Methods of and semiconductor devices with ball strength improvement
In a method of improving ball strength of a semiconductor device, a ball pattern of a plurality of connection balls to be formed as electrical connections for the semiconductor device is received. The pattern includes a number of columns and rows crossing each other. The balls are arranged at intersections of the columns and rows. An arrangement of balls in a region of the ball pattern is modified so that the region includes no isolated balls.
1. A method of improving ball strength of a semiconductor device, said method comprising:
receiving a ball pattern of a plurality of connection balls to be formed as electrical connections for the semiconductor device, said pattern comprising a number of columns and rows crossing each other, said balls being arranged at intersections of said columns and rows; and
modifying an arrangement of balls in a region of the ball pattern so that said region includes no isolated balls.
2. The method of claim 1 , wherein
an isolated ball is a ball that has no or only one neighboring ball immediately adjacent said isolated ball in the same column or row.
3. The method of claim 1 , wherein
said modifying includes moving at least a ball in said region to an empty intersection so that every ball in said region has at least two neighboring balls.
4. The method of claim 1 , wherein
said modifying includes adding a ball to an empty intersection in said region so that every ball in said region has at least two neighboring balls.
5. The method of claim 4 , wherein
said added ball is a dummy ball that defines no electrical connection for the semiconductor device.
6. The method of claim 1 , wherein
said modifying includes populating every empty intersection in said region with a dummy ball that defines no electrical connection for the semiconductor device.
7. The method of claim 1 , wherein
said region is an entirety of said ball pattern.
8. The method of claim 1 , wherein
said region includes a corner region of said ball pattern.
9. The method of claim 1 , wherein
said region includes all corner regions of said ball pattern.
10. The method of claim 1 , further comprising
manufacturing the semiconductor device having the ball pattern obtained after said modifying.
11. A method of improving ball strength of a semiconductor device, said method comprising:
receiving a ball pattern of a plurality of connection balls to be formed for the semiconductor device, said pattern comprising a number of columns and rows crossing each other, said balls being arranged at some, but not all, intersections of said columns and rows;
identifying, among the plurality of balls, at least one isolated ball, wherein said isolated ball has at most one neighboring ball immediately adjacent said isolated ball in the same column or row; and
modifying the ball pattern by adding one or more balls each to an empty intersection adjacent said isolated ball so that said isolated ball has two or more neighboring balls.
12. The method of claim 11 , wherein
said isolated ball is a corner ball of the ball pattern.
13. The method of claim 11 , wherein
said modifying is performed to ensure that every corner ball of the modified ball pattern has two neighboring balls.
14. The method of claim 11 , wherein
said isolated ball is in a corner region of the ball pattern, and
said modifying is performed to ensure that every ball in said corner region of the modified ball pattern has two or more neighboring balls.
15. The method of claim 11 , wherein
said modifying is performed to ensure that every ball in every corner region of the modified ball pattern has two or more neighboring balls.
16. The method of claim 11 , wherein
said modifying is performed only for all corner regions of the ball pattern and to ensure that every ball in every corner region of the modified ball pattern has two or more neighboring balls.
17. The method of claim 11 , wherein
said modifying is performed to ensure that every ball in the modified ball pattern, including said one or more added balls, has two or more neighboring balls.
18. A method of manufacturing a semiconductor device with improved ball strength, the method comprising:
placing a plurality of connection balls on an active surface of a chip and in electrical connection with the chip, said connection balls being arranged at some, but not all, intersections of a number of columns and rows crossing each other; and
placing a plurality of dummy balls on the active surface but not in electrical connection with the chip, said dummy balls being arranged at intersections where the connection balls are not arranged;
wherein, at least in corner regions of the chip, every connection or dummy ball among the plurality of connection balls or the plurality of dummy balls has at least two neighboring connection or dummy balls among the plurality of connection balls or the plurality of dummy balls.
19. The method of claim 18 , wherein, among the plurality of connection balls, at least one connection ball in one of the corner regions of the chip has no more than one neighboring connection ball.
20. The semiconductor device of claim 18 , further comprising:
coupling a substrate with opposite surfaces to the chip, wherein one of said surfaces is mechanically connected to said chip by said plurality of connection balls and said plurality of dummy balls, and electrically connected to said chip via said plurality of connection balls;
forming an encapsulant on said one surface of the substrate, the encapsulant covering the chip and the plurality of connection balls and the plurality of dummy balls; and
forming solder balls on the other surface of the substrate, wherein said solder balls are in electrical connection with the plurality of connection balls via the substrate.