IP Library Granted Patent US 8,455,997
Granted Patent B2
US 8,455,997 · App. 13/309,754 · Granted Jun 4, 2013

High power semiconductor device

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Quick Facts
Patent No.
US 8,455,997
App. No.
13/309,754
Granted
Jun 4, 2013
Kind
B2
Abstract

A semiconductor device includes an insulating substrate, a metal pattern formed on the insulating substrate, a power terminal bonded onto the metal pattern, and a plurality of power chips bonded onto the metal pattern. The plurality of power chips are all separated from the power terminal by a distance sufficient to thermally isolate the plurality of power chips from the power terminal.

Claims (12)

1. A semiconductor device comprising:

an insulating substrate;

a metal pattern formed on said insulating substrate;

a power terminal bonded onto said metal pattern;

an exposed solder pattern without any electronic component bonded thereto or connected thereto, the exposed solder pattern bonded onto the metal pattern between the power terminal and the plurality of power chips;

a plurality of power chips bonded onto said metal pattern;

wherein said plurality of power chips are all separated from said power terminal by a distance sufficient to thermally isolate said plurality of power chips from said power terminal.

2. The semiconductor device according to claim 1 , wherein a heat sink is bonded onto said exposed solder pattern between said power terminal and said plurality of power chips.

3. The semiconductor device according to claim 1 , wherein:

said metal pattern is formed of copper;

each of said plurality of power chips is an insulated gate bipolar transistor (IGBT) chip or a diode chip; and

the distance between said power terminal and the closest of said plurality of power chips is 5 mm or more.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2020
From: MITSUBISHI ELECTRIC CORPORATION
To: ARIGNA TECHNOLOGY LIMITED
Reel/Frame 052042/0651 →