HEATING LAMP SYSTEM AND METHODS THEREOF
Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD). In one embodiment, a heating lamp assembly for a CVD reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a plurality of lamps extending from a first lamp holder to a second lamp holder. The lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. In another embodiment, the method includes exposing a lower surface of a wafer carrier to energy emitted from the heating lamp assembly and heating the wafer carrier to a predetermined temperature.
1 .- 84 . (canceled)
85 . A heating lamp assembly for a vapor deposition reactor system, comprising:
a lamp housing disposed of an upper surface of a support base and comprising a first lamp holder and a second lamp holder;
a first plurality of lamps extending from the first lamp holder to the second lamp holder, wherein each lamp of the first plurality of lamps comprises a split filament lamp;
a second plurality of lamps extending from the first lamp holder to the second lamp holder, wherein each lamp of the second plurality of lamps comprises a non-split filament lamp; and
a reflector disposed on the upper surface of the support base between the first lamp holder and the second lamp holder.
86 . The heating lamp assembly of claim 85 , further comprising at least one mirror extending along the upper surface of the support base, and extending from the reflector at an angle of about 90°.
87 . The heating lamp assembly of claim 85 , further comprising a controller for independently controlling power to each of the lamps.
88 . The heating lamp assembly of claim 85 , wherein the first lamp holder or the second lamp holder independently has a cooling coefficient within a range from about 2,000 W/m 2 -K to about 3,000 W/m 2 -K.
89 . A heating lamp assembly for a vapor deposition reactor system, comprising:
a lamp housing disposed of an upper surface of a support base and comprising a first lamp holder and a second lamp holder;
a first plurality of posts disposed on the first lamp holder and a second plurality of posts disposed on the second lamp holder;
a plurality of lamps, wherein each lamp comprises a split filament lamp or a non-split filament lamp, and each lamp is disposed between a pair of posts on the first lamp holder, extends from the first lamp holder to the second lamp holder, and is disposed between a pair of posts on the second lamp holder; and
a reflector disposed on the upper surface of the support base between the first lamp holder and the second lamp holder.
90 . The heating lamp assembly of claim 89 , further comprising at least one mirror extending along the upper surface of the support base, and extending from the reflector at an angle of about 90°.
91 . The heating lamp assembly of claim 89 , wherein the first lamp holder or the second lamp holder independently has a cooling coefficient within a range from about 2,000 W/m 2 -K to about 3,000 W/m 2 -K.
92 . A heating lamp assembly for a vapor deposition reactor system, comprising:
a lamp housing disposed of an upper surface of a support base and comprising a first lamp holder and a second lamp holder;
a first plurality of posts disposed on the first lamp holder and a second plurality of posts disposed on the second lamp holder;
a plurality of lamps extending from the first lamp holder to the second lamp holder, wherein a first end of each lamp is disposed between two posts on the first lamp holder and a second end of each lamp is disposed between two posts on the second lamp holder; and
a reflector disposed on the upper surface of the support base between the first lamp holder and the second lamp holder.
93 . The heating lamp assembly of claim 92 , further comprising at least one mirror extending along the upper surface of the support base, and extending from the reflector at an angle of about 90°.
94 . The heating lamp assembly of claim 92 , wherein the material of the first lamp holder or the second lamp holder independently has a cooling coefficient within a range from about 2,000 W/m 2 -K to about 3,000 W/m 2 -K.
95 . A method for heating a substrate or a substrate susceptor within a vapor deposition reactor system by a heating lamp assembly, comprising:
exposing a lower surface of a substrate susceptor to energy emitted from a heating lamp assembly, and
heating the substrate susceptor to a predetermined temperature, wherein the heating lamp assembly comprises:
a lamp housing disposed of an upper surface of a support base and comprising at least one lamp holder;
a plurality of lamps extending from the at least one lamp holder; and
a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps.
96 . The method of claim 95 , wherein the substrate susceptor is a substrate carrier, a wafer carrier, or a levitating wafer carrier.
97 . The method of claim 95 , wherein the first lamp holder and the second lamp holder are each independently maintained at a temperature within a range from about 275° C. to about 375° C.