IP Library Granted Patent US 8,529,649
Granted Patent B2
US 8,529,649 · App. 13/230,125 · Granted Sep 10, 2013

Methods of fabricating a polycrystalline diamond structure

Inventor: Mohammad N. Sani (Orem, UT)
Assignee: US Synthetic Corporation
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Quick Facts
Patent No.
US 8,529,649
App. No.
13/230,125
Granted
Sep 10, 2013
Kind
B2
Abstract

In an embodiment, a method of fabricating a polycrystalline diamond structure includes forming an assembly including a sintered polycrystalline diamond body positioned between an aluminum-containing layer and a substrate. The method further includes subjecting the assembly to a high-pressure/high-temperature process to form the polycrystalline diamond structure including a polycrystalline diamond table bonded to the substrate.

Claims (25)

1. A method of fabricating a polycrystalline diamond structure, comprising:

forming an assembly including a sintered polycrystalline diamond body positioned between an aluminum-containing layer and a substrate, wherein the aluminum-containing layer is positioned on only one surface of the sintered polycrystalline diamond body remote from the substrate to form part of an outer, upper surface of the polycrystalline diamond structure after high-pressure/high-temperature processing the assembly; and

subjecting the assembly to a high-pressure/high-temperature process to form the polycrystalline diamond structure having a polycrystalline diamond table bonded to the substrate.

2. The method of claim 1 wherein subjecting the assembly to a high-pressure/high-temperature process to form the polycrystalline diamond structure comprises:

infiltrating at least a portion of interstitial regions of the sintered polycrystalline diamond body with silicon from a silicon-containing material;

displacing at least a portion of metal-solvent catalyst, located within the at least a portion of the interstitial regions of the sintered polycrystalline diamond body, into the aluminum-containing layer; and

reacting at least a portion of the silicon with the sintered polycrystalline diamond body to form silicon carbide within the at least a portion of the interstitial regions.

3. The method of claim 2 wherein displacing at least a portion of metal-solvent catalyst, located within the at least a portion of the interstitial regions of the sintered polycrystalline diamond body, into the aluminum-containing layer comprises:

displacing substantially all of the metal-solvent catalyst from the sintered polycrystalline diamond body into the aluminum-containing layer.

4. The method of claim 2 wherein the act of infiltrating at least a portion of interstitial regions of the sintered polycrystalline diamond body with silicon from a silicon-containing material causes the act of displacing the at least a portion of the metal-solvent catalyst.

5. The method of claim 1 wherein the sintered polycrystalline diamond body exhibits an average grain size of about 20 μm or less.

6. The method of claim 1 wherein:

the sintered polycrystalline diamond body comprises a first portion that includes tungsten and a second portion that is substantially free of tungsten; and

forming an assembly including a sintered polycrystalline diamond body positioned between an aluminum-containing layer and a substrate comprises forming the assembly to further comprise the second portion of the sintered polycrystalline diamond body being positioned at least proximate to the substrate.

7. The method of claim 1 wherein the sintered polycrystalline diamond body is substantially free of tungsten.

8. The method of claim 1 wherein the aluminum-containing layer comprises a porous mass.

9. The method of claim 1 wherein the aluminum-containing layer comprises aluminum particles.

10. The method of claim 1 wherein the aluminum-containing layer comprises aluminum oxide particles.

11. The method of claim 1 wherein the aluminum-containing layer comprises un-sintered aluminum particles.

12. The method of claim 1 wherein the aluminum-containing layer comprises un-sintered aluminum oxide particles.

13. The method of claim 1 wherein the sintered polycrystalline diamond body comprises metal-solvent catalyst distributed therethrough.

14. The method of claim 1 wherein the substrate comprises a cemented carbide substrate.

15. The method of claim 1 wherein subjecting the assembly to a high-pressure/high-temperature process to form the polycrystalline diamond structure comprises bonding aluminum-containing material from the aluminum-containing layer to the sintered polycrystalline diamond body.

16. The method of claim 1 , further comprising removing the aluminum-containing layer after the act of subjecting the assembly to the high-pressure/high-temperature process to form the polycrystalline diamond structure.

17. The method of claim 1 wherein subjecting the assembly to a high-pressure/high-temperature process to form the polycrystalline diamond structure having a polycrystalline diamond table bonded to the substrate includes infiltrating a portion of the sintered polycrystalline diamond body with a metallic infiltrate included in the substrate.

Assignments (4)
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Jul 17, 2025
From: JPMORGAN CHASE BANK, N.A.
To: CHAMPIONX LLC; APERGY ESP SYSTEMS, LLC; APERGY BMCS ACQUISITION CORP; HARBISON-FISCHER, INC.; NORRIS RODS, INC.,; NORRIS RODS, INC.,; NORRISEAL-WELLMARK, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; US SYNTHETIC CORPORATION
Reel/Frame 072004/0019 →
RELEASE OF SECURITY INTEREST Recorded Jun 7, 2022
From: BANK OF AMERICA, N.A.
To: ACE DOWNHOLE, LLC; HARBISON-FISCHER, INC.; NORRIS RODS, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; THETA OILFIELD SERVICES, INC.; APERGY BMCS ACQUISITION CORP.; NORRISEAL-WELLMARK, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
Reel/Frame 060305/0001 →
SECURITY INTEREST Recorded Jun 5, 2020
From: ACE DOWNHOLE, LLC; APERGY BMCS ACQUISITION CORP.; HARBISON-FISCHER, INC.; NORRIS RODS, INC.; NORRISEAL-WELLMARK, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; THETA OILFIELD SERVICES, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
To: BANK OF AMERICA, N.A.
Reel/Frame 053790/0001 →
SECURITY AGREEMENT Recorded May 9, 2018
From: APERGY (DELAWARE) FORMATION, INC.; APERGY BMCS ACQUISITION CORP.; APERGY ENERGY AUTOMATION, LLC; HARBISON-FISCHER, INC.; NORRISEAL-WELLMARK, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 046117/0015 →
Continuity (4)
Continuation 11983619 · Nov 9, 2007
Provisional Application 60860098 · Nov 20, 2006
Provisional Application 60876701 · Dec 21, 2006
Related Publication 20120000136A1 · Jan 5, 2012