IP Library Granted Patent US 8,198,957
Granted Patent B2
US 8,198,957 · App. 13/270,868 · Granted Jun 12, 2012

Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 8,198,957
App. No.
13/270,868
Granted
Jun 12, 2012
Kind
B2
Abstract

A micro-electro-mechanical-system resonator, includes: a substrate; a fixed electrode formed on the substrate; and a movable electrode, arranged facing the fixed electrode and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on a gap between the fixed electrode and the movable electrode. An internal surface of a support beam of the movable electrode facing the fixed electrode has an inclined surface.

Claims (47)

1. A micro-electro-mechanical-system resonator, comprising:

a substrate;

a fixed electrode formed on the substrate through an insulating film; and

a movable electrode, arranged facing the fixed electrode and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on a gap between the fixed electrode and the movable electrode,

wherein the electrostatic attracting force or the electrostatic repulsion force acting on the gap between the fixed electrode and the movable electrode causes the movable electrode to vibrate,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and

an internal surface of the support beam of the movable electrode facing the fixed electrode has an inclined surface.

2. The micro-electro-mechanical-system resonator according to claim 1 , wherein the inclined surface has an inclination angle.

3. The micro-electro-mechanical-system resonator according to claim 1 , wherein the gap has a constant distance.

4. The micro-electro-mechanical-system resonator according to claim 2 , wherein the inclination angle is from 5° to 15°.

5. The micro-electro-mechanical-system resonator according to claim 1 , wherein the internal surface of the support beam of the movable electrode facing the fixed electrode is curved.

6. A method for manufacturing a micro-electro-mechanical-system resonator, comprising:

forming, on a substrate through an insulating film, a fixed electrode having a sidewall on a side thereof; and

forming a movable electrode above the fixed electrode, having a gap in between, arranged to face the fixed electrode, and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on the gap between the fixed electrode and the movable electrode,

wherein the electrostatic attracting force or the electrostatic repulsion force acting on the gap between the fixed electrode and the movable electrode causes the movable electrode to vibrate,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and

an internal surface of a support beam of the movable electrode facing the fixed electrode has an inclined surface.

7. The method for manufacturing the micro-electro-mechanical-system resonator according to claim 6 , wherein

forming the movable electrode further comprises:

forming a sacrifice film on the fixed electrode; and

thereafter forming the movable electrode on the substrate and on the sacrifice film, so that the movable electrode is arranged to face at least part of the fixed electrode.

8. The method for manufacturing a micro-electro-mechanical-system resonator according to claim 6 , wherein the side wall on the fixed electrode is curved.

9. The method for manufacturing a micro-electro-mechanical-system resonator according to claim 6 , wherein the side wall on the side of the fixed electrode has an inclination angle from 5° to 15°.

10. A micro-electro-mechanical-system resonator, comprising:

a substrate;

a fixed electrode formed on the substrate through an insulating film; and

a movable electrode, arranged facing the fixed electrode and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on a gap between the fixed electrode and the movable electrode,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and

an internal surface of a support beam of the movable electrode facing the fixed electrode has an inclined surface, and

the movable electrode is an extension of the support beam.

11. A micro-electro-mechanical-system resonator, comprising:

a substrate;

a fixed electrode formed on the substrate through an insulating film; and

a movable electrode, arranged facing the fixed electrode and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on a gap between the fixed electrode and the movable electrode,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and comprises a horizontal portion of the support facing the fixed electrode, and

wherein an internal surface of the support beam of the movable electrode facing the fixed electrode has an inclined surface.

12. A method for manufacturing a micro-electro-mechanical-system resonator, comprising:

forming, on a substrate an insulating film, a fixed electrode having a sidewall on a side thereof; and

forming a movable electrode above the fixed electrode, having a gap in between, arranged to face the fixed electrode, and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on the gap between the fixed electrode and the movable electrode,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and

wherein an internal surface of the support beam of the movable electrode facing the fixed electrode has an inclined surface, and

the movable electrode is an extension of the support beam.

13. A method for manufacturing a micro-electro-mechanical-system resonator, comprising:

forming, on a substrate an insulating film, a fixed electrode having a sidewall on a side thereof; and

forming a movable electrode above the fixed electrode, having a gap in between, arranged to face the fixed electrode, and driven by an electrostatic attracting force or an electrostatic repulsion force that acts on the gap between the fixed electrode and the movable electrode,

the movable electrode comprising a support beam, the support beam having a fixed portion arranged on the substrate through the insulation film, and comprises a horizontal portion of the support facing the fixed electrode, and

wherein an internal surface of the support beam of the movable electrode facing the fixed electrode has an inclined surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2019
From: SEIKO EPSON CORPORATION
To: 138 EAST LCD ADVANCEMENTS LIMITED
Reel/Frame 050197/0212 →
Priority Claims (3)
JP 2005-332444 · Nov 17, 2005 · national
JP 2005-332445 · Nov 17, 2005 · national
JP 2006-261135 · Sep 26, 2006 · national
Continuity (3)
Continuation 12639102 · Dec 16, 2009
Continuation 11561146 · Nov 17, 2006
Related Publication 20120025922A1 · Feb 2, 2012