Method for finishing surface of preliminary polished glass substrate
View Patent ↗A glass substrate obtained by a method including measuring flatness of a glass substrate surface and measuring concentration distribution of dopant in the substrate. Processing conditions of the surface are set up for each site of the substrate based on results from the measuring the flatness and the measuring the distribution, and the finishing is carried out while keeping an angle formed by normal line of the substrate and incident beam onto the surface at from 30 to 89°. The surface is subjected to second finishing for improving an RMS in a high spatial frequency region. The surface after the second finishing satisfies the requirements: an RMS slope in the region that 5 μm<λ (spatial wavelength)<1 mm is not more than 0.5 mRad and an RMS slope in the region that 250 nm<λ (spatial wavelength)<5 μm is not more than 0.6 mRad.
1. A glass substrate having a substrate surface that satisfies the following requirements (1) and (2):
(1) an RMS slope in the region that 5 μm<λ (spatial wavelength)<1 mm is not more than 0.5 mRad; and
(2) an RMS slope in the region that 250 nm<λ (spatial wavelength)<5 μm is not more than 0.6 mRad.
2. A glass substrate having a substrate surface that satisfies the following requirements (3) and (4):
(3) an RMS slope in the region that 2.5 μm<λ (spatial wavelength)<1 mm is not more than 0.45 mRad; and
(4) an RMS slope in the region that 250 nm<λ (spatial wavelength)<2.5 μm is not more than 0.5 mRad.
3. A glass substrate having a substrate surface that satisfies the following requirements (5) and (6):
(5) an RMS in the region that 100 nm<λ (spatial wavelength)<1 μm is not more than 0.1 nm; and
(6) an RMS in the region that 50 nm<λ (spatial wavelength)<250 nm is not more than 0.15 nm.
4. A glass substrate having a substrate surface that satisfies the following requirements (3) to (6):
(3) an RMS slope in the region that 2.5 μm<λ (spatial wavelength)<1 mm is not more than 0.45 mRad;
(4) an RMS slope in the region that 250 nm<λ (spatial wavelength)<2.5 μm is not more than 0.5 mRad;
(5) an RMS in the region that 100 nm<λ (spatial wavelength)<1 μm is not more than 0.1 nm; and
(6) an RMS in the region that 50 nm<λ (spatial wavelength)<250 nm is not more than 0.15 nm.
5. A photomask blank obtained from the glass substrate according to any one of claims 1 to 4 .
6. A photomask obtained from the mask blank according to claim 5 .
7. An exposure tool using the glass substrate according to any one of claims 1 to 4 as an optical element of an optical system.