In-line deposition system and process for deposition of a thin film layer

1. An apparatus for vapor deposition of a sublimated source material as a thin film on a substrate, said apparatus comprising:

a receptacle configured to hold a source material;

a distribution plate positioned above the receptacle, wherein the distribution plate defines a pattern of passages therethrough;

a conveyor defining a pair of raised edges and a transfer surface such that the raised edges are raised with respect to the transfer surface, wherein the conveyor is configured to travel in a continuous loop such that the transfer surface passes above the distribution plate in a first direction to receive thereon sublimated source material passing through the passages of the distribution plate, and wherein the conveyor is configured to travel in a second direction while carrying a substrate on the raised edges;

a heating system configured to heat the conveyor while it travels in the second direction; and

a cooling system configured to cool the conveyor while it travels in the first direction, wherein the heating system and the cooling system are positioned within the continuous loop defined by the conveyor.

2. The apparatus as in claim 1 , wherein the conveyor is configured to support the substrate only along its raised edges.

3. The apparatus as in claim 1 , further comprising:

a heating element positioned to sublimate the source material in the receptacle.

4. The apparatus as in claim 1 , further comprising:

a shutter plate between the receptacle and the distribution plate, wherein the shutter plate is movable between an open position and a closed position.

5. The apparatus as in claim 1 , further comprising:

a feed system configured to supply source material to the receptacle.

6. The apparatus as in claim 1 , wherein the conveyor comprises graphite.

7. The apparatus as in claim 1 , further comprising:

a second heating system configured to heat the substrate as it is being carried by the conveyor in the second direction.

8. An apparatus for vapor deposition of a sublimated source material as a thin film on a substrate, said apparatus comprising:

a receptacle configured to hold a source material;

a distribution plate positioned above the receptacle, wherein the distribution plate defines a pattern of passages therethrough;

a conveyor defining a pair of raised edges and a transfer surface such that the raised edges are raised with respect to the transfer surface, wherein the conveyor is configured to travel in a continuous loop such that the transfer surface passes above the distribution plate in a first direction to receive thereon sublimated source material passing through the passages of the distribution plate, and wherein the conveyor is configured to travel in a second direction while carrying a substrate on the raised edges; and

a heating system configured to heat the conveyer while it travels in the second direction,

wherein the substrate defines an arc when supported by the conveyor such that each lateral edge on a lower surface of the substrate is below a middle portion of the lower surface of the substrate, wherein the lower surface faces the transfer surface.

9. The apparatus as in claim 8 , wherein the transfer surface of the conveyor defines an arc that is substantially parallel to the arc of the substrate.

10. A process for vapor deposition of a sublimated source material to form thin film on a substrate, the process comprising:

sublimating a source material such that source vapors pass through a plurality of passages defined in a deposition plate;

moving a conveyor around a continuous loop, wherein the conveyor defines a pair of raised edges and a transfer surface such that the raised edges are raised with respect to the transfer surface; depositing the source vapors onto the transfer surface of the conveyor as the conveyor travels in a first direction above the distribution plate;

carrying a substrate on the raised edges of the conveyor in a second direction;

heating the conveyor while it travels in the second direction carrying the substrate such that the deposited source vapors on the transfer surface of the conveyor transfers to the substrate; and

cooling the conveyor while it travels in the first direction, wherein the conveyor is cooled to a plating temperature while traveling in the first direction, wherein the plating temperature is about 350° C. to about 500° C.

11. The process as in claim 10 , wherein the transfer surface of the conveyor has a transfer temperature when traveling in the second direction, wherein the transfer temperature is about 500° C. to about 650° C.

12. The process as in claim 10 , wherein the substrate bends to define a concave arc while being carried by the conveyor such that each lateral edge on the upper surface of the substrate is above a middle portion of the upper surface of the substrate.

13. The process as in claim 12 , wherein the transfer surface of the conveyor defines an arc that is substantially parallel to the concave arc of the substrate.

14. The process as in claim 12 , further comprising:

transporting the substrates through a heating apparatus and onto the conveyor to heat the substrates to a deposition temperature, wherein the substrates are initially substantially planar and, upon heating, the substrates are deformed to define the arc.

15. The process as in claim 10 , further comprising:

supplying additional source material to the receptacle via a feed system without interrupting the deposition process.

16. The process as in claim 10 , wherein the substrate is supported by the conveyor only on its raised edges.