IP Library Granted Patent US 8,425,852
Granted Patent B2
US 8,425,852 · App. 13/144,928 · Granted Apr 23, 2013

High concentration NO

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Quick Facts
Patent No.
US 8,425,852
App. No.
13/144,928
Granted
Apr 23, 2013
Kind
B2
Abstract

A high concentration NO 2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO 2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO 2 gas generating system provides a high concentration NO 2 generating system and the high concentration NO 2 generating method using the generating system by which NO 2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO 2 can be simply and selectively prepared on demand.

Claims (17)

1. A high concentration NO 2 gas generating system comprising:

a circulating path configured by connecting a chamber, a plasma generator, and a circulating means; wherein said plasma generator comprises:

a microwave generating apparatus;

a waveguide connected to said microwave generating apparatus to transmit microwaves; and

a plasma generating portion provided integrally with said waveguide and comprising a rod-shaped conducting shaft inserted through said waveguide and a tubular conducting tube, wherein said conducting shaft is configured by an antenna portion receiving said microwaves and a center electrode protruding externally from said waveguide,

a ring-shaped space formed between said center electrode and said conducting tube, wherein a base end of said conducting tube is electrically conductive and fixed relative to said waveguide;

a ventilation opening positioned toward said base end of said conducting tube and to an outside edge of said conducting tube;

a pipe operatively connected to said conducting tube; and

a shielding tube inserted into said conducting tube, wherein an outside edge of said shielding tube is connected to said pipe,

wherein NO 2 is generated by circulating a gas mixture including nitrogen and oxygen in said circulating path.

2. The high concentration NO 2 gas generating system according to claim 1 , wherein said circulating means comprises a pressure device, and wherein said circulating path is configured by connecting said plasma generator to said chamber at a downstream side of said circulating path, connecting said pressure device to said plasma generator at a downstream side of said circulating path, and connecting said chamber to said pressure device at a downstream side of said circulating path.

3. The high concentration NO 2 gas generating system according to claim 1 , wherein a flow resistive portion is connected between said chamber and said plasma generator.

4. The high concentration NO 2 gas generating system according to claim 3 , wherein said flow resistive portion comprises an orifice.

5. The high concentration NO 2 gas generating system according to claim 1 , wherein said circulating path further comprises an NO 2 concentration measuring means.

6. The high concentration NO 2 gas generating system according to claim 5 , wherein said NO 2 concentration measuring means is disposed within said chamber, or between said chamber and said flow resistive portion.

7. The high concentration NO 2 gas generating system according to claim 1 , wherein said circulating path further comprises an inlet portion for introducing said gas mixture, and wherein said inlet portion comprises a closure means and a gas drying means.

8. The high concentration NO 2 gas generating system according to claim 7 , wherein said closure means is closed by detecting an internal pressure in said circulating path, and wherein said internal pressure increases by supplying said gas mixture into said circulating path under a reduced pressure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 19, 2013
From: SAIAN CORPORATION
To: NOXILIZER, INC.
Reel/Frame 030839/0117 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2011
From: MATSUUCHI, HIDETAKA; HIROSE, TOMOYUKI; IWASAKI, RYUICHI; MIKE, MASAAKI; MASUDA, SHIGERU; HAYASHI, HIROFUMI; TANIBATA, TORU; KIM, JOONGSOO; LEE, SANG HUN; KOO, JAE-MO; WEIHE, ORION; WAY, ANDREW
To: SAIAN CORPORATION
Reel/Frame 026602/0790 →