Photosensitive film pattern and method for manufacturing a photosensitive film pattern
View Patent ↗A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.
1. A method for manufacturing a photosensitive film pattern, comprising:
forming a thin film on a substrate;
forming a photosensitive film on the thin film;
arranging an exposure apparatus comprising a photo-modulation element on the photosensitive film;
exposing the photosensitive film according to an exposure pattern of the photo-modulation element by using the exposure apparatus; and
developing the exposed photosensitive film to form the photosensitive film pattern,
wherein the exposure pattern comprises a main pattern comprising a quadrangular shape and a long edge and a short edge, and a first assistance pattern positioned at a first corner of the main pattern.
2. A method for manufacturing a photosensitive film pattern, comprising:
forming a thin film on a substrate;
forming a photosensitive film on the thin film;
arranging an exposure apparatus comprising a photo-modulation element on the photosensitive film;
exposing the photosensitive film according to an exposure pattern of the photo-modulation element by using the exposure apparatus; and
developing the exposed photosensitive film to form the photosensitive film pattern,
wherein the exposure pattern comprises a main pattern comprising a quadrangular shape and a long edge and a short edge, and a first assistance pattern positioned at a first corner of the main pattern,
wherein the assistance pattern has a square shape, and a length of a first edge of the assistance pattern is 20% to 30% of a length of the short edge of the main pattern.
3. The method of claim 2 , wherein
the assistance pattern overlaps the long edge of the main pattern by 10% to 20% of a length of the short edge of the main pattern at the first corner of the main pattern.
4. The method of claim 2 , wherein
the assistance pattern overlaps the short edge of the main pattern by 10% to 20% of a length of the short edge of the main pattern at the first corner of the main pattern.
5. The method of claim 2 , wherein
the photosensitive film pattern has a quadrangular shape and comprises a long edge and a short edge, and
a first corner of the photosensitive film pattern comprises a curved surface having a curvature radius of 20% to 40% of a length of the short edge of the photosensitive film pattern.
6. The method of claim 1 , wherein
the thin film is an insulating layer or a metal layer arranged on a substrate.
7. The method of claim 1 , further comprising:
inputting data for the exposure pattern to the photo-modulation element.