Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
View Patent ↗A superabrasive tools having uniformly leveled superabrasive particles and associated methods are provided. In one aspect, for example, a superabrasive can include a metal matrix configured for bonding superabrasive particles and a plurality of superabrasive particles held in the metal matrix at specific positions according to a predetermined pattern, wherein tips of each of the plurality of the superabrasive particles protrude from the metal matrix to a uniform height.
1. A CMP pad dresser having a superabrasive impregnated segment, comprising:
a flat disk having a 4 inch diameter;
a metal matrix covering a surface of the flat disk, the metal matrix configured for bonding superabrasive particles; and
a plurality of superabrasive particles held in the metal matrix at specific positions according to a predetermined pattern, wherein tips of each of the plurality of the superabrasive particles protrude from the metal matrix to a uniform height, wherein the uniform height has a variance that is less than or equal to 50 μm, and wherein the plurality of superabrasive particles are positioned such that superabrasive particles at edges of the flat disk are larger in size as compared to superabrasive particles at a middle portion of the flat disk.
2. The tool of claim 1 , wherein the predetermined pattern is a uniform pattern.
3. The tool of claim 1 , wherein the plurality of superabrasive particles is diamond or cBN.
4. The tool of claim 1 , wherein the plurality of superabrasive particles is diamond.
5. A method for making a CMP pad dresser, comprising:
applying a metal matrix to a flat disk having a 4 inch diameter;
arranging a plurality of superabrasive particles in the metal matrix at specific positions such that the plurality of superabrasive particles are held in the metal matrix according to a predetermined pattern, wherein tips of each of the plurality of the superabrasive particles protrude from the metal matrix to a uniform height, wherein the uniform height has a variance that is less than or equal to 50 μm, and wherein the plurality of superabrasive particles are positioned such that superabrasive particles at edges of the flat disk are larger in size as compared to superabrasive particles at a middle portion of the flat disk.
6. The method of claim 5 , wherein arranging the plurality of superabrasive particles includes:
placing a template with a plurality of apertures formed therein on the metal matrix;
filling the apertures of the template with superabrasive particles;
pressing the superabrasive particles at least partially into the metal matrix; and
removing the template.
7. The method of claim 5 , wherein the template is configured to hold only one superabrasive particle in each aperture.
8. The method of claim 5 , wherein the predetermined pattern is a uniform pattern.
9. The method of claim 5 , wherein the plurality of superabrasive particles is diamond or cBN.
10. The method of claim 5 , wherein the plurality of superabrasive particles is diamond.
11. A method for making a CMP pad dresser, comprising:
providing a template disposed on a flat disk having a 4 inch diameter, the template having a plurality of apertures formed therein;
filling the apertures of the template with superabrasive particles;
removing the template such that the plurality of superabrasive particles are maintained at specific positions according to a predetermined pattern; and
forming a metal matrix to hold the plurality of superabrasive particles in the predetermined pattern, wherein tips of each of the plurality of the superabrasive particles protrude from the metal matrix to a uniform height, wherein the uniform height has a variance that is less than or equal to 50 μm, and wherein the plurality of superabrasive particles are positioned such that superabrasive particles at edges of the flat disk are larger in size as compared to superabrasive particles at a middle portion of the flat disk.
12. The method of claim 11 , wherein the template is configured to hold only one superabrasive particle in each aperture.
13. The method of claim 11 , wherein the predetermined pattern is a uniform pattern.
14. The method of claim 11 , wherein the plurality of superabrasive particles is diamond or cBN.
15. The method of claim 11 , wherein the plurality of superabrasive particles is diamond.