Method for manufacturing a medical implant and medical implant

1. A method for manufacturing an implantable stimulation electrode having a tight substrate and a porous contact region, the method comprising:

partly filling a sintering mold for the implantable stimulation electrode with a first sinter fraction made of a powder or slurry with sinter particles of an electrically conductive material such that an unoccupied space remains in the sintering mold;

at least partly filling the remaining space of the sintering mold with a second sinter fraction made of a powder or slurry with sinter particles of a conductive material that differ from the sinter particles of the first sinter fraction in their average particle size and/or composition of the material with respect to the melting point;

generating the implantable stimulation electrode with graduated porosity through co-sintering the two sinter fractions in the sintering mold;

characterized in that a part of the implant with high porosity is generated from one sinter fraction and a tight part of the implant with low or negligible porosity is generated from the other sinter fraction; and

characterized in that the melting points of the material employed in the first sinter fraction and of the material employed in the second sinter fraction differ by more than 30° C.

2. The method according to claim 1 , characterized in that the sinter particles of the sinter fractions consist of Pt, PtIr, TaNbW, Pd, PdIr, Au, Ti, Nb, TiNb or alloys thereof or comprise said materials.

3. The method according to claim 1 , characterized in that the average particle sizes of the first sinter fraction and second sinter fraction differ by a factor of between 2 and 5.

4. The method according to claim 1 , characterized in that the average particles sizes of the particles of at least one of the first and second sinter fractions are in the range between 10 μm and 50 μm.

5. The method according to claim 1 , characterized in that the sinter mold is dimensioned to be larger than the finished medical implant in the region for the contact region and in the region of the substrate, each according to the different shrinkages of the sinter fractions during the sintering.

6. A method for manufacturing an implantable stimulation electrode having a tight substrate and a porous contact region, the method comprising:

partly filling a sintering mold for the implantable stimulation electrode with a first sinter fraction made of a powder or slurry with sinter particles of an electrically conductive material such that an unoccupied space remains in the sintering mold;

at least partly filling the remaining space of the sintering mold with a second sinter fraction made of a powder or slurry with sinter particles of a conductive material that differ from the sinter particles of the first sinter fraction in their average particle size and/or composition of the material with respect to the melting point; and

generating the implantable stimulation electrode with graduated porosity through co-sintering the two sinter fractions in the sintering mold;

characterized in that the first sinter fraction is pre-sintered or partly sintered in the sintering mold before the remaining space of the sintering mold is filled with the second sintering fraction; and

characterized in that the melting points of the material employed in the first sinter fraction and of the material employed in the second sinter fraction differ by more than 30° C.

7. A method for manufacturing an implantable stimulation electrode having a tight substrate and a porous contact region, the method comprising:

partly filling a sintering mold for the implantable stimulation electrode with a first sinter fraction made of a powder or slurry with sinter particles of an electrically conductive material such that an unoccupied space remains in the sintering mold;

at least partly filling the remaining space of the sintering mold with a second sinter fraction made of a powder or slurry with sinter particles of a conductive material that differ from the sinter particles of the first sinter fraction in their average particle size and/or composition of the material with respect to the melting point; and

generating the implantable stimulation electrode with graduated porosity through co-sintering the two sinter fractions in the sintering mold;

characterized in that the average particle sizes of the first sinter fraction and second sinter fraction differ by a factor of between 5 and 8.

8. A method for manufacturing an implantable stimulation electrode having a tight substrate and a porous contact region, the method comprising:

providing a sintering mold for the implantable stimulation electrode, the mold having a hollow structure defining a stem and a head, the head being wider than the stem thereby defining a neck therebetween;

partly filling a portion of the head of the sintering mold with a first sinter fraction made of a powder or slurry with sinter particles of an electrically conductive material such that an unoccupied space remains in the head of the sintering mold after all of the first sinter fraction is added;

at least partly filling the remaining space of the head and the stem of the sintering mold with a second sinter fraction made of a powder or slurry with sinter particles of a conductive material that differ from the sinter particles of the first sinter fraction in their average particle size and/or composition of the material with respect to the melting point and such that the second sinter fraction fills around the neck; and

generating the implantable stimulation electrode with graduated porosity through co-sintering the two sinter fractions in the sintering mold.

9. The method according to claim 8 , characterized in that particles of the first and second sinter fractions are in the range between 10 μm and 50 μm.