Liquid crystal display device and manufacturing method thereof

1. A liquid crystal display device comprising:

a first insulation substrate and a second insulation substrate which hold a liquid crystal material therebetween;

scanning signal lines formed over a surface of the first insulation substrate on a liquid-crystal-material side;

a first insulation layer which is formed over the scanning signal lines and on the surface of the first insulation substrate on the liquid-crystal-material side;

semiconductor layers and pixel electrodes which are formed over the surface of the first insulation layer on the liquid-crystal-material side; and

a second insulation layer which is formed between the pixel electrodes and a common electrode, wherein

the liquid crystal display device further comprises:

source electrodes each of which includes an overlapping portion which is a stacked portion constituted of the semiconductor layer and a metal layer formed over a surface of the semiconductor layer on the liquid-crystal-material side and is a portion overlapping a surface of the pixel electrode on the liquid-crystal-material side;

video signal lines each of which is formed of a stacked portion constituted of the metal layer and the semiconductor layer; and

drain electrodes each of which is formed of a stacked portion constituted of the metal layer and the semiconductor layer, and

opening portions each of which exposes a joining portion which is a portion leading to a surface of the pixel electrode on the liquid crystal material side from a surface of the source electrode on the liquid crystal material side via an edge portion of the overlapping portion are formed in the second insulation layer, and

a conductive film is formed over the joining portion exposed by the opening portion,

wherein at least a portion of the conductive film and at least a portion of the common electrode are formed at a same layer.

2. The liquid crystal display device according to claim 1 , wherein the conductive film covers the whole surface of the opening portion.

3. The liquid crystal display device according to claim 1 , wherein the each of the opening portions exposes a part of the metal layer and a part of the pixel electrode, and

wherein the conductive film is on and in physical contact with the part of the metal layer and the part of the pixel electrode.

4. The liquid crystal display device according to claim 1 , wherein the each of the opening portions exposes the edge portion of the overlapping portion and a part of the pixel electrode, and

wherein the conductive film is on and in physical contact with the edge portion of the overlapping portion and the part of the pixel electrode.

5. A method of manufacturing a liquid crystal display device which comprises: a first insulation substrate and a second insulation substrate which hold a liquid crystal material therebetween; scanning signal lines formed over a surface of the first insulation substrate on a liquid-crystal-material side; a first insulation layer which is formed over the scanning signal lines and on the surface of the first insulation substrate on the liquid-crystal-material side; semiconductor layers and pixel electrodes which are formed over the surface of the first insulation layer on the liquid-crystal-material side; and a second insulation layer which is formed between the pixel electrodes and a common electrode, the method comprising the steps of:

forming, after the pixel electrodes are formed over the surface of the first insulation layer on the liquid crystal material side, by collectively applying etching treatment to the semiconductor layer and a metal layer, source electrodes each of which includes an overlapping portion which is a stacked portion constituted of the semiconductor layer and the metal layer formed over a surface of the semiconductor layer on the liquid-crystal-material side and is a portion overlapping a surface of the pixel electrode on the liquid-crystal-material side, video signal lines each of which is formed of a stacked portion constituted of the metal layer and the semiconductor layer, and drain electrodes each of which is formed of a stacked portion constituted of the metal layer and the semiconductor layer;

forming opening portions each of which exposes a joining portion which is a portion leading to a surface of the pixel electrode on the liquid crystal material side from a surface of the source electrode on the liquid crystal material side via an edge portion of the overlapping portion in the second insulation layer; and

forming a conductive film over the joining portion exposed by the opening portion;

wherein at least a portion of the conductive film and at least a portion of the common electrode are formed at a same layer.

6. The method of manufacturing a liquid crystal display device according to claim 5 , wherein the conductive film which is formed in the step of forming the conductive film covers the whole surface of the opening portion.

7. The method of manufacturing a liquid crystal display device according to claim 5 , wherein the step of forming the opening portion is performed along with the formation of openings in the second insulation layer other than the opening portions.

8. The method of manufacturing a liquid crystal display device according to claim 5 , wherein the each of the opening portions exposes a part of the metal layer and a part of the pixel electrode, and

wherein the conductive film is on and in physical contact with the part of the metal layer and the part of the pixel electrode.

9. The method of manufacturing a liquid crystal display device according to claim 5 , wherein the each of the opening portion exposes the edge portion of the overlapping portion and a part of the pixel electrode, and

wherein the conductive film is on and in physical contact with the edge portion of the overlapping portion and the part of the pixel electrode.