ELECTROCONDUCTIVE LAMINATE AND PROTECTIVE PLATE FOR PLASMA DISPLAY
To provide an electroconductive laminate which has an excellent electrical conductivity (electromagnetic wave shielding properties) and a high visible light transmittance and is excellent in productivity, and a protective plate for a plasma display which has excellent electromagnetic wave shielding properties and a broad transmission/reflection band and is excellent in productivity. An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has laminated n lamination units (wherein n is an integer of from 1 to 6) each having a first metal oxide layer, a second metal oxide layer and a metal layer arranged in this order from the substrate side, and further has a first metal oxide layer disposed as the outermost layer of the electroconductive film; the first metal oxide layer is an oxide layer containing titanium element and an M element, wherein the M element is at least one element selected from the group consisting of elements having atomic weights of at least 80, and the amount of the M element is from 10 to 60 atom % in the total amount of titanium element and the M element in the first metal oxide layer; the second metal oxide layer is a layer having, as its main component, an oxide containing zinc element; the metal layer is a layer having silver as its main component; and the second metal oxide layer and the metal layer in the lamination unit are directly in contact with each other.
1 . An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has laminated n lamination units (wherein n is an integer of from 1 to 6) each having a first metal oxide layer, a second metal oxide layer and a metal layer arranged in this order from the substrate side, and further has a first metal oxide layer disposed as the outermost layer of the electroconductive film; the first metal oxide layer is an oxide layer containing titanium element and an M element, wherein the M element is at least one element selected from the group consisting of elements having atomic weights of at least 80, and the amount of the M element is from 10 to 60 atom % in the total amount of titanium element and the M element in the first metal oxide layer; the second metal oxide layer is a layer having, as its main component, an oxide containing zinc element; the metal layer is a layer having silver as its main component; and the second metal oxide layer and the metal layer in the lamination unit are directly in contact with each other.
2 . An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has laminated n lamination units (wherein n is an integer of from 1 to 6) each having a first metal oxide layer, a second metal oxide layer and a metal layer arranged in this order from the substrate side, and further has a first metal oxide layer disposed as the outermost layer of the electroconductive film; the first metal oxide layer is an oxide layer containing titanium element and an M element, wherein the M element is niobium element, tantalum element, zirconium element or hafnium element, and the amount of the M element is from 10 to 60 atom % in the total amount of titanium element and the M element in the first metal oxide layer; the second metal oxide layer is a layer having, as its main component, an oxide containing zinc element; the metal layer is a layer having silver as its main component; and the second metal oxide layer and the metal layer in the lamination unit are directly in contact with each other.
3 . The electroconductive laminate according to claim 1 , wherein the lamination unit further has a third metal oxide layer on the surface of the metal layer at the side opposite to the substrate, and the third metal oxide layer is a layer having, as its main component, an oxide containing zinc element.
4 . The electroconductive laminate according to claim 2 , wherein the M element is zirconium element.
5 . A protective plate for a plasma display, comprising a supporting substrate and an electroconductive laminate as defined in claim 1 , provided on the supporting substrate.
6 . A process for producing an electroconductive laminate, which comprises repeating the following steps (1) to (3) n times (wherein n is an integer of from 1 to 6);
and then forming a first metal oxide layer as the outermost layer by carrying out the following step (1):
(1) a step of forming a first metal oxide layer on one surface of a substrate by a sputtering method using a target containing titanium element and an M element (wherein the M element is at least one element selected from the group consisting of elements having atomic weights of at least 80);
(2) a step of forming a second metal oxide layer by a sputtering method using a target containing zinc element;
(3) a step of forming a metal layer by a sputtering method using a target containing silver as its main component.
7 . A process for producing an electroconductive laminate, which comprises repeating the following steps (1) to (4) n times (wherein n is an integer of from 1 to 6); and then forming a first metal oxide layer as the outermost layer by carrying out the following step (1):
(1) a step of forming a first metal oxide layer on one surface of a substrate by a sputtering method using a target containing titanium element and an M element (wherein the M element is at least one element selected from the group consisting of elements having atomic weights of at least 80);
(2) a step of forming a second metal oxide layer by a sputtering method using a target containing zinc element;
(3) a step of forming a metal layer by a sputtering method using a target containing silver as its main component;
(4) a step of forming a third metal oxide layer by a sputtering method using a target containing zinc element.
8 . A process for producing an electroconductive laminate, which comprises repeating the following steps (1) to (3) in total n times (wherein n is an integer of from 1 to 6); and then forming a first metal oxide layer as the outermost layer by carrying out the following step (1):
(1) a step of forming a first metal oxide layer on one surface of a substrate by a sputtering method using a target containing titanium element and an M element (wherein the M element is niobium element, tantalum element, zirconium element or hafnium element);
(2) a step of forming a second metal oxide layer by a sputtering method using a target containing zinc element;
(3) a step of forming a metal layer by a sputtering method using a target containing silver as its main component.
9 . A process for producing an electroconductive laminate, which comprises repeating the following steps (1) to (4) in total n times (wherein n is an integer of from 1 to 6); and then forming a first metal oxide layer as the outermost layer by carrying out the following step (1):
(1) a step of forming a first metal oxide layer on one surface of a substrate by a sputtering method using a target containing titanium element and an M element (wherein the M element is niobium element, tantalum element, zirconium element or hafnium element);
(2) a step of forming a second metal oxide layer by a sputtering method using a target containing zinc element;
(3) a step of forming a metal layer by a sputtering method using a target containing silver as its main component;
(4) a step of forming a third metal oxide layer by a sputtering method using a target containing zinc element.