CMP pad dresser with oriented particles and associated methods
View Patent ↗CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser wear.
1. A method for controlling CMP pad dresser performance in a CMP pad dresser as part of the pad dresser fabrication process, the pad dresser employing a plurality of superabrasive particles comprising:
orienting the superabrasive particles into an attitude that provides an anticipated performance characteristic, wherein all superabrasive particles in a central location on the dresser are disposed in an attitude with an edge oriented toward a pad to be dressed, and all remaining superabrasive particles are disposed in an attitude whereby an edge is not oriented toward the pad, and wherein the attitudes of the superabrasive particles in the central location on the dresser are different from the attitudes of the remaining superabrasive particles.
2. The method of claim 1 , wherein the performance characteristic is an optimal pad dressing rate.
3. The method of claim 1 , wherein the performance characteristic is optimal pad dresser wear.
4. The method of claim 1 , wherein the performance characteristic is an optimized balance of dressing rate and dresser wear.
5. The method of claim 1 , wherein the superabrasive particles include members selected from a group consisting of: diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), and polycrystalline cubic boron nitride (PCBN).
6. The method of claim 1 , wherein the superabrasive particles are attached to a substrate selected from the group consisting essentially of metallic materials, flexible materials, ceramic materials and mixtures thereof.
7. The method of claim 1 , wherein superabrasive particles not in a central location on the dresser are disposed in an attitude with a face oriented toward a pad to be dressed.
8. The method of claim 1 , wherein superabrasive particles not in a central location on the dresser are disposed in an attitude with an apex oriented toward a pad to be dressed.
9. A chemical mechanical polishing (CMP) pad dresser comprising:
a substrate; and
a plurality of superabrasive particles attached to the substrate, said particles being configured in an attitude that controls CMP pad dresser performance, wherein all superabrasive particles that are centrally located are disposed in an attitude with an edge oriented toward a pad to be dressed, and all remaining superabrasive particles are disposed in an attitude whereby an edge is not oriented toward the pad, and wherein the attitudes of the superabrasive particles in the central location on the dresser are different from the attitudes of the remaining superabrasive particles.
10. The CMP pad dresser of claim 9 , wherein superabrasive particles not in a central location on the dresser are disposed in an attitude with a face oriented toward a pad to be dressed.
11. The CMP pad dresser of claim 9 , wherein superabrasive particles not in a central location on the dresser are disposed in an attitude with an apex oriented toward a pad to be dressed.
12. The CMP pad dresser of claim 9 , wherein said superabrasive particles have a size from about 100 to 350 micrometers.
13. A method for manufacturing a CMP pad dresser as recited in claim 9 , comprising the steps of:
providing a substrate;
selecting an attitude for superabrasive particles that provides an anticipated performance characteristic;
orienting the superabrasive particles into the selected attitude in relation to the substrate; and
bonding the abrasive particles to the substrate in the selected attitude.