IP Library Granted Patent US 9,214,589
Granted Patent B2
US 9,214,589 · App. 13/256,979 · Granted Dec 15, 2015

Method of inline manufacturing a solar cell panel

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Quick Facts
Patent No.
US 9,214,589
App. No.
13/256,979
Granted
Dec 15, 2015
Kind
B2
Abstract

Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal(τ).

Claims (62)

1. A method of inline manufacturing a solar cell panel comprising:

defining consecutive distinct treatments of different durations for treating surfaces on a substrate,

establishing a basic treatment step duration,

dividing each of the consecutive distinct treatments in a number of sub-treatment portions, each sub-treatment portion having a duration equal to the basic treatment step duration, and

performing each sub-treatment portion in a separate treatment station.

2. The method of claim 1 , said consecutive distinct treatments comprising deposition of a layer of one of the following materials: Al, AlN, Al 2 O 3 , ITO, ITO:H, CrO 2 , GeN, SiC, SiON, SiO 2 , SiAlON, SiNiON, TiO 2 , ZAO (Zinc-aluminum-oxide), MgF 2 , ZNO, Ag, Au, AuSn, AuGe, Cu, Cr, Ni, NiV, Ti, a-Si, SiGe, ZnS, SiN:H, and SiN.

3. The method of claim 1 , wherein said consecutive distinct treatments comprise at least one of:

single-source PVD sputtering;

multisource PVD sputtering;

PECVD;

LEPCVD;

etching;

cooling; and

degassing.

4. The method of claim 1 , said consecutive distinct treatments comprising deposition of layers on both sides of a substrate.

5. The method of claim 4 , said layers being a first layer of one of SiN, SiC, SiO 2 , and a-Si, and a second layer of one of Al and of Ag.

6. The method of claim 5 , said first layer being deposited of SiN in a first number of subsequent treatment stations, said second layer is deposited of Al in a second number of subsequent treatment stations, wherein said second number is selected to be larger than said first number.

7. The method of claim 6 , wherein said second number is selected to be larger than said first number by a factor of 5.

8. The method of claim 1 , wherein the basic treatment step duration is a fraction of a longest duration of the different durations and at least one of said consecutive distinct treatments comprises at least two of said sub-treatment portions of said consecutive distinct treatments together.

9. The method of claim 1 , further comprising the steps of transporting the substrate on a conveyor to treatment facilities each having several treatment stations for performing each sub-treatment portion of said consecutive distinct treatments; removing the substrate from the conveyor line at the treatment facilities for performing each sub-treatment portion of said consecutive distinct treatments at said several treatment stations.

10. The method according to claim 9 further comprising looping the substrate more than one time through at least a part of said treatment stations.

11. The method of claim 1 , wherein similar sub-treatment portions of each of said consecutive distinct treatments of different durations are performed at more than one subsequent treatment station.

12. The method of claim 1 , wherein a deposition of a subsequent layer of the same material is performed at more than one subsequent treatment station.

13. The method of claim 1 , wherein a deposition of a subsequent layer of the same material with different thickness is performed at more than one subsequent treatment station.

14. A method of inline manufacturing a solar cell panel comprising:

treating surfaces by consecutive treatments of different durations,

establishing a basic treatment step duration, and

performing portions of each of said consecutive treatments of different duration in a respective number of subsequent treatment stations, treatment in each of said subsequent treatment stations for said portions of said consecutive treatments having a duration equal to said basic treatment step duration, said consecutive treatments of different durations comprising depositing a layer of SiN:H by one of CVD or PVD on a silicon wafer, by multiple subsequent treatment stations.

15. A method of inline manufacturing a solar cell panel comprising:

treating surfaces on a substrate by consecutive treatments of different durations,

establishing a basic treatment step duration,

performing portions of each of said consecutive treatments of different duration in a respective number of subsequent treatment stations, treatment in each of said subsequent treatment stations for said portions of said consecutive treatments of different durations having a duration equal to said basic treatment step duration, said consecutive treatments comprising deposition of a first layer of SiN:H in a first number of subsequent treatment stations and deposition on said first layer of a second layer of SiN in a second number of subsequent treatment stations.

16. The method of claim 15 , said second number being selected to be larger than said first number.

17. The method of claim 16 , wherein said second number is selected to be larger than said first number by a factor of 5.

18. A method of inline manufacturing a solar cell panel comprising:

treating surfaces on a substrate by consecutive treatments of different durations,

establishing a basic treatment step duration, and

performing portions of each of said consecutive treatments of different durations in a respective number of subsequent treatment stations, treatment in each of said subsequent treatment stations for said portions of said consecutive treatments having a duration equal to said basic treatment step duration, said consecutive treatments of different durations comprising deposition of a first layer of SiN:H in a first number of subsequent treatment stations, thereon of a second layer of ZnS—SiO 2 in a second number of subsequent treatment stations, thereon of a third layer of SiO 2 in a third number of subsequent treatment stations.

19. The method of claim 18 , thereby selecting said first and second number to be equal.

20. The method of claim 18 , thereby selecting said third number to be larger than said first number.

21. The method of claim 20 , wherein said third number is selected to be larger than said first number by a factor of 4.

22. A method of inline manufacturing a solar cell panel comprising:

treating surfaces on a substrate by consecutive distinct treatments of different durations in

separate treatment stations,

establishing a basic treatment step duration,

dividing each of the consecutive distinct treatments in a number of sub-treatment portions, each sub-treatment portion having a duration equal to the basic treatment step duration, and

performing each sub-treatment portion of each of the consecutive distinct treatments of different durations in a different one of the separate treatment stations.

23. A method of inline manufacturing a solar cell panel comprising:

defining consecutive distinct treatments of different durations for treating surfaces on a substrate,

establishing a basic treatment step duration,

dividing each of the consecutive distinct treatments in a number of sub-treatment portions, each sub-treatment portion having a duration equal to the basic treatment step duration, and

performing each sub-treatment in a separate treatment station,

wherein each of the consecutive treatments of different durations consists of one of:

deposition of a layer of one of the following materials: Al, AlN, Al2O3, ITO, ITO:H, CrO2, GeN, SiC, SiON, SiO2, SiAlON, SiNiON, TiO2, ZAO (Zinc-aluminum-oxide), MgF2, ZNO, Ag, Au, AuSn, AuGe, Cu, Cr, Ni, NiV, Ti, a-Si, SiGe, ZnS, SiN:H, and SiN; or

one of:

single-source PVD sputtering;

multisource PVD sputtering;

PECVD;

LEPCVD;

etching;

cooling; and

degassing.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2019
From: EVATEC ADVANCED TECHNOLOGIES AG (FORMALLY KNOWN AS OERLIKON ADVANCED TECHNOLOGIES AG)
To: EVATEC AG
Reel/Frame 048566/0808 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2014
From: OC OERLIKON BALZERS AG
To: OERLIKON ADVANCED TECHNOLOGIES AG
Reel/Frame 032068/0943 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 1, 2011
From: VOSER, STEPHAN; RATTUNDE, OLIVER; DUBS, MARTIN; FEISTRITZER, GERALD; WUESTENHAGEN, VOLKER; DOVIDS, GERHARD
To: OC OERLIKON BALZERS AG
Reel/Frame 027308/0076 →