IP Library Granted Patent US 8,889,476
Granted Patent B2
US 8,889,476 · App. 13/123,072 · Granted Nov 18, 2014

Formulations comprising a mixture of ZnO cubanes and process using them to produce semiconductive ZnO layers

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Quick Facts
Patent No.
US 8,889,476
App. No.
13/123,072
Granted
Nov 18, 2014
Kind
B2
Abstract

The present invention relates to formulations comprising a) at least two different ZnO cubanes of which at least one ZnO cubane is present in solid form under SATP conditions and at least one ZnO cubane is present in liquid form under SATP conditions, and b) at least one solvent, to processes for producing semiconductive ZnO layers from these formulations, to the use of the formulations for producing electronic components and to the electronic components themselves.

Claims (26)

1. A formulation comprising

a) at least two different ZnO cubanes of which

i) at least one ZnO cubane is present in solid form under SATP conditions and

ii) at least one ZnO cubane is present in liquid form under SATP conditions, and

b) at least one solvent.

2. A formulation according to claim 1 , wherein the ZnO cubane present in solid form under SATP conditions, at 10 5 Pa, has a decomposition point of 120-300° C.

3. A formulation according to claim 1 , wherein the ZnO cubane present in solid form under SATP conditions is a ZnO cubane of the generic formula [R 1 Zn(OR 2 )] 4 where R 1 =Me or Et and R 2 =t-Bu or i-Pr.

4. A formulation according to claim 1 , wherein the ZnO cubane present in liquid form under SATP conditions, at standard pressure, has a melting point of 25 to −100° C.

5. A formulation according to claim 1 , wherein the ZnO cubane present in liquid form under SATP conditions is a ZnO cubane of the generic formula [R 1 Zn(OR 2 )] 4 where R 1 =Me or Et and R 2 =CH 2 CH 2 OCH 3 , CH 2 CH 2 OCH 2 CH 3 , CH 2 OCH 2 CH 3 , CH 2 OCH 3 or CH 2 CH 2 CH 2 OCH 3 .

6. A formulation according to claim 1 , wherein the at least one ZnO cubane which is solid at standard pressure is present in proportions of 10 to 90% by weight based on the total mass of solid and liquid ZnO cubane.

7. A formulation according to claim 1 , wherein the at least one solvent is an aprotic solvent.

8. A formulation according to claim 1 , wherein the concentration of the ZnO cubanes is 5-60 based on the formulation.

9. A formulation according to claim 1 , further comprising 0.1-20% by weight of at least one additive based on the ZnO cubanes present in the formulation.

10. A process for producing a semiconductive ZnO layer, wherein a formulation according to claim 1 is applied to a substrate and then thermally converted.

11. A formulation according to claim 3 , wherein the ZnO cubane present in solid form under SATP conditions is [MeZn(O-t-Bu)] 4 or [MeZn(O-i-Pr)] 4 .

12. A formulation according to claim 5 , wherein the ZnO cubane present in liquid form under SATP conditions is [MeZn(OCH 2 CH 2 OCH 3 )] 4 .

13. A formulation according to claim 7 , when the aprotic solvent is at least one solvent selected from the group consisting of toluene, xylene, anisole, mesitylene, n-hexane, n-heptane, tris-(3,6-dioxaheptyl)amine (TDA), 2-aminomethyltetrahydrofuran, phenetole, 4-methylanisole, 3-methylanisole, methyl benzoate, N-methyl-2-pyrrolidone (NMP), tetralin, ethyl benzoate and diethyl ether.

14. The process according to claim 10 , wherein the substrate is an Si or Si/SiO 2 wafer, a glass substrate or a polymer substrate.

15. A process according to claim 10 , wherein the formulation is applied to the substrate by spin-coating, spraying, flexographic printing, gravure printing, inkjet printing, screen printing, pad printing or offset printing.

16. A process according to claim 10 , wherein the thermal conversion is effected at temperatures of 120 to 450° C.

17. A process according to claim 10 , wherein the semiconductive ZnO layer is aftertreated by at least one process selected from the group consisting of an aftertreatment with reducing or oxidizing atmospheres, treatment with moisture, plasma treatment, laser treatment and UV irradiation.

18. An electronic component comprising at least one semiconductive ZnO layer which has been produced by one of the processes according to claim 12 .

19. The process according to claim 10 , wherein the substrate is a polymer substrate based on PET, PE, PEN, PEI, PEEK, PI, PC, PEA, PA or PP.

20. A transistor comprising at least one semiconductive ZnO layer produced according to the process of claim 18 .

21. An optoelectronic component comprising at least one semiconductive ZnO layer which has been produced according to the process of claim 18 .

22. A sensor comprising at least one semiconductive ZnO layer which has been produced according to the process of claim 18 .

Assignments (2)
CHANGE OF NAME Recorded Jan 31, 2020
From: EVONIK DEGUSSA GMBH
To: EVONIK OPERATIONS GMBH
Reel/Frame 051765/0166 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 13, 2011
From: THIEM, HEIKO; STEIGER, JUERGEN; MERKULOV, ALEXEY; PHAM, DUY VU; AKSU, YILMAZ; SCHUTTE, STEFAN; DRIESS, MATTHIAS
To: EVONIK DEGUSSA GMBH
Reel/Frame 026114/0743 →