Thermal control of optical filter with local silicon frame
View Patent ↗A method comprising generating an optical beam with a laser, filtering the optical beam to select a desired wavelength with an etalon positioned in a path of the optical beam, heating the etalon to an operational temperature using a heater, monitoring the operational temperature of the etalon with a resistive thermal device disposed in or on a thermally conductive frame bonded to the etalon, and applying feedback control of the heater based on the monitoring to select the desired wavelength.
1. A method, comprising:
generating an optical beam with a laser;
filtering the optical beam to select a desired wavelength with an etalon positioned in a path of the optical beam;
heating the etalon to an operational temperature using a heater;
monitoring the operational temperature of the etalon with a resistive thermal device disposed in or on a thermally conductive frame bonded to the etalon; and
applying feedback control of the heater based on the monitoring to select the desired wavelength.
2. The method of claim 1 , wherein the laser comprises an external cavity laser.
3. The method of claim 1 , wherein the frame comprises a generally L-shaped frame.
4. The method of claim 3 , wherein the generally L-shaped frame includes a fillet, wherein the fillet includes at least one of right angled surfaces, planar surfaces, beveled surfaces, trapezoidal surfaces, or a circular surface.
5. The method of claim 1 , wherein the frame comprises a generally square shaped frame having a substantially circular opening aligned with the path of the optical beam to pass the optical beam to or from the etalon.
6. The method of claim 5 , wherein the resistive thermal device is disposed along a circumference of the substantially circular opening.
7. The method of claim 5 , wherein the heater is disposed along a circumference of the substantially circular opening.