Solid state imaging device with wiring lines shifted for pupil correction and simplified wiring pattern and method of manufacturing the same

1. A solid-state imaging device comprising:

an imaging area that includes

arrayed pixels having photoelectric converting units and transistor elements, and

first wiring lines, which extend in a wiring direction, are connected to corresponding ones of the transistor elements, and are disposed in the imaging area; and

a peripheral circuit including second wiring lines that extend in the wiring direction and are disposed in a predetermined wiring pattern,

wherein each of the first wiring lines has a connection expanded portion integrally formed therewith, each connection expanded portion having a longitudinal axis extending in a direction transverse to the wiring direction,

wherein each of the first wirings is connected through its connection expanded portion to a corresponding one of the second wirings, and

wherein at least some of the first wirings are shifted away from their respectively corresponding second wirings in the direction transverse to the wiring direction by respective shift amounts that are each based on a pupil correction amount.

2. The solid-state imaging device of claim 1 , wherein the connection expanded portions of the first wiring lines have substantially identical lengths along their longitudinal axis.

3. The solid-state imaging device of claim 2 , wherein the magnitude of the length of each connection expanded portion along their longitudinal axis is equal to or greater than a value corresponding to a maximum shift amount of the first wiring lines.

4. The solid-state imaging device of claim 1 ,

wherein each of the second wiring lines has a second connection expanded portion integrally formed therewith, each second connection expanded portion having a longitudinal axis extending in the direction transverse to the longitudinal wiring direction, and

wherein each of the first wiring lines is connected to its corresponding second wiring line through the second connection expanded portion of the corresponding second wiring line as well as through the connection expanded portion of the respective first wiring line.

5. The solid-state imaging device of claim 1 ,

wherein the connection expanded portion of each of the first wiring lines is located at a boundary between the imaging area and the peripheral circuit.

6. The solid-state imaging device of claim 1 ,

wherein the first wiring lines and the second wiring lines are formed of wiring layers different from each other.

7. The solid-state imaging device of claim 1 ,

wherein the peripheral circuit is configured to selectively provide signals to the first wiring lines.

8. The solid-state imaging device of claim 1 ,

wherein the peripheral circuit is configured to receive and selectively process signals from the first wiring lines.

9. A solid-state imaging device comprising:

an imaging area that includes

arrayed pixels having photoelectric converting units and transistor elements, and

first wiring lines, which extend in a wiring direction, are connected to corresponding ones of the transistor elements, and are disposed in the imaging area; and

a peripheral circuit including second wiring lines that extend in the wiring direction and are disposed in a predetermined wiring pattern,

wherein each of the second wiring lines has a connection expanded portion integrally formed therewith, each of the connection expanded portions having a longitudinal axis extending in a direction transverse to the wiring direction,

wherein each of the second wirings is connected through its connection expanded portion to a corresponding one of the first wirings, and

wherein at least some of the first wirings are shifted away from their respectively corresponding second wirings in the direction transverse to the wiring direction by respective shift amounts that are each based on a pupil correction amount.

10. A solid-state imaging device comprising:

an imaging area that includes

arrayed pixels having photoelectric converting units and transistor elements, and

first wiring lines, which extend in a wiring direction, are connected to corresponding ones of the transistor elements, and are disposed in the imaging area; and

a peripheral circuit including a plurality of first elements respectively corresponding to the first wiring lines,

wherein each of the first elements has an output contact and the output contacts of the first elements are disposed at predetermined locations,

wherein each of the first wiring lines has a connection expanded portion integrally formed therewith, each of the connection expanded portions having a longitudinal axis extending in a direction transverse to the wiring direction,

wherein each of the first wirings is connected through its connection expanded portion to its corresponding output contact, and

wherein at least some of the first wirings are shifted away from their respectively corresponding output contact in the direction transverse to the wiring direction by respective shift amounts that are each based on a pupil correction amount.

11. A method of manufacturing a solid-state imaging device comprising:

forming an imaging area that includes arrayed pixels having photoelectric converting units and transistor elements;

forming a peripheral circuit;

forming first wiring lines, which extend in a wiring direction, are connected to corresponding ones of the transistor elements, and are disposed in the imaging area;

forming second wiring lines that extend in the wiring direction and are disposed in the peripheral circuit in a predetermined wiring pattern; and

connecting each of the first wiring lines to a corresponding one of the second wiring lines through connection expanded portions integrally formed with at least one of the first and second wiring lines, each connection expanded portion having a longitudinal axis extending in a direction transverse to the wiring direction,

wherein at least some of the first wirings are shifted away from their respectively corresponding second wirings in the direction transverse to the wiring direction by respective shift amounts that are each based on a pupil correction amount.

12. The method of claim 11 , further comprising forming the first wiring lines and the second wiring lines in different wiring layers.