Methods of decreasing sebum production in the skin
View Patent ↗Provided herein are methods of using gaseous nitric oxide and/or at least one nitric oxide source to or decrease sebum production in the skin of a subject. In some embodiments, the nitric oxide source includes small molecule and/or macromolecular NO-releasing compounds.
1. A method of decreasing sebum production in skin of a subject comprising applying a pharmaceutically acceptable composition comprising a nitric oxide (NO)-releasing compound to the skin of the subject, wherein the NO-releasing compound is present in an amount sufficient to decrease sebum production and is present in the pharmaceutically acceptable composition in an amount of 0.1% to 20% w/w in the composition, wherein the NO-releasing compound consists of N-diazeniumdiolate-functionalized macromolecules.
2. The method of claim 1 , wherein the N-diazeniumdiolate-functionalized macromolecules comprise N-diazeniumdiolate co-condensed polysiloxane macromolecules.
3. The method of claim 1 , wherein the pharmaceutically acceptable composition comprises at least one other therapeutic agent.
4. The method of claim 1 , wherein the nitric oxide is applied at a concentration that is toxic to sebum production sites.
5. The method of claim 1 , wherein the nitric oxide is applied at a concentration that is not toxic to sebum production sites.
6. The method of claim 1 , wherein the nitric oxide is applied at a concentration that is preferentially toxic to sebum production sites over keratinocytes.
7. A method of decreasing sebum production in skin of a subject comprising applying to the subject a pharmaceutically acceptable composition comprising a therapeutic agent, said therapeutic agent consisting essentially of a nitric oxide (NO)-releasing compound, wherein said NO-releasing compound is present in said composition in an amount sufficient to decrease sebum production in the skin of the subject, wherein the NO-releasing compound consists of N-diazeniumdiolate-functionalized macromolecules.