Conductive layer including implanted metal ions
View Patent ↗A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
1. An apparatus comprising:
a substrate comprising quartz;
a silicon oxide or silicon nitride layer which has micropatterns formed thereon and is formed on the substrate; and
a conductive layer formed of conductive metal ions implanted in the silicon oxide or silicon nitride layer.
2. The apparatus of claim 1 , wherein a thickness of the conductive layer is less than a skin depth.
3. The apparatus of claim 1 , wherein a light transmittance of the conductive layer is 80% or greater.
4. The apparatus of claim 1 , wherein the conductive layer includes chromium ions, titanium ions, silver ions, gold ions, aluminum ions, or platinum ions.
5. An apparatus comprising:
a substrate comprising quartz;
a polymer layer which has micropatterns formed thereon and is formed on the substrate; and
a conductive layer formed of conductive metal ions implanted in the polymer layer.
6. The apparatus of claim 5 , wherein a thickness of the conductive layer is less than a skin depth.
7. The apparatus of claim 5 , wherein a light transmittance of the conductive layer is 80% or greater.
8. The apparatus of claim 5 , wherein the conductive layer includes chromium ions, titanium ions, silver ions, gold ions, aluminum ions, or platinum ions.
9. An apparatus comprising:
a substrate comprising quartz;
a polymer layer which is formed on the substrate;
a silicon oxide layer or a silicon nitride layer which has micropatterns formed thereon and is formed on the polymer layer; and
a conductive layer formed of conductive metal ions implanted in the silicon oxide or silicon nitride layer.
10. The apparatus of claim 9 , wherein a thickness of the conductive layer is less than a skin depth.
11. The apparatus of claim 9 , wherein a light transmittance of the conductive layer is 80% or greater.
12. The apparatus of claim 9 , wherein the conductive layer includes chromium ions, titanium ions, silver ions, gold ions, aluminum ions, or platinum ions.
13. An apparatus comprising:
a substrate comprising quartz;
a polymer layer formed on the substrate;
a conductive layer formed on the polymer layer, wherein the conductive layer transmits light; and
a silicon oxide layer or a silicon nitride layer which has micropatterns formed thereon and is formed on the conductive layer.
14. The apparatus of claim 13 , wherein a thickness of the conductive layer is less than a skin depth.
15. The apparatus of claim 13 , wherein a light transmittance of the conductive layer is 80% or greater.
16. The apparatus of claim 13 , wherein the conductive layer includes chromium ions, titanium ions, silver ions, gold ions, aluminum ions, or platinum ions.