IP Library Granted Patent US 8,500,932
Granted Patent B2
US 8,500,932 · App. 13/294,835 · Granted Aug 6, 2013

Method for manufacturing polishing pad

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Quick Facts
Patent No.
US 8,500,932
App. No.
13/294,835
Granted
Aug 6, 2013
Kind
B2
Abstract

A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

Claims (12)

1. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

feeding a face material in a feeding direction;

while feeding the face material, feeding in the feeding direction a first spacer on the face material so as to be at one end of a width direction of the face material, feeding in the feeding direction a second spacer on the face material so as to be at other end of the width direction of the face material, and feeding in the feeding direction a third spacer on the face material so as to be between the first and second spacers;

continuously discharging said cell-dispersed urethane composition onto a part of said face material where the spacers are not provided;

laminating another face material on said discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a long polishing layer comprising a polyurethane foam is formed; and

cutting the long polishing layer.

2. The method according to claim 1 , wherein at least one of the spacers comprises a thermoplastic resin or a thermosetting resin.

3. The method according to claim 1 , wherein the third spacer has a light transmittance of at least 20% throughout the wavelength range of 400 nm to 700 nm.

4. The method according to claim 1 , wherein at least one of the spacers comprises a polyurethane foam whose composition is the same as that of said cell-dispersed urethane composition.

5. The method according to claim 1 , wherein the third spacer is a laminate comprising at least two peelable resin sheets.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2016
From: TOYO TIRE & RUBBER CO., LTD.
To: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
Reel/Frame 038053/0638 →