IP Library Granted Patent US 8,390,098
Granted Patent B2
US 8,390,098 · App. 13/102,749 · Granted Mar 5, 2013

Semiconductor device providing a first electrical conductor and a second electrical conductor in one through hole and method for manufacturing the same

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Quick Facts
Patent No.
US 8,390,098
App. No.
13/102,749
Granted
Mar 5, 2013
Kind
B2
Abstract

A semiconductor device 100 is provided with a multiplex through plug 111 that fills an opening extending through the silicon substrate 101 . The multiplex through plugs 111 comprises a column-shaped and solid first through electrode 103 , a first insulating film 105 that covers the cylindrical face of the first through electrode 103 , a second through electrode 107 that covers the cylindrical face of the first insulating film 105 and a second insulating film 109 that covers the cylindrical face of the second through electrode 107 , and these have a common central axis. The upper cross sections of the first insulating film 105 , the second through electrode 107 and the second insulating film 109 are annular-shaped.

Claims (13)

1. A semiconductor device, comprising:

a semiconductor substrate;

a solid plug-shaped insulating plug extending through said semiconductor substrate;

a pipe-shaped first electrical conductor, covering a circumference of said insulating plug, and extending through said semiconductor substrate;

a pipe-shaped second electrical conductor, being provided in a circumference of said first electrical conductor, and extending through said semiconductor substrate; and

an insulating film, being provided between said first electrical conductor and said second electrical conductor, and providing an electrical insulation between said first electrical conductor and said second electrical conductor.

2. The semiconductor device according to claim 1 , wherein said first electrical conductor is composed of a material, which is different from a material for composing said second electrical conductor.

3. The semiconductor device according to claim 1 , wherein one or more pipe-shaped electrical conductors containing at least said second electrical conductor are formed through the insulating film in the circumference of said first electrical conductor by taking a central axis of a through hole extending through said semiconductor substrate as an axis of said one or more pipe-shaped electrical conductors, and a material of the outermost pipe-shaped electrical conductor among said one or more pipe-shaped electrical conductors is a material having the highest melting point among a material for said first electrical conductor and materials for said one or more pipe-shaped electrical conductors.

4. The semiconductor device according to claim 1 , further comprising an extra semiconductor substrate provided with a conductive component, which is coupled to said first electrical conductor or said second electrical conductor provided in said semiconductor substrate.

5. The semiconductor device according to claim 1 , further comprising a through electrode comprising said first electrical conductor and said second electrical conductor, wherein an electric potential of said second electrical conductor is fixed at a supply potential or a ground potential, and said second electrical conductor is electrically coupled to a ground plane covering said semiconductor device.

6. The semiconductor device according to claim 1 , further comprising an outer insulating film, which is provided between said second electrical conductor and said semiconductor substrate and separates between said second electrical conductor and said semiconductor substrate.

7. The semiconductor device according to claim 1 , wherein a geometry of said outer insulating film is a cylindrical component extending through said semiconductor substrate.

8. The semiconductor device according to claim 1 , wherein said first electrical conductor and said second electrical conductor are electrically coupled to different interconnects respectively.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →