IP Library › Granted Patent US 8,796,645
Granted Patent B2
US 8,796,645 · App. 13/241,376 · Granted Aug 5, 2014

Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display

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Quick Facts
Patent No.
US 8,796,645
App. No.
13/241,376
Granted
Aug 5, 2014
Kind
B2
Abstract

An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts, where the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region, the overlapping region of at least one of the first photomask and the overlapping region of the second photomask includes at least two subregions, and shapes or arrangements of the transmission parts in the at least two subregions are different from each other.

Claims (62)

1. An exposure apparatus for a photoalignment process, the exposure apparatus comprising:

a first photomask including a plurality of transmission parts; and

a second photomask including a plurality of transmission parts,

wherein the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region,

the overlapping region of at least one of the first photomask and the second photomask includes at least two subregions, and

shapes or arrangements of the transmission parts in the subregions of the overlapping region are different from each other.

2. The apparatus of claim 1 , wherein

the at least two subregions include at least one first subregion and at least one second subregion,

an irradiation region corresponding to the transmission parts in the at least one first subregion of the first photomask and an irradiation region corresponding to the transmission parts in the at least one first subregion of the second photomask overlap each other, and

irradiation regions corresponding to the transmission parts in the at least one second subregion of the first photomask and irradiation regions corresponding to the transmission parts in the at least one second subregion of the second photomask do not overlap each other.

3. The apparatus of claim 2 , wherein

the at least one first subregion and the at least one second subregion are alternately arranged.

4. The apparatus of claim 3 , wherein

a sum of an area of one transmission part in the at least one first subregion of the first photomask and an area of one transmission part in the at least one first subregion of the second photomask is substantially equal to or greater than an area of one transmission part in the non-overlapping region of the first photomask or the second photomask.

5. The apparatus of claim 4 , wherein

the sum of the area of the one transmission part in the at least one first subregion of the first photomask and the area of the one transmission part in the at least one first subregion of the second photomask is about 100% to about 150% of the area of the one transmission part in the non-overlapping region of the first photomask.

6. The apparatus of claim 5 , wherein

the transmission parts of the first photomask are arranged in a first direction, and

a length of the transmission parts in the at least one first subregion of the first photomask or the second photomask in a second direction, which is substantially perpendicular to the first direction, is gradually changed along to the first direction.

7. The apparatus of claim 6 , wherein

the transmission parts in the at least one second subregion of the first photomask and the transmission parts in the at least one second subregion of the second photomask are alternately arranged in the first direction.

8. The apparatus of claim 2 , wherein

a sum of an areas of one transmission part in the at least one first subregion of the first photomask and an area of one transmission part in the at least one first subregion of the second photomask is substantially equal to or greater than an area of one transmission part of in the non-overlapping region of the first photomask.

9. The apparatus of claim 8 , wherein

the sum of the area of the one transmission part in the at least one first subregion of the first photomask and the area of the one transmission part in the at least one first subregion of the second photomask is about 100% to about 150% of the area of the one transmission part in the non-overlapping region of the first photomask.

10. The apparatus of claim 2 , wherein

the transmission parts of the first photomask are arranged in a first direction, and

a length of the transmission parts in the at least one first subregion of the first photomask or the second photomask in a second direction, which is substantially perpendicular to the first direction, is gradually changed along the first direction.

11. The apparatus of claim 2 , wherein

the transmission parts in the at least one second subregion of the first photomask and the transmission parts in the at least one second subregion of the second photomask are alternately arranged in the first direction.

12. The apparatus of claim 1 , further comprising:

a first light source which provides light to the first photomask; and

a second light source which provides light to the second photomask.

13. The apparatus of claim 12 , wherein

the first light source and the second light source irradiate the light obliquely through the first photomask and the second photomask, respectively.

14. An exposure apparatus for a photo alignment process, the exposure apparatus comprising:

a first photomask including a plurality of transmission parts; and

a second photomask including a plurality of transmission parts,

wherein the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region,

each of the first photomask and the second photomask include a first portion and a second portion, and irradiation regions corresponding to the first portion are different from irradiation regions corresponding to the second portion,

an irradiation direction of lights passing through a transmission part in the first portion is different from an irradiation direction of lights passing through a transmission part in the second portion, and

a shape or an arrangement of the transmission parts in the overlapping region of the first photomask or the second photomask is different from a shape or an arrangement of the transmission parts in the non-overlapping region of the first photomask or the second photomask.

15. The apparatus of claim 14 , wherein

an irradiation region corresponding to one transmission part in the overlapping region of the first photomask and an irradiation region corresponding to one transmission part in the overlapping region of the second photomask overlap each other.

16. The apparatus of claim 14 , wherein

an irradiation region corresponding to one transmission part in the overlapping region of the first photomask and an irradiation region corresponding to one transmission part in the overlapping region of the second photomask do not overlap.

17. The apparatus of claim 14 , wherein

the overlapping region of at least one of the first photomask and the second photomask includes at least two subregions, and

shapes or arrangements of the transmission parts in the at least two subregions are different from each other.

18. An exposure apparatus for a photoalignment process, the exposure apparatus comprising:

a first photomask including a plurality of transmission parts arranged in a first direction; and

a second photomask including a plurality of transmission parts arranged in the first direction,

wherein the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region,

a transmission part of at least one of the first photomask and the second photomask has a shape that is asymmetric in a direction parallel to the first direction, and

a shape or an arrangement of the transmission parts in the overlapping region of the first photomask or the second photomask is different a shape or an arrangement of the transmission parts in the non-overlapping region of the first photomask or the second photomask.

19. The apparatus of claim 18 , wherein

irradiation regions corresponding to a portion of the transmission parts in the overlapping region of the first photomask and irradiation regions corresponding to a portion of the transmission parts in the overlapping region of the second photomask do not overlap.

20. The apparatus of claim 19 , wherein

a combined shape of one transmission part in the overlapping region of the first photomask and one transmission part in the overlapping region of the second photomask is substantially identical to a shape of the transmission parts in the non-overlapping region of the first photomask or the second photomask.

21. The apparatus of claim 18 , wherein

the overlapping region of at least one of the first photomask and the overlapping region of the second photomask includes at least two subregions, and

shapes or arrangements of the transmission parts in the at least two subregions are different from each other.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 029151/0055 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2011
From: CHO, SOO-RYUN; LEE, JUN WOO; KIM, KYOUNG TAE; YEOM, JOO SEOK; KANG, SUK HOON; KIM, EUN JU
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 026979/0822 →