MICROMECHANICAL MEMBRANES AND RELATED STRUCTURES AND METHODS
Micromechanical membranes suitable for formation of mechanical resonating structures are described, as well as methods for making such membranes. The membranes may be formed by forming cavities in a substrate, and in some instances may be oxidized to provide desired mechanical properties. Mechanical resonating structures may be formed from the membrane and oxide structures.
1 . An apparatus, comprising:
a silicon substrate having a one-dimensional trench pattern formed therein comprising a plurality of trenches arranged along one axis, wherein the trench pattern is characterized by:
a) differing trench widths among multiple trenches of the pattern; and/or
b) differing periods between multiple trenches of the pattern; and/or
c) at least one trench of the pattern having a width that varies along a length of the trench.
2 . The apparatus of claim 1 , wherein multiple trenches of the pattern have non-rectangular openings.
3 . The apparatus of claim 2 , wherein at least one trench of the pattern has a non-rectangular opening that is: (i) amplitude-modulated; and/or (ii) frequency-modulated; and/or (iii) phase-modulated.
4 - 8 . (canceled)
9 . An apparatus, comprising:
a silicon substrate having a two-dimensional trench pattern formed therein comprising a plurality of trenches arranged along two axes, wherein the trench pattern is characterized by at least one of the following conditions being met along at least one of the axes: (a) trench width is variable from trench to trench; and/or (b) trench period is variable from trench to trench.
10 - 12 . (canceled)
13 . An apparatus, comprising:
a first silicon membrane formed above a first cavity in a silicon substrate; and
a second silicon membrane formed above a second cavity in the silicon substrate,
wherein a thickness of the first silicon membrane differs from a thickness of the second silicon membrane.
14 . The apparatus of claim 13 , wherein silicon oxide is formed on at least one of the first silicon membrane and the second silicon membrane, and a different configuration of silicon oxide is formed with respect to the first silicon membrane than with respect to the second silicon membrane.
15 . The apparatus of claim 13 , wherein a thickness of the first silicon membrane differs from a thickness of the second silicon membrane by between approximately 1 and 20 microns.
16 - 18 . (canceled)
19 . The apparatus of claim 13 , further comprising access holes to the first cavity and no access holes to the second cavity.
20 - 21 . (canceled)
22 . The apparatus of claim 13 , wherein a ratio of the thickness of the first silicon membrane to a longest dimension of the first silicon membrane is between approximately 1:20 and 1:500.
23 - 24 . (canceled)
25 . The apparatus of claim 14 , further comprising silicon oxide formed on a backside of the silicon substrate.
26 - 32 . (canceled)
33 . An apparatus, comprising:
a first plurality of trenches formed in a first surface of a silicon substrate and arranged in a one-dimensional pattern, each of the first plurality of trenches having a first opening area and a first depth, wherein the trenches of the first plurality of trenches are spaced by a first pitch; and
a second plurality of trenches formed in the first surface of the silicon substrate and arranged in a one-dimensional pattern, each of the second plurality of trenches having a second opening area and a second depth, wherein the trenches of the second plurality of trenches are spaced by a second pitch,
wherein at least one of the following conditions is met:
(a) the first depth differs from the second depth;
(b) the first opening area differs from the second opening area; and
(c) the first pitch differs from the second pitch.
34 . The apparatus of claim 33 , wherein (a) the first depth differs from the second depth.
35 . The apparatus of claim 33 , wherein (b) the first opening area differs from the second opening area.
36 . The apparatus of claim 33 , wherein (c) the first pitch differs from the second pitch.
37 - 38 . (canceled)
39 . The apparatus of claim 33 , wherein the first one-dimensional pattern is formed of parallel lines represented by the trenches of the first plurality of trenches.
40 . The apparatus of claim 33 , wherein an aspect ratio of trenches of the first plurality of trenches differs from an aspect ratio of trenches of the second plurality of trenches.
41 . An apparatus, comprising:
a first plurality of trenches formed in a first surface of a silicon substrate and arranged in a one-dimensional pattern, at least some of the first plurality of trenches having a first opening area and a first depth, wherein the at least some of the first plurality of trenches are spaced by a first pitch; and
a second plurality of trenches formed in the first surface of the silicon substrate and arranged in a one-dimensional pattern, at least some of the second plurality of trenches having a second opening area and a second depth, wherein the at least some of the second plurality of trenches are spaced by a second pitch,
wherein at least one of the following conditions is met:
(a) the first depth differs from the second depth;
(b) the first opening area differs from the second opening area; and
(c) the first pitch differs from the second pitch.
42 . A method of forming a plurality of silicon membranes from a silicon substrate, the method comprising:
forming a first plurality of trenches in a first surface of the silicon substrate arranged in a one-dimensional pattern, each of the first plurality of trenches having a first opening area and a first depth, wherein the trenches of the first plurality of trenches are spaced by a first pitch; and
forming a second plurality of trenches in the first surface of the silicon substrate arranged in a one-dimensional pattern, each of the second plurality of trenches having a second opening area and a second depth, wherein the trenches of the second plurality of trenches are spaced by a second pitch, and wherein at least one of the following conditions is met:
(a) the first depth differs from the second depth;
(b) the first opening area differs from the second opening area; and
(c) the first pitch differs from the second pitch; and
annealing the silicon substrate.
43 . The method of claim 42 , further comprising oxidizing at a least a portion of the silicon substrate subsequent to annealing the silicon substrate.
44 . The method of claim 43 , wherein annealing the silicon substrate forms a first silicon membrane above a first cavity formed from the first plurality of trenches and also forms a second silicon membrane above a second cavity formed from the second plurality of trenches, and wherein oxidizing at least a portion of the silicon substrate comprises oxidizing at least a portion of at least one of the first silicon membrane and the second silicon membrane.
45 . The method of claim 44 , wherein oxidizing at least a portion of at least one of the first silicon membrane and the second silicon membrane comprises depositing on the first silicon membrane silicon oxide having a total thickness between approximately 30% and 200% of a thickness of the first silicon membrane.
46 . The method of claim 44 , wherein oxidizing at least a portion of at least one of the first silicon membrane and the second silicon membrane comprises simultaneously oxidizing a top surface and a bottom surface of the first silicon membrane.
47 . The method of claim 42 , wherein (a) the first depth differs from the second depth.
48 . The method of claim 42 , wherein (b) the first opening area differs from the second opening area.
49 . The method of claim 42 , wherein (c) the first pitch differs from the second pitch.
50 - 51 . (canceled)
52 . The method of claim 42 , wherein the first one-dimensional pattern is formed of parallel lines represented by the trenches of the first plurality of trenches.
53 . The method of claim 42 , wherein an aspect ratio of trenches of the first plurality of trenches differs from an aspect ratio of trenches of the second plurality of trenches.
54 . A method, comprising:
forming a first silicon membrane from a silicon substrate by forming a first cavity in the silicon substrate;
forming a second silicon membrane from the silicon substrate by forming a second cavity in the silicon substrate; and
forming silicon oxide on at least a portion of at least one of the first silicon membrane and the second silicon membrane, comprising forming a different silicon oxide configuration with respect to the first silicon membrane than with respect to the second silicon membrane.
55 . An apparatus, comprising:
a first silicon membrane formed above a first cavity in a silicon substrate; and
a second silicon membrane formed above a second cavity in the silicon substrate,
wherein silicon oxide is formed on at least one of the first silicon membrane and the second silicon membrane, and a different configuration of silicon oxide is formed with respect to the first silicon membrane than with respect to the second silicon membrane.
56 . The apparatus of claim 55 , wherein a thickness of the first silicon membrane differs from a thickness of the second silicon membrane by between approximately 1 and 20 microns.
57 - 59 . (canceled)
60 . The apparatus of claim 55 , further comprising access holes to the first cavity and no access holes to the second cavity.
61 - 62 . (canceled)
63 . The apparatus of claim 55 , wherein a ratio of a thickness of the first silicon membrane to a longest dimension of the first silicon membrane is between approximately 1:20 and 1:500.
64 - 65 . (canceled)
66 . The apparatus of claim 55 , further comprising silicon oxide formed on a backside of the silicon substrate.
67 - 73 . (canceled)
74 . The apparatus of claim 73 , further comprising silicon oxide on a backside of the silicon substrate.
75 . An apparatus, comprising:
a plurality of trenches formed in a substrate, wherein a trench width, pitch or shape varies among the plurality of trenches.
76 . A method, comprising;
annealing the apparatus of claim 75 , resulting in a membrane having a thickness gradient.
77 . The method of claim 76 , wherein the membrane contains at least two regions with constant thickness, resulting in at least two distinct thicknesses within the membrane.