Low-irritating, clear cleansing compositions with relatively low pH
View Patent ↗The methods and compositions of this invention relate to compositions having low irritation characteristics in combination with one or more additional characteristics, for example, relatively high clarity, relatively high foaming, and/or combinations thereof, as well as methods of making and using such compositions. These compositions contain blends of amphoteric surfactants, have low pH values and are useful in cleansing the skin.
1. A clear skin cleansing composition comprising:
(a) water;
(b) a low molecular weight non-crosslinked, linear acrylic copolymer in an amount comprising from about 0.03 weight percent to about 2.1 weight percent of the skin cleansing composition;
(c) a surfactant component comprising a surfactant selected from the group consisting of, a blend of at least two amphoteric surfactants selected from the group consisting of: an ampholytic synthetic surfactant comprising a derivative of an aliphatic amine having from 8 to 18 carbon atoms and an anionic water-solubilizing group and zwitterionic surfactants comprising internally neutralized derivatives of aliphatic quaternary ammonium, phosphonium and tertiary sulfonium compounds, in which the aliphatic radical is straight chain or branched and wherein one of the aliphatic substituents has from 8 to 18 carbon atoms and one contains an anionic water-solubilizing group wherein said skin cleansing composition has a pH of less than about 6 and is substantially free of anionic surfactant and cocobetaine, said surfactants being present in a concentration of between about 0.0015 to about 15 weight percent of the skin cleansing composition and the total surfactant load of such composition is less than about 20 weight percent; said skin cleansing composition having an absorbance of less than about 0.22 as determined by the Clarity Absorbance Test.
2. A clear skin cleansing composition according to claim 1 wherein said surfactant component is selected from the group consisting of sodium lauroamphoacetate, cocamidopropyl betaine and cocamidopropyl hydroxysultaine.
3. A clear skin cleansing composition comprising:
(a) water;
(b) a low molecular weight non-crosslinked, linear acrylic copolymer in an amount comprising from about 0.03 weight percent to about 1.6 weight percent of the skin cleansing composition;
(c) at least two amphoteric surfactants selected from the group consisting of: an ampholytic synthetic surfactant comprising a derivative of an aliphatic amine having from 8 to 18 carbon atoms and an anionic water-solubilizing group and zwitterionic surfactants comprising internally neutralized derivatives of aliphatic quaternary ammonium, phosphonium and tertiary sulfonium compounds, in which the aliphatic radical is straight chain or branched and wherein one of the aliphatic substituents has from 8 to 18 carbon atoms and one contains an anionic water-solubilizing group; one of such amphoteric surfactants comprising coco-betaine in a concentration of less than about 0.065 weight percent or greater than about 3.5 weight percent; said remaining amphoteric surfactants being present in a concentration of between about 0.0015 to about 15 weight percent of the skin cleansing composition and the total surfactant load of such composition is less than about 20 weight percent;
wherein said skin cleansing composition has a pH of less than about 6 and is substantially free of anionic surfactant, said skin cleansing composition having an absorbance of less than about 0.22 as determined by the Clarity Absorbance Test.
4. A clear skin cleansing composition according to claim 3 wherein said surfactant component further comprises an amphoteric surfactant selected from the group consisting of sodium lauroamphoacetate, cocamidopropyl betaine and cocamidopropyl hydroxysultaine.