Method for manufacturing display device
View Patent ↗A method of manufacturing a display device is disclosed. In one embodiment, the method includes: i) forming a semiconductor layer where a plurality of crystallized areas and a plurality of noncrystallized areas are alternately arranged on a substrate, ii) aligning the substrate based on a difference in contrast ratio between the crystallized and noncrystallized areas and iii) performing a photo process or a photolithography process.
1. A method for manufacturing a display device, comprising:
forming a semiconductor layer where a plurality of crystallized areas and a plurality of noncrystallized areas are alternately arranged on an entire surface of a substrate;
aligning the substrate based on a difference in contrast ratio between the crystallized and noncrystallized areas without separately forming an align key; and
performing a photo process or a photolithography process after the aligning.
2. The method of claim 1 , wherein the crystallized and noncrystallized areas of the semiconductor layer are arranged in a line pattern substantially parallel to each other.
3. The method of claim 2 , wherein the forming comprises:
forming an amorphous silicon layer; and
selectively irradiating laser light onto the amorphous silicon layer so as to crystallize a part of the amorphous silicon layer.
4. The method of claim 3 , wherein the laser light is oscillated so as to selectively crystallize the amorphous silicon layer.
5. The method of claim 4 , wherein the oscillation cycle of the laser is substantially in proportion to the widths of the crystallized and noncrystallized areas.
6. The method of claim 2 , wherein the substrate is divided into a plurality of pixel areas, and wherein one or more thin film transistors and a capacitor are formed for each of the pixel areas.
7. The method of claim 6 , wherein: each of the pixel areas comprises one or more crystallized areas and one or more noncrystallized areas.
8. The method of claim 1 , wherein the aligning comprises:
acquiring the contrast ratio between the crystallized and noncrystallized areas; and
recognizing one or more crystallized areas among the crystallized areas as an align key on the basis of the contrast ratio.
9. The method of claim 8 , wherein the align key is both edges of the crystallized area.
10. The method of claim 1 , wherein the aligning comprises:
acquiring the contrast ratio between the crystallized and noncrystallized areas; and
recognizing a boundary line between the crystallized and noncrystallized areas as an alignment line.