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App. No. 13/100,338 · Confirmation No. 2700

ABRASIVE, POLISHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2012-08-20 CTNF Non-Final Rejection 7 View
2012-08-20 892 List of references cited by examiner 1 View
2012-08-20 1449 List of References cited by applicant and considered by examiner 1 View
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2012-06-19 TRAN.LET Transmittal Letter 1 View
2012-06-08 CTRS Requirement for Restriction/Election 7 View
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2012-06-08 FOR Foreign Reference 21 View
2012-06-08 FOR Foreign Reference 27 View
2012-06-08 FOR Foreign Reference 24 View
2012-06-08 FOR Foreign Reference 30 View
2012-06-08 N417 Electronic Filing System Acknowledgment Receipt 2 View
2012-06-08 TRAN.LET Transmittal Letter 1 View
2011-08-25 NTC.PUB Notice of Publication 1 View
2011-06-23 PD.FILED.E Priority Documents electronically retrieved by USPTO from a participating IP Office 24 View
2011-05-18 WFEE Fee Worksheet (SB06) 1 View
2011-05-18 APP.FILE.REC Filing Receipt 3 View
2011-05-04 TRNA Transmittal of New Application 1 View
2011-05-04 ADS Application Data Sheet 2 View
2011-05-04 SPEC Specification 41 View
2011-05-04 CLM Claims 3 View
2011-05-04 ABST Abstract 1 View
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2011-05-04 TRAN.LET Transmittal Letter 1 View
2011-05-04 IDS Information Disclosure Statement (IDS) Form (SB08) 1 View
2011-05-04 TRAN.LET Transmittal Letter 1 View
2011-05-04 FOR Foreign Reference 37 View
2011-05-04 FOR Foreign Reference 32 View
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2011-05-04 FOR Foreign Reference 7 View
2011-05-04 WFEE Fee Worksheet (SB06) 2 View
2011-05-04 N417 Electronic Filing System Acknowledgment Receipt 3 View
2011-05-04 WFEE Fee Worksheet (SB06) 2 View
2011-05-04 N417 Electronic Filing System Acknowledgment Receipt 2 View
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Quick Facts
App. No.
13/100,338
Filed
2011-05-04
Pub. No.
US20110207327A1
Art Unit
1716