Arbitrary pattern direct nanostructure fabrication methods and system

1. A method of producing a nanostructure in a target film, the method comprising:

selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film to produce a nanostructure from the target film,

determining the distance between the near-field focusing array and the target film by measuring the capacitance between an electrode on a surface of the near-field focusing array and an electrically conductive layer on a substrate carrying the target film,

wherein the at least one focusing element of the near-field focusing array is selectively irradiated by irradiating a digital micromirror device.

2. The method according to claim 1 , wherein the near-field focusing array and target film are in parallel planar relationship to each other and separated by a gas-filled gap.

3. The method according to claim 2 , wherein the near-field focusing array is selected from the group consisting of a microlens array, a microaperture array and a microprojection array.

4. The method according to claim 3 , wherein the near-field focusing array is a microlens array.

5. The method according to claim 4 , wherein the microlens array comprises a microsphere array.

6. The method according to claim 1 , wherein the target film is a nanoparticle thin film.

7. The method according to claim 1 , wherein the target film comprises a photopolymerizable resin.

8. The method according to claim 1 , wherein the near-field focusing array is selectively irradiated to sinter a portion of the target film.

9. The method according to claim 1 , wherein the near-field focusing array is selectively irradiated to ablate a portion of the target film.

10. The method according to claim 1 , wherein the digital micromirror device comprises an array of individually positionable micromirrors.

11. The method of claim 10 , wherein each micromirror of the digital micromirror device corresponds to a focusing element of the near-field focusing array.

12. A method of producing a nanostructure, the method comprising:

selectively illuminating a microsphere array that is in near-field focusing relationship with a nanoparticle thin film to produce a nanostructure from the nanoparticle thin film; and

determining the distance between the microsphere array and the nanoparticle thin film by measuring the capacitance between an electrode on a surface of the microsphere array and an electrically conductive layer on a support carrying the nanoparticle thin film.

13. The method according to claim 12 , wherein the microsphere array and nanoparticle thin film are in parallel planar relationship to each other and separated by a gas-filled gap.

14. The method according to claim 13 , wherein the gas-filled gap has a width ranging from 50 to 1000 nm.

15. The method according to claim 12 , wherein the nanoparticle thin film comprises nanoparticles ranging in size from 1 to 10 nm.

16. The method according to claim 15 , wherein the nanoparticle thin film has a thickness ranging from 50 to 500 nm.

17. The method according to claim 16 , wherein the nanoparticle thin film is a fluid cast nanoparticle thin film.

18. The method according to claim 17 , wherein the method comprises:

depositing a fluid medium comprising nanoparticles onto a surface of the support; and

separating the fluid from the particles to produce the nanoparticle thin film.

19. The method according to claim 12 , wherein the microsphere array is selectively illuminated by illuminating a digital micromirror device.

20. The method according to claim 12 , wherein the microsphere array is selectively illuminated by illuminating an optical switching device that is in transmissive relationship with the microsphere array.

21. The method according to claim 20 , wherein the optical switching device comprises an LCD.