Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
View Patent ↗An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.
1. A method of patterning a conductive layer, the method comprising:
forming a first conductive layer on a substrate, wherein the conductive layer includes at least one of Al, Al alloy, and Mo;
patterning a photoresist layer by photo-exposure; and
etching the conductive layer using the patterned photoresist layer as an etch mask;
wherein an etchant composition used to etch the conductive layer includes a phosphoric acid, nitric acid of about 2 weight % to about 5 weight %; an acetic acid, an acetate compound, and water.
2. The method according to claim 1 , wherein the composition includes phosphoric acid of about 50 weight % to about 77 weight %; acetic acid of about 1 weight % to about 25 weight %; an acetate compound of about 1 weight % to about 10 weight %; and water of residual quantity.
3. The method according to claim 2 , wherein the acetate compound includes at least one of cation of sodium (Na), potassium (K), ammonia (NH3), calcium (Ca), aluminum (Al).
4. The method according to claim 2 , wherein the acetate compound is an acid salt.
5. A method of manufacturing a flat panel display device, the method comprising:
providing a substrate;
forming a first conductive layer on the substrate;
patterning the first conductive layer to form a gate line and a gate electrode;
forming a semiconductor layer on the substrate corresponding to the gate electrode;
forming a second conductive layer on the semiconductor layer;
patterning the second conductive layer to form source/drain electrodes;
wherein the gate electrode and the source/drain electrodes are patterned using one etchant composition including phosphoric acid, nitric acid of about 2 weight % to about 5 weight %; an acetic acid, an acetate compound, and water.
6. The method according to claim 5 , wherein the etchant composition includes phosphoric acid of about 50 weight % to about 77 weight %; an acetic acid of about 1 weight % to about 25 weight %; an acetate compound of about 1 weight % to about 10 weight %; and water of residual quantity.
7. The method according to claim 6 , wherein the acetate compound includes at least one of cation of sodium (Na), potassium (K), ammonia (NH3), calcium (Ca), aluminum (Al).
8. The method according to claim 7 , wherein the acetate compound is an acid salt.