Forming method for polymeric laminated wafers comprising different film materials
View Patent ↗A method of making a polymeric laminated wafer comprising different film materials that are softenable and formable at different softening temperatures corresponding with the film materials.
1. A method for forming an optically functional laminated wafer comprising:
(a) exposing an optically functional laminated wafer to a first temperature;
(b) heating one side of the optically functional laminate wafer to a temperature higher than the first temperature; and
(c) shaping the optically functional laminated wafer to a desired shape;
wherein steps (a) through (c) are conducted substantially simultaneously of one another.
2. The method of claim 1 wherein the step of exposing an optically functional laminated wafer to a first temperature comprises placing the wafer in a heated chamber of a forming machine.
3. The method of claim 1 wherein the step of exposing an optically functional laminated wafer to a first temperature comprises exposing an optically functional laminated wafer having a polarizing functional layer to a first temperature.
4. The method of claim 1 wherein the step of exposing an optically functional laminated wafer to a first temperature comprises exposing an optically functional laminated wafer having a photochromic functional layer to a first temperature.
5. The method of claim 1 wherein the step of exposing an optically functional laminated wafer to a first temperature comprises exposing an optically functional laminated wafer having a protective layer to a first temperature.
6. The method of claim 1 wherein the step of exposing an optically functional laminated wafer to a first temperature comprises exposing an optically functional laminated wafer having a cellulose acetyl butyrate layer to a first temperature.
7. The method of claim 1 wherein the step of heating one side of the optically functional laminate wafer to a temperature higher than the first temperature comprises directing an energy source only at said one side.
8. The method of claim 1 wherein the step of heating one side of the optically functional laminate wafer to a temperature higher than the first temperature comprises directing an infrared energy source at said one side.
9. The method of claim 1 wherein the step of heating one side of the optically functional laminate wafer to a temperature higher than the first temperature comprises heating a base layer of the optically functional laminate wafer.
10. The method of claim 1 wherein the step of heating one side of the optically functional laminate wafer to a temperature higher than the first temperature comprises heating a polycarbonate base layer of the optically functional laminate wafer.
11. The method of claim 1 wherein the step of shaping the optically functional laminated wafer to a desired shape comprises forming the optically functional laminated wafer to have a base curve.
12. A method for forming an optical laminate wafer comprising:
(a) heating an optical laminate wafer to a first temperature equal at least to a softening temperature of a first layer of the optical laminate wafer;
(b) selectively directing an energy source at a second layer of the optical laminate wafer such that the second layer is heated to a temperature greater than the softening temperature of the first layer of the optical laminate; and
(c) forming the optical laminate wafer into a desired shape;
wherein steps (a) through (c) are conducted substantially coincident of one another.
13. The method of claim 12 wherein the step of heating an optical laminate wafer to a first temperature equal at least to a softening temperature of a first layer of the optical laminate wafer comprises placing the optical laminate wafer in a heated chamber of a forming machine.
14. The method of claim 12 wherein the step of heating an optical laminate wafer to a first temperature equal at least to a softening temperature of a first layer of the optical laminate wafer comprises heating an optical laminate wafer having a functional layer.
15. The method of claim 12 wherein the step of heating an optical laminate wafer to a first temperature equal at least to a softening temperature of a first layer of the optical laminate wafer comprises heating an optical laminate wafer having a protective layer.
16. The method of claim 12 wherein the step of heating an optical laminate wafer to a first temperature equal at least to a softening temperature of a first layer of the optical laminate wafer comprises heating an optical laminate wafer having a cellulose acetyl butyrate layer.
17. The method of claim 12 wherein the step of selectively directing an energy source at a second layer of the optical laminate wafer such that the second layer is heated to a temperature greater that the softening temperature of the first layer of the optical laminate wafer comprises directing an infrared energy source at the second layer.
18. The method of claim 12 wherein the step of selectively directing an energy source at a second layer of the optical laminate wafer such that the second layer is heated to a temperature greater that the softening temperature of the first layer of the optical laminate wafer comprises selectively heating a base layer of the optical laminate wafer.
19. The method of claim 12 wherein the step of selectively directing an energy source at a second layer of the optical laminate wafer such that the second layer is heated to a temperature greater that the softening temperature of the first layer of the optical laminate wafer comprises heating a polycarbonate base layer of the optical laminate wafer.
20. The method of claim 12 wherein the step of forming the optical laminate wafer into a desired shape comprises forming the optically functional laminate wafer to have a base curve.