Substrate processing apparatus and method of operating the same

1. A substrate processing apparatus, comprising:

a first conduit configured to supply a processing solution to a substrate loaded on a supporter, the first conduit having a first terminal and a second terminal;

a second conduit in direct fluid communication with the first conduit between the first terminal and the second terminal, the second conduit configured to supply a gas to the first conduit to be mixed with the processing solution in a mixing portion of the first conduit, and

a head unit including an internal space downstream of the mixing portion which is a space inside the first conduit,

wherein the first conduit includes an opening to permit the processing solution mixed with the gas to be injected onto the substrate, and

wherein the internal space surrounds the opening of the first conduit.

2. The substrate processing apparatus of claim 1 , wherein the processing solution includes water and an abrasive material.

3. The substrate processing apparatus of claim 1 , wherein:

the supporter includes a top surface for supporting the substrate, and

the head unit is movable along a vertical direction perpendicular to the top surface of the supporter.

4. The substrate processing apparatus of claim 3 , wherein the processing solution mixed with the gas is injected onto the substrate via the internal space.

5. The substrate processing apparatus of claim 4 , further comprising a third conduit coupled to the head unit, the third conduit configured for supplying an abrasive material into the internal space of the head unit.

6. The substrate processing apparatus of claim 3 , further comprising:

a first transferring unit configured to move the head unit along a first direction, the first transferring unit including a guide rail extending along the first direction; and

a support load coupled with the guide rail, the support load being movable along the first direction.

7. The substrate processing apparatus of claim 6 , wherein:

the supporter includes first and second sidewalls facing each other and extending along the first direction,

the guide rail includes first and second guide rails provided on the first and second sidewalls of the supporter, respectively, and

the support load includes a first portion coupled with the first guide rail to extend along a third direction, a second portion coupled with the second guide rail to extend along the third direction, and a third portion connecting the first and second portions with each other and extending along a second direction,

the first and second directions are perpendicular to each other, and

the third direction is perpendicular to the top surface of the supporter.

8. The substrate processing apparatus of claim 7 , further comprising a second transferring unit coupled with the third portion of the support load and configured to move the head unit along the second direction.

9. The substrate processing apparatus of claim 1 , wherein the substrate includes at least one of a touch screen panel, a glass substrate, and a flexible substrate, and the supporter is configured to support at least one of the touch screen panel, the glass substrate, and the flexible substrate.

10. The substrate processing apparatus of claim 9 , wherein the supporter is configured to support a plurality of the substrates loaded thereon, and

the opening is configured to permit the processing solution mixed with the gas to be injected onto the plurality of the substrates.

11. The substrate processing apparatus of claim 1 , further comprising

a processing solution supplying portion in fluid communication with the first conduit and configured to supply the processing solution at pressure higher than ambient pressure.

12. A method of processing a substrate, comprising:

increasing a pressure of a processing solution supplied into a first conduit to above an ambient pressure;

supplying a gas into the processing solution to form a processing solution mixed with the gas in the first conduit; and

injecting the processing solution mixed with the gas onto the substrate using a substrate processing apparatus, comprising:

the first conduit configured to supply the processing solution to the substrate loaded on a supporter, the first conduit having a first terminal and a second terminal;

a second conduit in direct fluid communication with the first conduit between the first terminal and the second terminal, the second conduit configured to supply the gas to the first conduit to be mixed with the processing solution in a mixing portion of the first conduit, and

a head unit including an internal space downstream of the mixing portion which is a space inside the first conduit,

wherein the first conduit includes an opening to permit the processing solution mixed with the gas to be injected onto the substrate, and

wherein the internal space surrounds the opening of the first conduit.

13. The method of claim 12 , wherein the injecting of the processing solution mixed with the gas includes injecting an abrasive material onto the at least one substrate, along with the processing solution mixed with the gas.

14. The method of claim 12 , wherein the at least one substrate includes a plurality of substrates, and the processing solution mixed with the gas is used to cut the plurality of substrates.

15. The method of claim 14 , wherein the plurality of substrates is curvedly cut to form a curved edge.

16. The method of claim 12 , wherein the processing solution mixed with the gas is used to remove contaminants from the substrate.