IP Library Patent Application 13292962
Patent Application
App. No. 13/292,962

System and Method for Bubble Removal

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Quick Facts
Patent No.
US None
App. No.
13/292,962
Abstract

In one aspect of the invention, systems, methods, and devices are provided for handling liquid. In some embodiments, such systems, methods, and devices are used to combine fluids while removing gaseous bubbles.

Claims (43)

1 . An apparatus for removing a bubble, comprising:

a first substrate having an inner surface that defines a top surface of at least one chamber;

a second substrate having inner surfaces that define the chamber and at least one venting channel there between the first substrate and the second substrate;

a third substrate having inner surfaces that define at least one main channel leading into a bottom entrance of the chamber connected to a bottom surface of the chamber in the second substrate, wherein the bottom surface of the chamber is coated to provide a hydrophobic surface and the bottom surface of the chamber is adapted with a radius to retain a quantity of a first fluid and a second fluid such that the surface tension of the bottom surface maintains the fluids in contact with the bottom surface of the chamber; and

a pressurized gas for moving the fluids wherein a bubble is in between the first fluid and the second fluid, while the fluids are collected in the chamber wherein the bubble is dispelled, resulting in removing the bubble from the fluids.

2 . An apparatus according to claim 1 wherein the radius is in the range of 1 mm to 20 mm.

3 . An apparatus according to claim 1 wherein the radius is in the range of 2 mm to 10 mm.

4 . An apparatus according to claim 1 wherein the radius is in the range of 2 mm to 4 mm.

5 . An apparatus according to claim 1 wherein the chamber further comprises a second radius to further assure the retention of the fluids at the bottom of the chamber while the bubble is being removed.

6 . An apparatus according to claim 5 , wherein the second radius is in the range of 1 mm to 20 mm.

7 . An apparatus according to claim 5 wherein the second radius is in the range of 2 mm to 4 mm.

8 . An apparatus according to claim 5 wherein the second radius is in the range of 1 mm to 2 mm.

9 . An apparatus according to claim 1 wherein the venting channel is at a different location.

10 . A method for removing a bubble, comprising:

providing a first substrate having an inner surface that defines a top surface of at least one chamber;

providing a second substrate having inner surfaces that define the chamber and at least one venting channel there between the first substrate and the second substrate;

providing a third substrate having inner surfaces that define at least one main channel leading into a bottom entrance of the chamber connected to a bottom surface of the chamber in the second substrate, wherein the bottom surface of the chamber is coated to provide a hydrophobic surface and the bottom surface of the chamber is adapted with a radius to retain a quantity or a first fluid and a second fluid such that the surface tension of the bottom surface maintains the fluids in contact with the bottom surface of the chamber;

moving the fluids wherein a bubble is in between the first fluid and the second fluid, with a pressurized gas;

collecting the fluids in the chamber; and

dispelling the bubble resulting in removing the bubble from the fluids.

11 . A method according to claim 10 wherein the radius is in the range of 1 mm to 20 mm.

12 . A method according to claim 10 wherein the radius is in the range of 2 mm to 10 mm.

13 . A method according to claim 10 wherein the radius is in the range of 2 mm to 4 mm.

14 . A method according to claim 10 wherein the chamber further comprises a second radius to further retain the fluid at the bottom of the chamber while the bubble is being removed.

15 . A method according to claim 14 , wherein the second radius is in the range of 1 mm to 20 mm.

16 . A method according to claim 14 , wherein the second radius is in the range of 2 mm to 4 mm.

17 . A method according to claim 14 , wherein the second radius is in the range of 1 mm to 2 mm.

18 . An apparatus according to claim 10 wherein the venting channel is at a different location.

19 . A system for removing a bubble comprising:

a first substrate having an inner surface that defines a top surface of at least one chamber;

a second substrate having inner surfaces that define the chamber and at least one venting channel there between the first substrate and the second substrate;

a third substrate having inner surfaces that define at least one main channel leading into a bottom entrance of the chamber connected to a bottom surface of the chamber in the second substrate, wherein the bottom surface of the chamber is coated to provide a hydrophobic surface and the bottom surface of the chamber is adapted with a radius to retain a quantity of a first fluid and a second fluid such that the surface tension of the bottom surface maintains the fluids in contact with the bottom surface of the chamber;

a pressurized gas for moving the fluids wherein a bubble is in between the first fluid and the second fluid, while the fluids are collected in the chamber wherein the bubble is dispelled, resulting in removing the bubble from the fluids;

a plurality of valve mechanisms and a plurality of gates, wherein the valve mechanisms and plurality of gates are set up at the end of the channels; and

a computer such that a controlling device is attached to the computer, wherein the controlling device controls the valve mechanisms and gates wherein the liquids are introduced into the inlet channel wherein a bubble is in between the first fluid and the second fluid, while the fluids are collected in the chamber wherein the bubble is dispelled, resulting in removing the bubble from the fluids.

20 . A system according to claim 19 wherein the radius is in the range of 1 mm to 20 mm.

21 . A system according to claim 19 wherein the radius is in the range 2 mm to 10 mm.

22 . A system according to claim 19 wherein the radius is in the range of 2 mm to 4 mm.

23 . A system according to claim 19 , wherein the chamber further comprises a second radius to further assure the retention of the fluids at the bottom of the chamber while the bubble is being removed.

24 . A system according to claim 23 , Wherein the second radius is in the range of 1 mm to 20 mm.

25 . A system according to claim 23 , wherein the second radius is in the range of 2 mm to 4 mm.

26 . A system according to claim 23 . wherein the second radius is in the range of 1 mm to 2 mm.

27 . An apparatus according to claim 19 wherein the venting channel is at a different location.

Assignments (2)
RELEASE OF SECURITY INTEREST Recorded Nov 13, 2015
From: GENERAL ELECTRIC CAPITAL CORPORATION, AS AGENT
To: AFFYMETRIX, INC.
Reel/Frame 037109/0132 →
SECURITY AGREEMENT Recorded Jun 27, 2012
From: AFFYMETRIX, INC.
To: GENERAL ELECTRIC CAPITAL CORPORATION, AS AGENT
Reel/Frame 028465/0541 →