Integrated anode and activated reactive gas source for use in magnetron sputtering device
The invention relates to an integrated anode and activated reactive gas source for use in a magnetron sputtering device and a magnetron sputtering device incorporating the same. The integrated anode and activated reactive gas source comprises a vessel having an interior conductive surface, comprising the anode, and an insulated outer body isolated from the chamber walls of the coating chamber. The vessel has a single opening with a circumference smaller that that of the vessel in communication with the coating chamber. Sputtering gas and reactive gas are coupled through an input into the vessel and through the single opening into the coating chamber. A plasma is ignited by the high density of electrons coming from the cathode and returning to the power supply through the anode. A relatively low anode voltage is sufficient to maintain a plasma of activated reactive gas to form stoichiometric dielectric coatings.
1. A magnetron sputtering device comprising:
a coating chamber adapted to be evacuated in operation;
a cathode having a central axis on which is disposed a target comprising material for forming a coating on one or more substrates;
a carrier comprising a plurality of coating areas and disposed above the target; and
one or more integrated anode and activated reactive gas sources located adjacent to the cathode, wherein each integrated anode and activated reactive gas source comprises:
a vessel including:
a conductive interior surface having one or more sidewalls and an adjoining end wall defining an interior of the vessel, electrically coupled to a positive output of a power supply, thereby serving as an anode and a preferred return path for electrons,
an insulated outer surface for electrically isolating the vessel from chamber walls of the coating chamber;
an opening configured to permit gas to pass from the interior of the vessel to the coating chamber; and
one or more gas inlet ports that are configured to direct a sputtering gas and a reactive gas to the interior of the vessel such that the reactive gas becomes activated forming a plasma in the interior of the vessel;
wherein a center point of the carrier and the opening of the integrated anode and activated reactive gas sources are disposed a same radial distance from the central axis of the cathode.
2. The magnetron sputtering device of claim 1 , wherein a circumference of the opening is smaller than a circumference of the interior of the vessel to shield the conductive interior surface from sputtered material.
3. The magnetron sputtering device of claim 1 , wherein the opening of the vessel is dimensioned such that a flow of sputtering gas and reactive gas can be selected to raise the pressure of the mixture of sputtering gas and reactive gas within the vessel higher than the pressure of the gases in the coating chamber.
4. The magnetron sputtering device of claim 1 , wherein in operation a voltage of 15 to 80 Volts is provided to the conductive interior surface of the vessel.
5. The magnetron sputtering device of claim 1 , wherein the sputtering gas is argon and the reactive gas is oxygen or nitrogen.
6. The magnetron sputtering device of claim 1 , wherein the insulated outer surface of the vessel is disposed exterior to the coating chamber.
7. The magnetron sputtering device of claim 1 , having a first and a second integrated anode and activated reactive gas sources.
8. The magnetron sputtering device of claim 1 , wherein the center point of the carrier rotate about the central axis, and wherein in operation the carrier passes directly above the opening of the integrated anode and activated reactive gas source.
9. The magnetron sputtering device of claim 1 , wherein the integrated anode and activated reactive gas source comprises one gas inlet port, and wherein the sputtering gas and the reactive gas flow through the gas inlet port into the vessel.
10. A magnetron sputtering device comprising:
a coating chamber having a central rotation axis and adapted to be evacuated in operation;
a cathode on which is disposed a target comprising material for forming a coating on one or more substrates;
a carrier comprising a plurality of coating areas and disposed above the target; and
two integrated anode and activated reactive gas sources disposed on opposite sides of the cathode, wherein each integrated anode and activated reactive gas source comprises:
a vessel including:
a conductive interior surface having one or more sidewalls and an adjoining end wall defining an interior of the vessel, electrically coupled to a positive output of a power supply, thereby serving as an anode and a preferred return path for electrons,
an insulated outer surface for electrically isolating the vessel from chamber walls of the coating chamber;
an opening configured to permit gas to pass from the interior of the vessel to the coating chamber; and
one or more gas inlet ports that are configured to direct a sputtering gas and a reactive gas to the interior of the vessel such that the reactive gas becomes activated forming a plasma in the interior of the vessel;
wherein the cathode, the opening of each of the integrated anode and activated reactive gas sources, and the carrier are disposed a same radial distance from the central rotational axis of the chamber.
11. The magnetron sputtering device of claim 10 , wherein in operation the carrier passes directly over the cathode and the two integrated anode and activated reactive gas source.
12. The magnetron sputtering device of claim 10 , wherein the two integrated anode and activated reactive gas sources each operate continuously.
13. The magnetron sputtering device of claim 10 , wherein the two integrated anode and activated reactive gas sources operate in alternation at a frequency of 1 Hz or greater.