiconductor layer;
said CMOS inverter coupled circuit includes a first CMOS inverter in the first stage that is composed of multiple vertical MOS transistors aligned in the first column on a substrate and a second CMOS inverter in the second stage that is composed of multiple vertical MOS transistors aligned in the second column on said substrate;
said multiple vertical MOS transistors aligned in the first column are composed of one or multiple first NMOS vertical transistors formed on a first N+ source diffusion layer and one or multiple first PMOS vertical transistors formed on a first P+ source diffusion layer;
said first N+ source diffusion layer and first P+ source diffusion layer are formed next to each other;
a first potential is supplied to said first N+ source diffusion layer and a second potential is supplied to said first P+ source diffusion layer;
the gate electrode of said one or multiple first NMOS vertical transistors and the gate electrode of said one or multiple first PMOS vertical transistors are connected and form a first gate wire;
a first contact for supplying an input voltage to the first CMOS inverter is formed at an end of said first gate wire;
a first N+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple first NMOS vertical transistors, and a second contact connecting said first N+ drain diffusion layer and a first wiring layer to which the output voltage of said first inverter is output is formed on said first N+ drain diffusion layer;
a first P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple first PMOS vertical transistors, and a third contact connecting said first P+ drain diffusion layer and the first wiring layer to which the output voltage of said first inverter is output is formed on said first P+ drain diffusion layer;
said multiple vertical MOS transistors aligned in the second column are formed by one or multiple second NMOS vertical transistors formed on said first N+ source diffusion layer and one or multiple second PMOS vertical transistors formed on said first P+ source diffusion layer;
the gate electrode of said one or multiple second NMOS vertical transistors and the gate electrode of said one or multiple second PMOS vertical transistors are connected and form a second gate wire;
a fourth contact for supplying an input voltage to the second CMOS inverter is formed at the other end of said second gate wire;
said fourth contact is connected to said first wiring layer;
a second N+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple second NMOS vertical transistors, and a fifth contact connecting said second N+ drain diffusion layer and a second wiring layer to which the output voltage of said second inverter is output is formed on said second N+ drain diffusion layer;
a second P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple second PMOS vertical transistors, and a sixth contact connecting said second P+ drain diffusion layer and the second wiring layer to which the output voltage of said second inverter is output is formed on said second P+ drain diffusion layer; and
said first CMOS inverter and second CMOS inverter are alternately connected.
2. A semiconductor device comprising a CMOS inverter coupled circuit in which CMOS inverters are connected in at least two or more stages, wherein:
said CMOS inverters are composed of vertical MOS transistors in which a source diffusion layer, a drain diffusion layer, and a columnar semiconductor layer are provided in a vertical hierarchical structure, said columnar semiconductor layer is provided between said source diffusion layer and drain diffusion layer, and a gate electrode is formed on the sidewall of said columnar semiconductor layer;
said CMOS inverter coupled circuit includes a first CMOS inverter in the first stage that is composed of multiple vertical MOS transistors aligned in the first column on a substrate and a second CMOS inverter in the second stage that is composed of multiple vertical MOS transistors aligned in the second column on said substrate;
said multiple vertical MOS transistors aligned in the first column are composed of one or multiple first NMOS vertical transistors formed on a first N+ source diffusion layer and one or multiple first PMOS vertical transistors formed on a first P+ source diffusion layer;
said first N+ source diffusion layer and first P+ source diffusion layer are formed next to each other;
a first potential is supplied to said first N+ source diffusion layer and a second potential is supplied to said first P+ source diffusion layer;
the gate electrode of said one or multiple first NMOS vertical transistors and the gate electrode of said one or multiple first PMOS vertical transistors are connected and form a first gate wire;
a first contact for supplying an input voltage to the first CMOS inverter is formed on said first gate wire in the region above an element separation formed between said first N+ source diffusion layer and first P+ source diffusion layer;
a first N+ drain diffusion layer is formed in the upper part of columnar semiconductor layers forming said one or multiple first NMOS vertical transistors, and a second contact connecting said first N+ drain diffusion layer and a first wiring layer to which the output voltage of said first inverter is output is formed on said first N+ drain diffusion layer;
a first P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple first PMOS vertical transistors, and a third contact connecting said first P+ drain diffusion layer and a second wiring layer to which the output voltage of said first inverter is output is formed on said first P+ drain diffusion layer;
said multiple vertical MOS transistors aligned in the second column are formed by one or multiple second NMOS vertical transistors formed on said first N+ source diffusion layer and one or multiple second PMOS vertical transistors formed on said first P+ source diffusion layer;
the gate electrode of said one or multiple second NMOS vertical transistors and the gate electrode of said one or multiple second PMOS vertical transistors are connected and form a second gate wire;
a fourth contact for supplying an input voltage to the second CMOS inverter is formed at one end of said second gate wire;
said fourth contact is connected to said first wiring layer;
a fifth contact for supplying an input voltage to the second CMOS inverter is formed at the other end of said second gate wire;
said fifth contact is connected to said second wiring layer;
a second N+ drain diffusion layer is formed in the upper part of columnar semiconductor layers forming said one or multiple second NMOS vertical transistors, and a sixth contact connecting said second N+ drain diffusion layer and a third wiring layer to which the output voltage of said second CMOS inverter is output is formed on said second N+ drain diffusion layer;
a second P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple second PMOS vertical transistors, and a seventh contact connecting said second P+ drain diffusion layer and the third wiring layer to which the output voltage of said second CMOS inverter is output is formed on said second P+ drain diffusion layer; and
said first CMOS inverter and second CMOS inverter are alternately connected.
3. The semiconductor device according to claim 2 wherein said first wiring layer and second wiring layer are connected to each other by a fourth wiring layer formed on a layer above said first wiring layer and said second wiring layer.
4. A semiconductor device comprising a CMOS inverter coupled circuit in which CMOS inverters are connected in at least two or more stages, wherein:
said CMOS inverters are composed of vertical MOS transistors in which a source diffusion layer, a drain diffusion layer, and a columnar semiconductor layer are provided in a vertical hierarchical structure, said columnar semiconductor layer is provided between said source diffusion layer and drain diffusion layer, and a gate electrode is formed on the sidewall of said columnar semiconductor layer;
said CMOS inverter coupled circuit includes a first CMOS inverter in the first stage that is composed of multiple vertical MOS transistors aligned in the first column on a substrate and a second CMOS inverter in the second stage that is composed of multiple vertical MOS transistors aligned in the second column on said substrate;
said multiple vertical MOS transistors aligned in the first column are composed of one or multiple first NMOS vertical transistors formed on a first N+ source diffusion layer and one or multiple first PMOS vertical transistors formed on a first P+ source diffusion layer;
said first N+ source diffusion layer and first P+ source diffusion layer are formed next to each other;
a first potential is supplied to said first N+ source diffusion layer and a second potential is supplied to said first P+ source diffusion layer;
the gate electrode of said one or multiple first NMOS vertical transistors and the gate electrode of said one or multiple first PMOS vertical transistors are connected and form a first gate wire;
a first contact for supplying an input voltage to the first CMOS inverter is formed on said first gate wire in the region above an element separation formed between said first N+ source diffusion layer and first P+ source diffusion layer;
a first N+ drain diffusion layer is formed in the upper part of columnar semiconductor layers forming said one or multiple first NMOS vertical transistors, and a second contact connecting said first N+ drain diffusion layer and a first wiring layer to which the output voltage of said first inverter is output is formed on said first N+ drain diffusion layer;
a first P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple first PMOS vertical transistors, and a third contact connecting said first P+ drain diffusion layer and a second wiring layer to which the output voltage of said first inverter is output is formed on said first P+ drain diffusion layer;
said first wiring layer and second wiring layer are connected by a third wiring layer formed on a layer above said first wiring layer and said second wiring layer;
said multiple vertical MOS transistors aligned in the second column are formed by one or multiple second NMOS vertical transistors formed on said first N+ source diffusion layer and one or multiple second PMOS vertical transistors formed on said first P+ source diffusion layer;
the gate electrode of said one or multiple second NMOS vertical transistors and the gate electrode of said one or multiple second PMOS vertical transistors are connected and form a second gate wire;
a fourth contact for supplying an input voltage to said second CMOS inverter is formed at one end of said second gate wire;
said fourth contact is connected to said first wiring layer or said second wiring layer;
a fifth contact connecting a second N+ drain diffusion layer formed in the upper part of columnar semiconductor layers forming said one or multiple second NMOS vertical transistors and a fourth wiring layer to which the output voltage of said second CMOS inverter is output is formed on said second N+ drain diffusion layer;
a second P+ drain diffusion layer is formed in the upper part of columnar semiconductor layers composing said one or multiple second PMOS vertical transistors, and a sixth contact connecting said second P+ drain diffusion layer and the fourth wiring layer to which the output voltage of said second inverter is output is formed on said second P+ drain diffusion layer; and
said first CMOS inverter and second CMOS inverter are alternately connected.