Formulations with unexpected cleaning performance incorporating a biodegradable chelant
View Patent ↗A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M 1 and M 2 are alkali metal ions, wherein the M 1 has a higher atomic weight than M 2 ; wherein x+y=n and the mole fraction of M 1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
1. An aqueous hard surface cleaning composition, comprising:
(a) an anionic, nonionic, cationic, or amphoteric surfactant, and mixtures thereof;
optionally including a quaternary ammonium surfactant, the total amount of said surfactant being present in an amount from about 0.05 to about 15 wt. percent of the composition;
(b) at least one water-soluble or dispersible organic solvent having a vapor pressure of at least 0.001 mm Hg at 25° C., said at least one organic solvent present in a solubilizing- or dispersion-effective amount;
(c) a chelating agent derived from one or more components of the formula:
wherein R is a hydroxyalkyl group having from 1 to about 10 carbon atoms;
each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups;
R″ has from 1 to about 10 carbon atoms and is selected from the group consisting of unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; or hydrogen;
M 1 and M 2 are individually selected from the groups consisting of Na+ and K+, wherein the M 1 has a higher atomic weight than M 2 ;
wherein x+y=n and the mole fraction of M 1 is greater than 0.70 to 1; and
(d) water.
2. The cleaning composition of claim 1 , wherein the one component of the chelating agent follows the formula (K + ) x (Na + ) y (HOCH 2 CH 2 N(CH 2 COO) 2 ) −2 ; wherein the mole fraction of K + ranges from greater than 0.80 to 1, x+y=2, and wherein the pH of the cleaning composition is from about 3 to 14.
3. The cleaning composition of claim 2 further comprising an additional component of the chelating agent of the formula (K + ) x (Na 2 + ) y (HOCH 2 CH 2 N(R)(CH 2 COO)) −1 where (R) is hydrogen and wherein the mole fraction of K + ranges from greater than 0.80 to 1, wherein x+y=1.
4. A method of cleaning a surface comprising
(a) acting a surface with the cleaning composition of claim 1 and
b) removing the composition from the surface.