Photoresist resin composition and method of forming patterns by using the same
View Patent ↗A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
1. A photosensitive resin composition, comprising:
an alkali soluble base resin;
a photoacid generator;
a photoactive compound; and
a phenol-based compound including a hydrophobic group,
wherein the alkali soluble base resin is a tandem type resin and wherein the tandem type resin includes a mixture of a high molecular weight resin with a molecular weight of 5000 g/mol or more, a low molecular weight resin with a molecular weight of 500 g/mol or less, and a medium molecular weight resin with a molecular weight between 500 g/mol and 5000 g/mol, and the base resin is about 100 parts by weight, the photoacid generator is about 0.01 to about 20 parts by weight, the photoactive compound is about 0.1 to about 30 parts by weight and the phenol-based compound is about 0.01 to about 20 parts by weight.
2. The photosensitive resin composition of claim 1 , wherein:
the phenol-based compound is a compound represented by the following Formula 1:
wherein R 1 to R 3 are independently a substituted or unsubstituted C 1 -C 10 alkyl group, and n1 to n3 are independently an integer of 1 to 5.
3. The photosensitive resin composition of claim 1 , wherein:
the medium molecular weight resin is included in a smaller amount than each of the high molecular weight resin and the low molecular weight resin.