Method of forming an electrode casing for an alkaline electrochemical cell with reduced gassing

1. A method for forming a coated casing for an electrochemical cell, comprising the steps of:

providing an electrode casing comprising a metal substrate having an interior surface and an exterior surface, the substrate comprising a copper layer on the interior surface;

plating a first metal layer with a plating solution on the interior surface and on the exterior surface of the substrate utilizing a first current density; and

changing the first current density to a second different current density while the substrate of the electrode casing is in contact with the plating solution and plating a second metal layer on the first metal layer on the interior surface and on the first metal layer on the exterior surface, the second metal layer being adapted to be exposed to the atmosphere when the electrode casing is assembled in an electrochemical cell; wherein:

the first metal layer has a ratio of copper from 50 to 70 weight percent, tin from 26 to 42 weight percent, and zinc from 3 to 9 weight percent, measured at a central portion of the exterior surface of the substrate of the electrode casing by SEM/EDS; and

the second metal layer has a ratio of copper from 36 to 46 weight percent, tin from 42 to 57 weight percent and zinc from 6.5 to 9.5 weight percent, measured at a central portion of the exterior surface of the substrate of the electrode casing by SEM/EDS.

2. The method according to claim 1 , wherein the first current density of the plating ranges from 16 to 107.6 amps per square meter, and wherein the second current density of the plating ranges from 4.3 to 21.5 amps per square meter with the proviso that the second current density is lower than the first current density.

3. The method according to claim 1 , wherein after plating the first metal layer and the second metal layer, a passivating step is performed on the plated electrode casing utilizing salt passivation or an acid-base passivation.

4. The method according to claim 1 , wherein the plating is performed electrolytically utilizing a rack plating device, a barrel plating device, a spouted bed electroplating device or a vibratory plating device.

5. The method according to claim 4 , wherein the plating is formed electrolytically utilizing a spouted bed electroplating device.

6. The method according to claim 1 , wherein the first current density of the plating is at least 26.9 amps per square meter and at most 107.6 amps per square meter, and wherein the second current density of the plating is at least 4.3 amps per square meter and at most 16.2 amps per square meter.

7. The method according to claim 1 , wherein the second layer has a ratio of surface values measured according to XPS of 73 to 84 atomic percent copper, 11 to 17 atomic percent tin, and 4 to 10 atomic percent zinc.

8. A method for forming a coated casing for an electrochemical cell, comprising the steps of:

providing an electrode casing comprising a metal substrate having an interior surface and an exterior surface wherein from the exterior surface to the interior surface the substrate has a nickel layer, a stainless steel layer and a copper layer;

plating a first metal layer with a plating solution on at least the exterior surface of the Substrate utilizing a first current density; and

changing the first current density to a second different current density while the electrode casing is in contact with the plating solution and plating a second metal layer that is adapted to be exposed to the atmosphere when the electrode casing is assembled in an electrochemical cell on the first layer; wherein:

the first and second plated layers each comprise copper, tin and zinc;

the first layer has a ratio of surface values according to XPS of 85 to 91 atomic percent copper, 6 to 11 atomic percent tin, and 2 to 6 atomic percent zinc; and

the second layer has a ratio of surface values measured according to XPS of 73 to 84 atomic percent copper, 11 to 17 atomic percent tin, and 4 to 10 atomic percent zinc.

9. The method according to claim 8 , wherein the coated casing is used in an electrochemical cell having a first electrode and a second electrode, wherein the first electrode is a negative electrode comprising zinc and the second electrode is a positive electrode comprising at least one of manganese dioxide, a silver oxide and a catalytic material for reducing oxygen or for generating hydrogen or oxygen, wherein the cell is a button cell, and wherein the first layer has a thickness greater than a thickness of the second layer, and wherein the first electrode is free of added mercury.

10. A method for forming an electrochemical cell, comprising the steps of:

providing a first electrode casing comprising a metal substrate having an interior surface and an exterior surface;

plating the interior surface and the exterior surface of the substrate of the first electrode casing with a copper-tin-zinc alloy utilizing a variable current density while the substrate is in contact with a plating solution thereby producing a plated substrate having a first layer and a second layer, and wherein a tin content increases from the first layer to the second layer; and

forming an electrochemical cell comprising a first electrode in contact with the interior surface of the plated substrate of the first electrode casing and an aqueous alkaline electrolyte, wherein, prior to plating, the substrate of the first electrode casing has a copper layer on the interior surface; wherein:

the current density is decreased during the plating such that the first layer has a ratio of copper from 50 to 70 weight percent, tin from 26 to 42 weight percent, and zinc from 3 to 9 weight percent measured at a central portion of the exterior surface of the plated substrate by SEM/EDS,

and the second layer has a ratio of copper from 36 to 46 weight percent, tin from 42 to 57 weight percent and zinc from 6.5 to 9.5 weight percent measured at a central portion of the exterior surface of the plated substrate by SEM/EDS.

11. The method according to claim 10 , wherein a first current density of the variable current density plating ranges from 16 to 107.6 amps per square meter, and wherein a second current density of the variable current density plating ranges from 4.3 to 21.5 amps per square meter with the proviso that the second current density is lower than the first current density.

12. The method according to claim 11 , wherein the first current density of the plating is at least 26.9 amps per square meter and at most 107.6 amps per square meter, and wherein the second current density of the plating is at least 4.3 amps per square meter and at most 16.2 amps per square meter.

13. The method according to claim 10 , wherein the plating is performed electrolytically utilizing a rack plating device, a barrel plating device, a spouted bed electroplating device or a vibratory plating device.

14. The method according to claim 13 , wherein the plating is formed electrolytically utilizing a spouted bed electroplating device.

15. The method according to claim 10 , wherein prior to plating from the exterior surface to the interior surface the substrate has a nickel layer, a stainless steel layer, and said copper layer.

16. The method according to claim 10 , wherein the second layer has a ratio of surface values measured according to XPS of 73 to 84 atomic percent copper, 11 to 17 atomic percent tin, and 4 to 10 atomic percent zinc.

17. The method according to claim 10 , wherein the first electrode is a negative electrode comprising zinc and the electrochemical cell further comprises a second electrode, wherein the second electrode is a positive electrode comprising at least one of manganese dioxide, a silver oxide and a catalytic material for reducing oxygen or for generating hydrogen or oxygen, wherein the cell is a button cell, and wherein the first layer has a thickness greater than a thickness of the second layer, and wherein the first electrode is free of added mercury.