Irradiation of at least two target volumes
View Patent ↗The invention concerns an idea of planning irradiation of two target points ( 81, 9 ) with a beam approaching target points ( 72 ) for the purpose of depositing a first target dose distribution in a first of the two target volumes ( 81, 92 ) and a second target dose distribution in a second of the two target volumes ( 81, 92 ). The idea is characterized by the following steps: assigning target points ( 72 ) to one of the target volumes ( 81, 92 ), detecting an overlap of a first deposition caused by approaching a target point ( 72 ) assigned to the first target volume ( 81, 92 ) with a second deposition caused by approaching a target point ( 72 ) assigned to the second target volume ( 81, 92 ), and adapting the planning process for at least one of the target points ( 72 ) whose approach contributes to the overlap of the first and second deposition.
1. Method for planning irradiation of two target volumes ( 81 , 92 , 101 , 121 ) with a beam ( 20 ) approaching target points ( 72 , 110 ) for the purpose of depositing a first target dose distribution in a first of the two target volumes ( 81 , 92 , 101 , 121 ) and a second target dose distribution in a second of the two target volumes ( 81 , 92 , 101 , 121 ), characterized by the following steps:
assigning target points ( 72 , 110 ) to one of the target volumes ( 81 , 92 , 101 , 121 ), detecting an overlap of a first deposition caused by approaching a target point ( 72 , 110 ) assigned to the first target volume ( 81 , 92 , 101 , 121 ) with a second deposition caused by approaching a target point ( 72 , 110 ) assigned to the second target volume ( 81 , 92 , 101 , 121 ), and
adapting the planning process for at least one of the target points ( 81 , 92 , 101 , 121 ) whose approach contributes to the overlap of the first and second deposition.
2. Method according to claim 1 , wherein the target points ( 72 , 110 ) apply to screen dots ( 71 ) of a grid ( 70 ).
3. Method according to claim 1 , wherein the planning process provides irradiation divided in several sessions.
4. Method according to claim 3 , wherein irradiation planning is performed prior to each session.
5. Method according to claim 1 , wherein a change of one of the target volumes ( 81 , 92 , 101 , 121 ) is considered for changing the planning process.
6. Method according to claim 1 , wherein planning arranges adjusting the target volumes ( 81 , 92 , 101 , 121 ) to structures to be irradiated.
7. Method according to claim 1 , wherein each target volume is provided with a safety margin ( 83 , 93 , 103 , 123 ).
8. Method according to claim 1 , wherein information is assigned to points ( 72 , 110 ) of an object to be irradiated which exceeds the assignment to a target volume ( 81 , 92 , 101 , 121 ).
9. Method for irradiating two target volumes ( 81 , 92 , 101 , 121 ) with a beam ( 20 ) approaching target points ( 72 , 110 ) for the purpose of depositing a first target dose distribution in a first of the two target volumes and a second target dose distribution in a second of the two target volumes, characterized by the following steps:
assigning target points ( 72 , 110 ) to one of the target volumes ( 81 , 92 , 101 , 121 ), detecting an overlap of a first deposition caused by approaching a target point ( 72 , 110 ) assigned to the first target volume ( 81 , 92 , 101 , 121 ) with a second deposition caused by approaching a target point ( 72 , 110 ) assigned to the second target volume ( 81 , 92 , 101 , 121 ), and
adapting irradiation for at least one of the target points ( 72 , 110 ) whose approach contributes to the overlap of the first and second deposition.
10. Device ( 10 ) for irradiating two target volumes ( 81 , 92 , 101 , 121 ) with a beam ( 20 ) approaching target points ( 72 , 110 ) for the purpose of depositing a first target dose distribution in a first of the two target volumes ( 81 , 92 , 101 , 121 ) and a second target dose distribution in a second of the two target volumes ( 81 , 92 , 101 , 121 ), comprising
an irradiation source ( 11 ) and
a control system ( 41 , 42 , 46 , 47 ) for controlling the device ( 10 ),
characterized in that the control system ( 41 , 42 , 46 , 47 ) is designed to assign target points ( 72 , 110 ) to one of the target volumes ( 81 , 92 , 101 , 121 ), detect an overlap of a deposition caused by approaching a target point ( 72 , 110 ) assigned to the first target volume ( 81 , 92 , 101 , 121 ) with a second deposition caused by approaching a target point ( 72 , 110 ) assigned to the second target volume ( 81 , 92 , 101 , 121 ), and
to adapt irradiation for at least one of the target points ( 72 , 110 ) whose approach contributes to the overlap of the first and second depositions.
11. Control system ( 41 , 42 , 46 , 47 ) for controlling a device ( 10 ) for irradiating two target volumes ( 81 , 92 , 101 , 121 ) with a beam ( 20 ) approaching target points ( 72 , 110 ) for the purpose of depositing a first target dose distribution in a first of the two target volumes ( 81 , 92 , 101 , 121 ) and a second target dose distribution in a second of the two target volumes ( 81 , 92 , 101 , 121 ),
characterized in that
the control system ( 41 , 42 , 46 , 47 ) is designed to assign target points ( 72 , 110 ) to one of the target volumes ( 81 , 92 , 101 , 121 ), to detect an overlap of a first deposition caused by approaching a target point ( 72 , 110 ) assigned to the first target volume ( 81 , 92 , 101 , 121 ) with a second deposition caused by approaching a target point ( 72 , 110 ) assigned to the second target volume ( 81 , 92 , 101 , 121 ), and
to adapt irradiation for at least one of the target points ( 72 , 110 ) whose approach contributes to the overlap of the first and second depositions.