Organic layer deposition apparatus

1. A method for forming an organic layer on a substrate by an organic layer deposition apparatus comprising a deposition source, a deposition source nozzle unit, and a patterning slit sheet, the method comprising:

disposing the deposition source nozzle unit at a side of the deposition source, the deposition source nozzle unit comprising a plurality of deposition source nozzles arranged in a first direction;

disposing the patterning slit sheet to face the deposition source nozzle unit, the patterning slit sheet having a plurality of patterning slits arranged in a second direction perpendicular to the first direction;

discharging a deposition material by the deposition source and through the deposition source nozzle unit and the patterning slit sheet to form the organic layer on the substrate,

wherein the plurality of patterning slits comprise:

a central patterning slit at a center of the patterning slit sheet;

a plurality of left patterning slits disposed to a left of the central patterning slit; and

a plurality of right patterning slits disposed to a right of the central patterning slit,

wherein, when the patterning slit sheet is planar and rectangular in shape, the plurality of left patterning slits and the plurality of right patterning slits bend toward the central patterning slit.

2. The method of claim 1 , wherein a lengthwise direction of the central patterning slit is parallel with the first direction.

3. The method of claim 1 , wherein the plurality of left patterning slits and the plurality of right patterning slits bend toward a midpoint on the central patterning slit.

4. The method of claim 1 , wherein widths of the plurality of patterning slits are the same.

5. The method of claim 1 , wherein distances between adjacent left patterning slits are the same.

6. The method of claim 1 , wherein distances between adjacent right patterning slits are the same.

7. The method of claim 1 , wherein distances between adjacent patterning slits are not the same.

8. The method of claim 7 , wherein the farther the plurality of left patterning slits are located away from the central patterning slit, the shorter the distances between adjacent left patterning slits.

9. The method of claim 7 , wherein the farther the plurality of right patterning slits are located away from the central patterning slit, the shorter the distances between adjacent right patterning slits.

10. The method of claim 7 , wherein widths of the plurality of patterning slits are the same.

11. The method of claim 1 , wherein widths of the plurality of patterning slits are not the same.

12. The method of claim 11 , wherein the farther the plurality of left patterning slits are located away from the central patterning slit, the less the widths of the plurality of left patterning slits.

13. The method of claim 11 , wherein the farther the plurality of right patterning slits are located away from the central patterning slit, the less the widths of the plurality of right patterning slits.

14. The method of claim 11 , wherein distances between adjacent left patterning slits are the same.

15. The method of claim 11 , wherein distances between adjacent right patterning slits are the same.

16. The method of claim 1 , wherein the deposition source, the deposition source nozzle unit, and the patterning slit sheet are integrated as one body.

17. The method of claim 1 , wherein the deposition source, the deposition source nozzle unit, and the patterning slit sheet are integrated as one body via connection members configured to guide movement of the deposition material.

18. The method of claim 17 , wherein the connection members are formed to seal a space between the deposition source, the deposition source nozzle unit, and the patterning slit sheet.

19. The method of claim 1 , wherein the plurality of deposition source nozzles are tilted at a set angle.

20. The method of claim 19 , wherein the plurality of deposition source nozzles comprise deposition source nozzles arranged in two rows in the first direction, wherein the deposition source nozzles in the two rows are tilted to face each other.

21. The method of claim 19 , wherein the plurality of deposition source nozzles comprise deposition source nozzles arranged in first and second rows in the first direction,

wherein the deposition source nozzles of the first row located to overlap a left side of the patterning slit sheet are arranged to face a right side of the patterning slit sheet, and

the deposition source nozzles of the second row located to overlap the right side of the patterning slit sheet are arranged to face the left side of the patterning slit sheet.

22. The method of claim 1 , wherein the central patterning slit extends along a direction to correspond to the first direction in which the plurality of deposition source nozzles are arranged.

23. The method of claim 1 , wherein the patterning slit sheet sags toward the deposition source.