Manufacturing method of display device
View Patent ↗An organic passivation film having a high transmittance and capable of setting a taper angle of a through hole within a predetermined range in a liquid crystal display device. A pixel electrode and a source electrode of a TFT are connected by way of a through hole formed in an organic passivation film. The organic passivation film having high productivity, high transmittance, and a predetermined taper angle θ of a through hole can be formed by using a chemical amplification photosensitive resin composition comprising, as a base material, an acrylic resin having a molecular weight of 4,000 to 20,000 and containing 1 to 6 wt % of a photoacid generator as the material for the organic passivation film, performing exposure and development for forming a through hole, and then performing post exposure, prebaking, and baking under appropriate conditions.
1. A method of manufacturing a display device, wherein an organic passivation film is formed, the method comprising the steps of:
coating a chemical amplification photosensitive resin composition comprising an acrylic resin having a molecular weight of 4,000 to 20,000 as a base material, the chemical amplification photosensitive resin composition containing 1 to 4 wt % of a photoacid generator, and prebaking the chemical amplification photosensitive resin composition to cure the coated composition;
exposing the cured chemical amplification photosensitive resin composition by using a mask and developing the same;
subjecting the developed chemical amplification photosensitive resin composition to post exposure at an exposure dose of 500 mJ/cm 2 or less; and
subsequently, heating the post-exposed composition at 220 to 250° C.
2. A method of manufacturing a display device according to claim 1 , wherein the chemical amplification photosensitive resin composition contains 1 to 2 wt % of the photoacid generator.
3. A method of manufacturing a display device, wherein an organic passivation film is formed, the method comprising the steps of:
coating a chemical amplification photosensitive resin composition comprising an acrylic resin having a molecular weight of 4,000 to 20,000 as a base material, the chemical amplification photosensitive resin composition containing 1 to 5 wt % of a photoacid generator, and prebaking the chemical amplification photosensitive resin composition to cure the coated composition;
exposing the cured chemical amplification photosensitive resin composition by using a mask and developing the same;
subjecting the developed chemical amplification photosensitive resin composition to post exposure at an exposure dose of 200 mJ/cm 2 or less; and
subsequently, heating the post-exposed composition at 220 to 250° C.
4. A method of manufacturing a display device, wherein an organic passivation film is formed, the method comprising the steps of:
coating a chemical amplification photosensitive resin composition comprising an acrylic resin having a molecular weight of 4,000 to 20,000 as a base material, the chemical amplification photosensitive resin composition containing 1 to 6 wt % of a photoacid generator, and prebaking the chemical amplification photosensitive resin composition to cure the coated composition;
exposing the cured chemical amplification photosensitive resin composition by using a mask and developing the same;
subjecting the developed chemical amplification photosensitive resin composition to post exposure at an exposure dose of 300 mJ/cm 2 to 500 mJ/cm 2 ;
subsequently performing prebaking at a prebaking temperature of 100° C. to 180° C.; and
subsequently heating the prebaked composition at 220 to 250° C.
5. A method of manufacturing a display device according to claim 1 , wherein
a through hole is formed in the organic passivation film,
the organic passivation film has a side wall of the through hole, and
an angle formed between the side wall and a film in a layer below the organic passivation film is 50 degree or more and 70 degree or less.
6. A method of manufacturing a display device according to claim 2 , wherein
a through hole is formed in the organic passivation film,
the organic passivation film has a side wall of the through hole, and
an angle formed between the side wall and a film in a layer below the organic passivation film is 50 degree or more and 70 degree or less.
7. A method of manufacturing a display device according to claim 3 , wherein
a through hole is formed in the organic passivation film,
the organic passivation film has a side wall of the through hole, and
an angle formed between the side wall and a film in a layer below the organic passivation film is 50 degree or more and 70 degree or less.
8. A method of manufacturing a display device according to claim 4 , wherein
a through hole is formed in the organic passivation film,
the organic passivation film has a side wall of the through hole, and
an angle formed between the side wall and a film in a layer below the organic passivation film is 50 degree or more and 70 degree or less.
9. A method of manufacturing a display device according to claim 1 , wherein the organic passivation film is formed to have a thickness of 2 to 3 μm.
10. A method of manufacturing a display device according to claim 3 , wherein the organic passivation film is formed to have a thickness of 2 to 3 μm.
11. A method of manufacturing a display device according to claim 4 , wherein the organic passivation film is formed to have a thickness of 2 to 3 μm.