IP Library Granted Patent US 8,962,139
Granted Patent B2
US 8,962,139 · App. 13/214,657 · Granted Feb 24, 2015

Resin particle and method for producing the same

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Quick Facts
Patent No.
US 8,962,139
App. No.
13/214,657
Granted
Feb 24, 2015
Kind
B2
Abstract

A resin particle including: a resin mother particle; and silica particles externally added onto a surface of the resin mother particle, wherein primary particles of the silica particles, the primary particles which have a volume average particle diameter of from 80 nm to 300 nm, a particle size distribution index of from 1.10 to 1.40, an average circularity of from 0.70 to 0.92 and an average circularity distribution index of from 1.05 to 1.50, and a proportion of the primary particles having an average circularity of 0.95 or more is not more 10% by number.

Claims (36)

1. A resin particle, comprising:

a resin mother particle; and

a silica particles externally added onto a surface of the resin mother particle,

wherein

primary particles of the silica particles have a volume average particle diameter of from 80 nm to 300 nm, a particle size distribution index of from 1.10 to 1.40, an average circularity of from 0.70 to 0.92 and an average circularity distribution index of from 1.05 to 1.50, and

a proportion of the primary particles having an average circularity of 0.95 or more is not more 10% by number,

wherein

the particle size distribution index (GSD v ) is (D 84v /D 16v ) 0.5 , where D 84v is a particle diameter at an accumulation of 84% and D 16v is a particle diameter at an accumulation of 16%, and

the average circularity distribution index is a square root of a value obtained by dividing 84% circularity by 16% circularity in cumulative frequency.

2. The resin particle according to claim 1 , wherein a surface of the silica particles are subjected to a hydrophobic treatment.

3. The resin particle according to claim 1 , wherein the volume average particle diameter of the primary particles of the silica particles is from 90 nm to 250 nm.

4. The resin particle according to claim 1 , wherein the volume average particle diameter of the primary particles of the silica particles is from 100 nm to 200 nm.

5. The resin particle according to claim 1 , wherein the particle size distribution index of the primary particles of the silica particles is from 1.10 to 1.25.

6. The resin particle according to claim 1 , wherein the average circularity of the primary particles of the silica particles is from 0.72 to 0.85.

7. The resin particle according to claim 1 , wherein the proportion of the primary particles having an average circularity of 0.95 or more is not more 8% by number.

8. The resin particle according to claim 1 , wherein a coverage of the silica particles externally added onto the surface of the resin particle relative to a surface area of the resin mother particle is obtained by the following formula (i), is 5% to 80%:

(√3 ×A×b×R )/(0.001×2 π×a×B×r )×100  (i)

wherein

A whose unit is g/cm 3 represents a specific gravity of the resin mother particle,

R whose unit is “μm” represents a particle diameter of the resin particle,

B whose unit is “g” represents a charge amount of the resin particle,

a whose unit is “g/cm 3 ” represents a specific gravity of the specified silica particles,

r whose unit is “nm” represents a particle diameter of the specified silica particles, and

b whose unit is “g” represents a charge amount of the specified silica particles.

9. A method for preparing the resin particle of claim 1 , comprising:

preparing an alkaline catalyst solution containing an alkaline catalyst in a concentration of from 0.6 mol/L to 0.85 mol/L in a solvent containing alcohol;

supplying a tetraalkoxysilane in a supply amount of 0.002 mol/(mol·min) or more and less than 0.006 mol/(mol·min) relative to the alcohol into the alkaline catalyst solution and also supplying an alkaline catalyst in an amount of from 0.1 mol to 0.4 mol per mole of a total supply amount of the tetraalkoxysilane to be supplied per minute to obtain silica particles; and

allowing the obtained silica particles to be externally added onto the surface of a resin mother particle.

10. The method for preparing the resin particle according to claim 9 , wherein the alkaline catalyst is selected from the group consisting of an ammonia, an urea, a monoamine, and a quaternary ammonium salt.

11. The method for preparing the resin particle according to claim 9 , wherein a content of the alkaline catalyst is from 0.63 mol/L to 0.78 mol/L.

12. The method for preparing the resin particle according to claim 9 , wherein the tetraalkoxysilane is selected from the group consisting of a tetramethoxysilane, a tetraethoxysilane, a tetrapropoxysilane and a tetrabutoxysilane.

13. The method for preparing the resin particle according to claim 9 , wherein the supply amount of the tetraalkoxysilane is from 0.0020 mol/(mol·in) to 0.0046 mol/(mol·min) relative to the alcohol in the alkaline catalyst solution.

14. The method for preparing the resin particle according to claim 9 , wherein the supply amount of the tetraalkoxysilane is from 0.0020 mol/(mol·min) to 0.0033 mol/(mol·min) relative to the alcohol in the alkaline catalyst solution.

15. The method for preparing the resin particle according to claim 9 , wherein a temperature in the alkaline catalyst solution at supplying the tetraalkoxysilane is from 5° C. to 50° C.

16. The method for preparing the resin particle according to claim 9 , further comprising:

treating a surface of the silica particles with a hydrophobic treatment agent.

Assignments (2)
CHANGE OF NAME Recorded Aug 12, 2021
From: FUJI XEROX CO., LTD.
To: FUJIFILM BUSINESS INNOVATION CORP.
Reel/Frame 058287/0056 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2011
From: ZENITANI, YUKA; YOSHIKAWA, HIDEAKI; OKUNO, HIROYOSHI; NOZAKI, SHUNSUKE; KAWASHIMA, SHINICHIRO; TAKEUCHI, SAKAE; KADOKURA, YASUO
To: FUJI XEROX CO., LTD.
Reel/Frame 026789/0318 →