Seamless capacitive touch panel
View Patent ↗A seamless capacitive touch panel includes a substrate, a pattern layer, a first electrode, and a second electrode. The pattern layer is formed on the substrate. The first electrode is formed on the pattern layer. The second electrode is formed on the substrate. The first electrode and the second electrode are separated by the pattern layer for preventing conduction between the first and second electrodes.
1. A capacitive touch panel, comprising:
a substrate;
a raised pattern layer formed directly on the substrate;
a first electrode formed on the pattern layer;
a second electrode formed directly on the substrate, wherein the second electrode and the first electrode are separated by the pattern layer preventing conduction between the first and second electrodes;
an isolating layer formed on the first electrode and the second electrode; and
a conductive layer formed on the isolating layer for electrically connecting a section of the second electrode to another section of the second electrode separated by the pattern layer via through holes formed on the isolating layer.
2. The capacitive touch panel of claim 1 , wherein the pattern layer is made of photoresist.
3. The capacitive touch panel of claim 1 , wherein undercuts are formed at edges of the pattern layer.
4. The capacitive touch panel of claim 1 , wherein the first and second electrodes are made of transparent conductive material consisting of indium tin oxide (ITO), antimony tin oxide (ATO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), micaceous iron oxide (MIO), or metal oxide selected from titanium oxide, zinc oxide, zirconium oxide, antimony oxide, indium oxide, tin oxide, aluminum oxide, or silicon oxide.
5. The capacitive touch panel of claim 1 , wherein the first electrode and the second electrode are orthogonal to each other.
6. A capacitive touch panel, comprising:
a substrate;
a first pattern layer formed on a first surface of the substrate;
a plurality of first electrodes formed on the first surface of the substrate and the first pattern layer, wherein the first electrode formed on the first surface of the substrate and the first electrode formed on the first pattern layer are separated by the first pattern layer;
a second pattern layer formed on a second surface of the substrate; and
a plurality of second electrodes formed on the second surface of the substrate and the second pattern layer, wherein the second electrode formed on the second surface of the substrate and the second electrode formed on the second pattern layer are separated by the second pattern layer.
7. The capacitive touch panel of claim 6 , wherein the first and the second pattern layers are made of photoresist.
8. The capacitive touch panel of claim 6 , wherein undercuts are formed at edges of the first and the second pattern layers.
9. The capacitive touch panel of claim 6 , wherein the first and second electrodes are made of transparent conductive material consisting of indium tin oxide (ITO), antimony tin oxide (ATO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), micaceous iron oxide (MIO), or metal oxide selected from titanium oxide, zinc oxide, zirconium oxide, antimony oxide, indium oxide, tin oxide, aluminum oxide, or silicon oxide.
10. The capacitive touch panel of claim 6 , wherein the first and the second electrodes are orthogonal to each other.
11. A method of fabricating a capacitive touch panel, comprising the steps of:
forming a raised pattern layer directly on a substrate;
forming a first electrode on the pattern layer;
forming a second electrode directly on the substrate;
forming an isolating layer on the first electrode and the second electrode; and
forming a conductive layer on the isolating layer for electrically connecting a section of the second electrode to another section of the second electrode separated by the pattern layer via through holes formed on the isolating layer;
wherein the second electrode and the first electrode are separated by the pattern layer preventing conduction between the first and second electrodes.
12. A method of fabricating a capacitive touch panel, comprising the steps of:
forming a raised pattern layer directly on a substrate;
forming a first electrode on the pattern layer;
forming a second electrode directly on the substrate; and
forming a conductive layer beneath the pattern layer for electrically connecting a section of the second electrode to another section of the second electrode separated by the pattern layer;
wherein the second electrode and the first electrode are separated by the pattern layer preventing conduction between the first and second electrodes.
13. A capacitive touch panel, comprising:
a substrate;
a raised pattern layer formed directly on the substrate;
a first electrode formed on the pattern layer;
a second electrode formed directly on the substrate, wherein the second electrode and the first electrode are separated by the pattern layer preventing conduction between the first and second electrodes; and
a conductive layer formed beneath the pattern layer for electrically connecting a section of the second electrode to another section of the second electrode separated by the pattern layer.
14. The capacitive touch panel of claim 13 , wherein the pattern layer is made of photoresist.
15. The capacitive touch panel of claim 13 , wherein undercuts are formed at edges of the pattern layer.
16. The capacitive touch panel of claim 13 , wherein the first and second electrodes are made of transparent conductive material consisting of indium tin oxide (ITO), antimony tin oxide (ATO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), micaceous iron oxide (MIO), or metal oxide selected from titanium oxide, zinc oxide, zirconium oxide, antimony oxide, indium oxide, tin oxide, aluminum oxide, or silicon oxide.
17. The capacitive touch panel of claim 13 , wherein the first electrode and the second electrode are orthogonal to each other.