IP Library Granted Patent US 8,309,728
Granted Patent B2
US 8,309,728 · App. 13/296,254 · Granted Nov 13, 2012

Naphthalenetetracarboxylic acid derivatives and their use as semiconductors

Assignee: BASF Aktiengesellschaft
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Quick Facts
Patent No.
US 8,309,728
App. No.
13/296,254
Granted
Nov 13, 2012
Kind
B2
Abstract

The present invention relates to naphthalenetetracarboxylic acid derivates, to a process for their preparation and to their use, especially as an n-type semiconductor.

Claims (24)

1. A compound of the general formula I

where

at least one of the R 1 , R 2 , R 3 and R 4 radicals is a substituent which is selected from Br, F and CN, and the remaining radicals are each hydrogen,

Y 1 is O or NR a , where R a is hydrogen or an organyl radical,

Y 2 is O or NR b , where R b is hydrogen or an organyl radical,

Z 1 and Z 2 are each independently O or NR c , where R c is an organyl radical,

Z 3 and Z 4 are each independently O or NR d , where R d is an organyl radical,

where, in the case that Y 1 is NR a and at least one of the Z 1 and Z 2 radicals is NR c , R a with one R c radical may also together be a bridging group having 2 to 5 atoms between the flanking bonds, and

where, in the case that Y 2 is NR b and at least one of the Z 3 and Z 4 radicals is NR d , R b with one R d radical may also together be a bridging group having 2 to 5 atoms between the flanking bonds,

and provided that one of the following conditions apply:

a) three of the R 1 , R 2 , R 3 and R 4 radicals are each bromine or are each fluorine or are each cyano, and the remaining radical is hydrogen;

b) R 1 and R 2 are each independently selected from fluorine and cyano, and R 3 and R 4 are each hydrogen;

c) R 1 and R 3 are each independently selected from fluorine and cyano, and R 2 and R 4 are each hydrogen; or

d) R 1 and R 2 are each bromine, and R 3 and R 4 are each hydrogen.

2. The compound according to claim 1 , wherein three of the R 1 , R 2 , R 3 and R 4 radicals are each bromine or are each fluorine or are each cyano, and the remaining radical is hydrogen.

3. The compound according to claim 1 , wherein R 1 and R 2 are each independently selected from fluorine and cyano, and R 3 and R 4 are each hydrogen.

4. The compound according to claim 1 , wherein R 1 and R 3 are each independently selected from fluorine and cyano, and R 2 and R 4 are each hydrogen.

5. The compound according to claim 1 , wherein R 1 and R 2 are each bromine, and R 3 and R 4 are each hydrogen.

6. A compound of the formula:

7. A semiconductor comprising the compound of the general formula I as defined in claim 1 .

8. A semiconductor comprising the compound of claim 6 .

9. The compound according to claim 2 , wherein three of the R 1 , R 2 , R 3 and R 4 radicals are each bromine, and the remaining radical is hydrogen.

10. The compound according to claim 2 , wherein three of the R 1 , R 2 , R 3 and R 4 radicals are each fluorine, and the remaining radical is hydrogen.

11. The compound according to claim 2 , wherein three of the R 1 , R 2 , R 3 and R 4 radicals are each cyano, and the remaining radical is hydrogen.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 22, 2020
From: BASF SE
To: CLAP CO., LTD.
Reel/Frame 052459/0201 →
Priority Claims (1)
DE 10 2005 061 997 · Dec 23, 2005 · national
Continuity (2)
Continuation 12097774
Related Publication 20120059168A1 · Mar 8, 2012