Lithographic apparatus and device manufacturing method
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
1. A fluid processing system for an immersion lithographic apparatus, the fluid processing system comprising a manifold configured to process a two-phase flow of liquid and gas, the manifold comprising:
a chamber configured to receive the two-phase flow and in which the two-phase flow separates into liquid and gas;
a gas outlet in the chamber configured to remove gas from the chamber; and
a liquid outlet in the chamber configured to remove liquid from the chamber,
wherein the manifold is thermally isolated from its surroundings.
2. The system according to claim 1 , wherein the liquid outlet is covered by a porous member.
3. The system according to claim 2 , wherein the porous member is configured to remove substantially only liquid.
4. The system according to claim 1 , wherein the gas outlet is located above the liquid outlet.
5. The system according to claim 1 , wherein the chamber is double walled.
6. The system according to claim 5 , comprising baffles between the walls of the double wall chamber.
7. The system according to claim 1 , wherein the manifold is thermally regulated by a flow of temperature controlled liquid within the wall of the chamber.
8. An immersion lithographic apparatus, comprising:
a movable table;
a projection system configured to project a beam of radiation onto a substrate;
a liquid handling system comprising:
an inlet configured to supply a liquid to a space between the projection system and the table; and
an enclosure configured to receive a two-phase fluid of liquid and gas from the space and in which the two-phase fluid is separated into liquid and gas, the enclosure comprising:
an inlet in, or through, a wall of the enclosure, the inlet configured to provide two-phase fluid to an interior of the enclosure,
a liquid outlet in, or through, the wall of the enclosure, the liquid outlet configured to remove liquid from the enclosure, and
a gas outlet in, or through, the wall of the enclosure, the gas outlet configured to exhaust gas from the enclosure,
wherein the enclosure wall thermally isolates the interior of the enclosure from its surroundings.
9. The apparatus according to claim 8 , wherein the liquid outlet comprises a porous member.
10. The apparatus according to claim 9 , wherein the porous member is configured to remove substantially only liquid.
11. The apparatus according to claim 8 , wherein the gas outlet is located above the liquid outlet.
12. The apparatus according to claim 8 , wherein the liquid outlet extends from the wall of the enclosure into the interior of the enclosure.
13. The apparatus according to claim 12 , further comprising a porous member at the end of the liquid outlet extending into the interior of the enclosure.
14. The apparatus according to claim 8 , comprising a further porous member through which the two-phase fluid passes prior to reaching the interior of the enclosure.
15. An immersion lithographic apparatus, comprising:
a movable table;
a projection system configured to project a beam of radiation onto a substrate;
a liquid handling system comprising:
an inlet configured to supply a liquid to a space between the projection system and the table; and
an enclosure configured to receive a two-phase fluid of liquid and gas from the space and in which the two-phase fluid is separated into liquid and gas, the enclosure comprising:
an inlet in, or through, a wall of the enclosure, the inlet configured to provide two-phase fluid to an interior of the enclosure;
a liquid outlet in, or through, the wall of the enclosure, the liquid outlet configured to remove liquid from the enclosure and extending from the wall of the enclosure into the interior of the enclosure; and
a gas outlet in, or through, the wall of the enclosure, the gas outlet configured to exhaust gas from the enclosure and located above the liquid outlet.
16. The apparatus according to claim 15 , wherein the liquid outlet comprises a porous member.
17. The apparatus according to claim 15 , comprising a further porous member through which the two-phase fluid passes prior to reaching the interior of the enclosure.
18. The apparatus according to claim 15 , wherein the enclosure wall thermally isolates the interior of the enclosure from its surroundings.
19. A device manufacturing method, comprising:
projecting a beam of radiation, through a liquid, onto a radiation-sensitive substrate;
receiving a two-phase flow of the liquid and a gas into an interior of an enclosure via a porous member and an inlet in, or through, a wall of the enclosure;
separating the two-phase flow into liquid and gas in the enclosure, the separating comprising:
removing liquid from the enclosure via a liquid outlet in, or through, the wall of the enclosure, the liquid outlet extending from the wall of the enclosure into the interior of the enclosure and having a porous member at the end thereof, and
exhausting gas from the enclosure via a gas outlet in, or through, the wall of the enclosure, the gas outlet located above the liquid outlet.
20. The method of claim 19 , further comprising thermally isolating by the enclosure wall the interior of the enclosure from its surroundings.