Method of manufacturing thin film transistor, thin film transistor manufactured using the method, method of manufacturing organic light-emitting display apparatus, and organic light-emitting display apparatus manufactured using the method
View Patent ↗A method of manufacturing a TFT, including forming a buffer layer, an amorphous silicon layer, an insulating layer, and a first conductive layer on a substrate, forming a polycrystalline silicon layer by crystallizing the amorphous silicon layer, forming a semiconductor layer, a gate insulating layer, and a gate electrode that have a predetermined shape by simultaneously patterning the polycrystalline silicon layer, the insulating layer, and the first conductive layer, wherein the polycrystalline silicon layer is further etched to produce an undercut recessed a distance compared to sidewalls of the insulating layer and the first conductive layer, forming source and drain regions within the semiconductor layer by doping corresponding portions of the semiconductor layer, forming an interlayer insulating layer on the gate electrode, the interlayer insulating layer covering the gate insulating layer and forming source and drain electrodes that are electrically connected to source and drain regions respectively.
1. A method of manufacturing a thin film transistor (TFT), comprising:
forming a buffer layer, an amorphous silicon layer, an insulating layer, and a first conductive layer on a substrate;
forming a polycrystalline silicon layer by crystallizing the amorphous silicon layer;
forming a semiconductor layer, a gate insulating layer, and a gate electrode that have a predetermined shape by simultaneously patterning the polycrystalline silicon layer, the insulating layer, and the first conductive layer, wherein the polycrystalline silicon layer is further etched to produce an undercut recessed a distance compared to sidewalls of the insulating layer and the first conductive layer, wherein a width of the gate electrode is greater than a width of the semiconductor layer in a direction (a Y-axis direction) orthogonal to a direction (an X-axis direction) that a source region, a channel region and a drain region are to be arranged;
forming the source region and the drain region within the semiconductor layer by doping corresponding portions of the semiconductor layer, the gate electrode corresponding to the channel region of the semiconductor layer that remains undoped, the gate electrode serves as a doping mask during the doping of the semiconductor layer;
forming an interlayer insulating layer on the gate electrode, the interlayer insulating layer covering the gate insulating layer; and
forming a source electrode and a drain electrode that are electrically connected to the source region and the drain region respectively.
2. The method of claim 1 , wherein the forming of the semiconductor layer, the gate insulating layer, and the gate electrode comprises using a half-tone mask comprising light-transflecting portions arranged at locations that correspond to the source region and the drain region, respectively.
3. The method of claim 1 , wherein the amorphous silicon layer is crystallized into the polycrystalline silicon layer via a process selected from a group consisting of a Solid Phase Crystallization (SPC) process, a Metal-Induced Crystallization (MIC) process, a Super Grain Silicon (SGS) crystallization process, and a Joule-heating Induced Crystallization (JIC) process.
4. The method of claim 1 , wherein the forming of the source and drain electrodes comprises:
exposing the source and drain regions by forming contact holes in the interlayer insulating layer and in the gate insulating layer;
forming a second conductive layer on the interlayer insulating layer and within the contact holes; and
patterning the second conductive layer.
5. The method of claim 1 , wherein the buffer layer, the semiconductor layer, the insulating layer, and the first conductive layer are deposited in order and patterned simultaneously by a single etching process.
6. The method of claim 1 , wherein the buffer layer comprises at least one material selected from a group consisting of silicon oxide, silicon nitride and silicon oxynitride.
7. The method of claim 1 , wherein the substrate is an insulating substrate comprising a transparent glass material.
8. The method of claim 1 , wherein when the polycrystalline silicon layer, the insulating layer and the first conductive layer are patterned simultaneously, the insulating layer and the first conductive layer have a same island shape while the patterned polycrystalline silicon layer has a shape slightly smaller than that of the insulating layer and the first conductive layer while being arranged concentric with the insulating layer and the first conductive layer.
9. The method of claim 1 , wherein the gate electrode is comprised of a material selected from a group consisting of Ag, Mg, Al, Pt, Au, Ni, Nd, Ir, Cr, Li, Ca, Mo, Ti, W, MoW, Al/Cu, indium tin oxide (ITO), indium zinc oxide (IZO), ZnO and In 2 O 3 .
10. A method of manufacturing an organic light-emitting display apparatus, comprising:
forming a buffer layer, an amorphous silicon layer, an insulating layer, and a first conductive layer on a substrate;
forming a polycrystalline silicon layer by crystallizing the amorphous silicon layer;
forming a semiconductor layer, a gate insulating layer, and a gate electrode that have a predetermined shape by simultaneously patterning the polycrystalline silicon layer, the insulating layer, and the first conductive layer, wherein the polycrystalline silicon layer is further etched laterally to produce an undercut recessed by a predetermined distance as compared to corresponding sidewalls of the insulating layer and the first conductive layer, wherein a width of the gate electrode is greater than a width of the semiconductor layer in a direction (a Y-axis direction) orthogonal to a direction (an X-axis direction) that a source region, a channel region and a drain region are to be arranged;
forming the source region and the drain region in the semiconductor layer by doping corresponding portions of the semiconductor layer, the gate electrode corresponding to the channel region of the semiconductor layer that remains undoped, the gate electrode serves as a doping mask during the doping of the semiconductor layer;
forming an interlayer insulating layer on the gate electrode to cover the gate insulating layer;
forming a source electrode and a drain electrode that are electrically connected to the source region and the drain region respectively;
forming a pixel electrode that is electrically connected to one of the source electrode and the drain electrode;
forming an intermediate layer on the pixel electrode, the intermediate layer including an emission layer (EML); and
forming an opposite electrode on the intermediate layer.
11. The method of claim 10 , wherein the forming of the semiconductor layer, the gate insulating layer, and the gate electrode comprises using a half-tone mask comprising light-transflecting portions arranged at locations that correspond to the source region and the drain region, respectively.
12. The method of claim 10 , wherein the forming of the source electrode and the drain electrode comprises:
exposing the source and drain regions by forming contact holes in the interlayer insulating layer and in the gate insulating layer;
forming a second conductive layer on the interlayer insulating layer and within the contact holes; and
patterning the second conductive layer.
13. The method of claim 10 , wherein the forming of the pixel electrode comprises:
forming a planarization layer on the interlayer insulating layer to cover the source electrode and the drain electrode;
exposing one of the source electrode and the drain electrode by forming a via-hole in the planarization layer; and
depositing a metal material on the planarization layer and in the via hole, wherein the pixel electrode is electrically connected to the one of the source electrode and the drain electrode via the via-hole.
14. The method of claim 10 , wherein the depositing of the buffer layer, the semiconductor layer, the insulating layer, and the first conductive layer are deposited in order and patterned simultaneously by a single etching process.
15. The method of claim 10 , wherein the amorphous silicon layer is crystallized into the polycrystalline silicon layer using a process selected from a group consisting of a Solid Phase Crystallization (SPC) process, a Metal-Induced Crystallization (MIC) process, a Super Grain Silicon (SGS) crystallization process and a Joule-heating Induced Crystallization (JIC) process.
16. The method of claim 10 , wherein the substrate is an insulating substrate comprising a transparent glass material.
17. The method of claim 10 , wherein when the polycrystalline silicon layer, the insulating layer and the first conductive layer are patterned simultaneously, the insulating layer and the first conductive layer have a same island shape while the patterned polycrystalline silicon layer has a shape slightly smaller than that of the insulating layer and the first conductive layer while being arranged concentric with the insulating layer and the first conductive layer.
18. The method of claim 10 , wherein the gate electrode is comprised of a material selected from a group consisting of Ag, Mg, Al, Pt, Au, Ni, Nd, Ir, Cr, Li, Ca, Mo, Ti, W, MoW, Al/Cu, indium tin oxide (ITO), indium zinc oxide (IZO), ZnO and In 2 O 3 .