Optoelectronic semiconductor device
View Patent ↗An optoelectronic semiconductor device including: a substrate; a semiconductor system having an active layer formed on the substrate; and an electrode structure formed on the semiconductor system, wherein the electrode structure includes: a first conductivity type bonding pad; a second conductivity type bonding pad; a first conductivity type extension electrode; and a second conductivity type extension electrode, wherein the first conductivity type extension electrode and the second conductivity type extension electrode form a three-dimensional crossover; wherein the first conductivity type extension electrode and the second conductivity type extension electrode are on the opposite sides of the active layer.
1. An optoelectronic semiconductor device comprising:
a substrate;
a semiconductor system formed on the substrate, the semiconductor system comprising:
a first conductivity type layer;
a second conductivity type layer; and
an active layer formed between the first conductivity type layer and the second conductivity type layer;
a recess structure formed to expose a portion of the first conductivity type layer being a bottom surface of the recess structure; and
an electrode structure formed on the semiconductor system, wherein the electrode structure comprises:
a first conductivity type bonding pad electrically connected to the first conductivity type layer;
a second conductivity type bonding pad electrically connected to the second conductivity type layer;
a first conductivity type extension electrode formed on the bottom surface and extending laterally in the recess structure;
a second conductivity type extension electrode, wherein the first conductivity type extension electrode and the second conductivity type extension electrode form a three-dimensional crossover; and
an insulating layer formed on the first conductivity type layer, the insulating layer covering the first conductivity type extension electrode in the recess structure and filling in the recess structure,
wherein the first conductivity type extension electrode and the second conductivity type extension electrode are on opposite sides of the active layer.
2. The optoelectronic semiconductor device of claim 1 , wherein the first conductivity type extension electrode is electrically connected to the first conductivity type bonding pad and the second conductivity type extension electrode is electrically connected to the second conductivity type bonding pad.
3. The optoelectronic semiconductor device of claim 1 , wherein the first conductivity type extension electrode and the second conductivity type extension electrode include multiple branches respectively.
4. The optoelectronic semiconductor device of claim 3 , wherein number of the branches of the second conductivity type extension electrode are more than a number of branches of the first conductivity type extension electrode.
5. The optoelectronic semiconductor device of claim 1 , wherein the second conductivity type extension electrode comprises a plurality of first branches and a plurality of second branches extended from the first branches.
6. The optoelectronic semiconductor device of claim 5 , wherein a width of each of the second branches is thinner than a width of each of the first branches.
7. The optoelectronic semiconductor device of claim 5 , wherein the second conductivity type extension electrode comprises a nervure-like pattern.
8. The optoelectronic semiconductor device of claim 1 , wherein the second conductivity type extension electrode is formed on the second conductivity type layer and electrically connected to the second conductivity type layer.
9. The optoelectronic semiconductor device of claim 1 , wherein the insulating layer includes a portion composed of the three-dimensional crossover between the first conductivity type extension electrode and the second conductivity type extension electrode.
10. The optoelectronic semiconductor device of claim 1 , further comprising a transparent conductive layer formed on the second conductivity type layer and the insulating layer, wherein the transparent conductive layer is above the insulating layer.
11. The optoelectronic semiconductor device of claim 10 , wherein the transparent conductive layer is formed between the second conductivity type layer and the second conductivity type extension electrode.
12. The optoelectronic semiconductor device of claim 1 , wherein the second conductivity type extension electrode overlaps the first conductivity type extension electrode.
13. The optoelectronic semiconductor device of claim 1 , wherein the first conductivity type extension electrode forms a crisscross pattern, and the second conductivity type extension electrode forms a rectangular pattern to intersect the crisscross pattern of the first conductivity type extension electrode at a plurality of points in top view of the optoelectronic semiconductor device.
14. The optoelectronic semiconductor device of claim 1 , wherein a material of the electrode structure contains one or more elements selected from the group consisting of Cr, Ti, Ni, Pt, Cu, Au, Al and Ag.
15. The optoelectronic semiconductor device of claim 1 , wherein a material of the insulating layer are inorganic oxide or dielectric organic material containing one or more elements selected from the group consisting of SiOx, SiNx, Al2O3, TiOx.
16. The optoelectronic semiconductor device of claim 1 , wherein a material of the semiconductor system contains one or more elements selected from the group consisting of Ga, Al, In, As, P, N and Si.
17. The optoelectronic semiconductor device of claim 1 , wherein the semiconductor system comprises at least one of a light-emitting diode (LED), a laser diode (LD), a solar cell, a liquid crystal display, or an organic light-emitting diode.