Glass frit compositions for enamels
View Patent ↗This invention relates to glass and enamel compositions. The glass compositions comprise SiO 2 , Cs 2 O, Na 2 O, ZnO, B 2 O 3 , and TiO 2 , and optionally Bi 2 O 3 and F. The resulting compositions can be used to form an enamel on a substrate, for example, to decorate and/or protect the substrate.
1. An enamel composition comprising a solid portion comprising a frit portion, the frit portion comprising, prior to firing:
about 30 to about 50 wt % of SiO 2 ;
about 4.5 to about 20.2 wt % of Cs 2 O;
about 6.1 to about 11.5 wt % of Na 2 O;
about 6.5 to about 20.2 wt % of B 2 O 3 ;
about 8 to about 25 wt % of ZnO;
about 3.4 to about 12.3 wt % of TiO 2 ;
about 0 to about 40 wt % of Bi 2 O 3 ; and
about 0 to about 7 wt % of F.
2. The enamel composition of claim 1 , wherein the frit portion comprises:
about 32 to about 48 wt % of SiO 2 ;
about 5.5 to about 18.5 wt % of Cs 2 O;
about 7.5 to about 11.3 wt % of Na 2 O;
about 7.5 to about 18.5 wt % of B 2 O 3 ;
about 9 to about 23 wt % of ZnO;
about 4.3 to about 11.3 wt % of TiO 2 ;
about 5 to about 35 wt % of Bi 2 O 3 ; and
about 1.5 to about 6.5 wt % of F.
3. The enamel composition of claim 1 , wherein the frit portion comprises:
about 34 to about 38 wt % of SiO 2 ;
about 6.5 to about 16.5 wt % of Cs 2 O;
about 8.5 to about 11.1 wt % of Na 2 O;
about 8 to about 16.5 wt % of B 2 O 3 ;
about 10 to about 20 wt % of ZnO;
about 5.5 to about 10.3 wt % of TiO 2 ;
about 10 to about 20 wt % of Bi 2 O 3 ; and
about 2.5 to about 5.5 wt % of F.
4. The enamel composition of claim 1 , wherein the frit portion further comprises at least one selected from the group consisting of:
about 0.1 to about 1 wt % of La 2 O 3 ;
about 0.1 to about 1 wt % of Nb 2 O 5 ;
about 0.1 to about 1 wt % of MnO 2 ;
about 0.1 to about 1 wt % of CeO 2 ;
about 0.1 to about 1 wt % of MoO 3 ; and
about 0.1 to about 1 wt % of WO 3 , and
a total amount of the oxides is about 0.1 to about 5 wt % of the frit portion.
5. The enamel composition of claim 1 , wherein the frit portion further comprises at least one selected from the group consisting of:
about 0.1 to about 4 wt % of Al 2 O 3 ; and
about 0.1 to about 3 wt % of BaO.
6. The enamel composition of claim 1 , further comprising at least one crystalline seed material selected from the group consisting of zinc borates, zinc silicates, zinc titanates, bismuth silicates and combinations thereof.
7. The enamel composition of claim 1 further comprising pigments.
8. The enamel composition of claim 1 , wherein the enamel composition is lead-free and cadmium-free.
9. The enamel composition of claim 1 , wherein the frit portion has about 8.5×10 −6 ° C. −1 or less of thermal expansion coefficient.
10. The enamel composition of claim 1 , wherein the frit portion has about 1100° F. or less of firing temperature.
11. The enamel composition of claim 1 , wherein the solid portion comprises:
about 60 to about 85 wt % of the frit portion;
about 0.1 to about 30 wt % of pigments;
about 0.1 to about 15 wt % of crystalline materials;
about 10 to about 60 wt % of silver; and optionally
about 0.1 to about 5 wt % of reducing agents.
12. A method of forming an enamel composition, comprising:
combining:
about 30 to about 50 wt % of SiO 2 ;
about 4.5 to about 20.2 wt % of Cs 2 O;
about 6.1 to about 11.5 wt % of Na 2 O;
about 6.5 to about 20.2 wt % of B 2 O 3 ;
about 8 to about 25 wt % of ZnO;
about 3.4 to about 12.3 wt % of TiO 2 ;
about 0 to about 40 wt % of Bi 2 O 3 ; and
about 0 to about 7 wt % of F.
13. The method of claim 12 , further comprising:
combining at least one selected from the group consisting of:
about 0.1 to about 1 wt % of La 2 O 3 ;
about 0.1 to about 1 wt % of Nb 2 O 5 ;
about 0.1 to about 1 wt % of MnO 2 ;
about 0.1 to about 1 wt % of CeO 2 ;
about 0.1 to about 1 wt % of MoO 3 ; and
about 0.1 to about 1 wt % of WO 3 .
14. The method of claim 12 , further comprising:
combining at least one selected from the group consisting of:
about 0.1 to about 4 wt % of Al 2 O 3 ; and
about 0.1 to about 3 wt % of BaO.
15. The method of claim 12 , further comprising:
combining pigments; crystalline materials; optionally silver; and optionally reducing agents.
16. A method of forming an enamel on a substrate, comprising:
providing an enamel composition on the substrate, the enamel composition comprising a solid portion, the solid portion comprising a frit portion, the frit portion comprising, prior to firing:
about 30 to about 50 wt % of SiO 2 ;
about 4.5 to about 20.2 wt % of Cs 2 O;
about 6.1 to about 11.5 wt % of Na 2 O;
about 6.5 to about 20.2 wt % of B 2 O 3 ;
about 8 to about 25 wt % of ZnO;
about 3.4 to about 12.3 wt % of TiO 2 ;
about 0 to about 40 wt % of Bi 2 O 3 ; and
about 0 to about 7 wt % of F; and
firing the enamel composition and the substrate at a temperature sufficient to adhere the enamel composition to the substrate.
17. The method of claim 16 , wherein the frit portion further comprises at least one selected from the group consisting of:
about 0.1 to about 1 wt % of La 2 O 3 ;
about 0.1 to about 1 wt % of Nb 2 O 5 ;
about 0.1 to about 1 wt % of MnO 2 ;
about 0.1 to about 1 wt % of CeO 2 ;
about 0.1 to about 1 wt % of MoO 3 ; and
about 0.1 to about 1 wt % of WO 3 , and
a total amount of the oxides is about 0.5 to about 5 wt % of the frit portion.
18. The method of claim 16 , wherein the frit portion further comprising at least one selected from the group consisting of:
about 0.1 to about 4 wt % of Al 2 O 3 ; and
about 0.1 to about 3 wt % of BaO.
19. The method of claim 16 wherein said enamel composition is bismuth-free.